Patent US4215935A successfully refreshed from Google Patents.
US4215935A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and device for the projection printing of a mask onto a semiconductor substrate
Assignee: MERCOTRUST AKTIENGESELLSCHAFT A CORP OF LIECOTENSTEIN
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Filing: 1979-05-24
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Granted: 1980-08-05
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Expires: 1999-05-24
Abstract
Abstract A method and device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist.
Inventors
- 👤 Ernst W. Loebach
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 10:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
57 words
A method for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist, wherein a gallium-doped mercury vapor lamp is used as said light source.
Claim 2
Independent Claim
57 words
A method for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist, wherein a gallium-doped mercury vapor lamp is used as said light source.
Claim 3
Independent Claim
57 words
A method for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist, wherein an indium-doped mercury vapor lamp is used as said light source.
Claim 4
Independent Claim
57 words
A method for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, said mask being illuminated by means of a light source and imaged on said workpiece by means of a projection lens, said workpiece being coated with a photoresist, wherein an indium-doped mercury vapor lamp is used as said light source.
Claim 5
Independent Claim
79 words
A device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, comprising a light source and a projection lens, said mask being arranged in the object plane of said projection lens and said workpiece being arranged in the image plane, said workpiece being coated with a photoresist, wherein said light source is a gallium-doped mercury vapor lamp and said projection lens is color-corrected in a spectral range of between 402 and 408 nm.
Claim 6
Independent Claim
79 words
A device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, comprising a light source and a projection lens, said mask being arranged in the object plane of said projection lens and said workpiece being arranged in the image plane, said workpiece being coated with a photoresist, wherein said light source is a gallium-doped mercury vapor lamp and said projection lens is color-corrected in a spectral range of between 402 and 408 nm.
Claim 7
Independent Claim
79 words
A device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, comprising a light source and a projection lens, said mask being arranged in the object plane of said projection lens and said workpiece being arranged in the image plane, said workpiece being coated with a photoresist, wherein said light source is an indium-doped mercury vapor lamp and said projection lens is color-corrected in a spectral range of between 412 and 418 nm.
Claim 8
Independent Claim
79 words
A device for the projection printing of a mask onto a workpiece, particularly onto a semiconductor substrate, comprising a light source and a projection lens, said mask being arranged in the object plane of said projection lens and said workpiece being arranged in the image plane, said workpiece being coated with a photoresist, wherein said light source is an indium-doped mercury vapor lamp and said projection lens is color-corrected in a spectral range of between 412 and 418 nm.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-08-05 | 1984-02-04 | 1984-08-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-08-05 | 1988-02-04 | 1988-08-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-08-05 | 1992-02-04 | 1992-08-05 | $7700.00 | Window Closed / Lapsed |