Patent US4184078A successfully refreshed from Google Patents.
US4184078A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Pulsed X-ray lithography
Assignee: United States Department of the Navy
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Filing: 1978-08-15
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Granted: 1980-01-15
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Expires: 1998-08-15
Abstract
Abstract A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays.
Inventors
- 👤 David J. Nagel
- 👤 Martin C. Peckerar
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 13:30
CPC Classifications
H; H05; H05G; H05G2/00; H05G2/001; B; B82; B82Y; B82Y10/00; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/70033
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
34 words
A soft x-ray lithographic system which comprises: a housing; means for evacuating said housing; means for producing an x-ray-emitting plasma; and a mask x-ray-resist substrate combination for replicating a desired pattern on said substrate.
Claim 2
Dependent Claim
34 words
A soft x-ray lithographic system which comprises: a housing; means for evacuating said housing; means for producing an x-ray-emitting plasma; and a mask x-ray-resist substrate combination for replicating a desired pattern on said substrate.
Claim 3
Dependent Claim
41 words
A soft x-ray lithographic system as claimed in claim 1 in which: said x-rays have an energy of from 1 to 5 keV, an emission time of less than 1 microsecond, and a source size of about 1 mm 3 .
Claim 4
Dependent Claim
30 words
A lithographic system as claimed in claim 1 in which: said means for producing an x-ray-emitting plasma is a solid metal target upon which a pulsed laser beam is incident.
Claim 5
Dependent Claim
32 words
A lithographic system as claimed in claim 1 in which: said means for producing an x-ray-emitting plasma is a high electrical energy storage means in combination with a diode within said housing.
Claim 6
Dependent Claim
29 words
A lithographic system as claimed in claim 1 in which said means for producing an x-ray-emitting plasma is a laser beam focused onto a metal target within said housing.
Claim 7
Independent Claim
49 words
A method of replicating a pattern on a material which comprises: placing a mask x-ray absorption pattern relative to an x-ray-resist substrate combination, placing said substrate combination into a housing; evacuating said housing; producing an x-ray-emitting plasma within said evacuated housing; and directing said x-rays onto said substrate combination.
Claim 8
Independent Claim
49 words
A method of replicating a pattern on a material which comprises: placing a mask x-ray absorption pattern relative to an x-ray-resist substrate combination, placing said substrate combination into a housing; evacuating said housing; producing an x-ray-emitting plasma within said evacuated housing; and directing said x-rays onto said substrate combination.
Claim 9
Dependent Claim
27 words
A method as claimed in claim 6 wherein: said x-ray-emitting plasma is produced by focusing a pulsed laser output onto a metal target within said evacuated housing.
Claim 10
Dependent Claim
26 words
A method as claimed in claim 6 wherein: said x-ray-emitting plasma is produced by discharging a high electrical storage means through a diode within said housing.
Claim 11
Dependent Claim
117 words
A soft x-ray lithographic system comprising: means for producing a hot plasma at a temperature above 1 million degrees Celsius, the plasma being composed of matter which emits x-rays at such temperatures; and means for replicating an image comprising a substrate, a layer of x-ray-sensitive material on said substrate, and masking means between said sensitive layer and said plasma-producing means, said masking means containing a representation of the image to be replicated, said representation of the image being formed by the proper combination of areas that are opaque and areas that are transparent to the soft x-rays, said image being formed on the x-ray-resist by irradiation of the replicating means by the x-rays from the plasma-producing means.
Claim 12
Dependent Claim
117 words
A soft x-ray lithographic system comprising: means for producing a hot plasma at a temperature above 1 million degrees Celsius, the plasma being composed of matter which emits x-rays at such temperatures; and means for replicating an image comprising a substrate, a layer of x-ray-sensitive material on said substrate, and masking means between said sensitive layer and said plasma-producing means, said masking means containing a representation of the image to be replicated, said representation of the image being formed by the proper combination of areas that are opaque and areas that are transparent to the soft x-rays, said image being formed on the x-ray-resist by irradiation of the replicating means by the x-rays from the plasma-producing means.
Claim 13
Dependent Claim
35 words
A system as in claim 9, wherein said plasma-producing source comprises a laser and a target spaced therefrom, said target being made from a material which produces a plasma when struck by a laser beam.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-01-14 | 1983-07-16 | 1984-01-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-01-14 | 1987-07-16 | 1988-01-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-01-14 | 1991-07-16 | 1992-01-15 | $7700.00 | Window Closed / Lapsed |