US4028547A
Expired / Lapsed
US
⏱️ 0.0 years remaining
X-ray photolithography
Assignee: AT&T Inc
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Filing: 1975-06-30
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Granted: 1977-06-07
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Expires: 1995-06-30
Abstract
Abstract Photolithography of microcircuits with elements in the micrometer size range is performed with X-ray exposure of photoresist layers through electron beam generated shadow masks. Synchrotron radiation from a particle accelerator is used as an intense source of well collimated X-rays and Bragg reflection from a mosaic crystal is used to provide spectral purity for good contrast in the exposed photoresist pattern.
Inventors
- 👤 Peter Michael Eisenberger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 03:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/70058; G03F7/702; H; H01; H01J; H01J37/00; H01J37/30
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
134 words
Method of photolithographic processing comprising directing a beam of electromagnetic radiation in the wavelength range 1 A to 50 A through a shadow mask, against a device precursor consisting of a substrate and an image forming layer, sensitive to the radiation, producing a change in the cohesiveness of the irradiated portion of the layer CHARACTERIZED IN THAT the radiation is directed against the device precursor by means of Bragg reflection from an inhomogeneously reflecting crystalline body, which inhomogeneously reflecting crystalline body consists of a multitude of crystallites whose angular spread of crystalline orientation is from 10.sup. -4 radians to 10.sup. -1 radians of angle, which radiation is synchrotron radiation and which crystalline body is shaped so as to compensate for the angular deviation of the synchrotron radiation and produce a more nearly parallel beam.
Claim 2
Dependent Claim
134 words
Method of photolithographic processing comprising directing a beam of electromagnetic radiation in the wavelength range 1 A to 50 A through a shadow mask, against a device precursor consisting of a substrate and an image forming layer, sensitive to the radiation, producing a change in the cohesiveness of the irradiated portion of the layer CHARACTERIZED IN THAT the radiation is directed against the device precursor by means of Bragg reflection from an inhomogeneously reflecting crystalline body, which inhomogeneously reflecting crystalline body consists of a multitude of crystallites whose angular spread of crystalline orientation is from 10.sup. -4 radians to 10.sup. -1 radians of angle, which radiation is synchrotron radiation and which crystalline body is shaped so as to compensate for the angular deviation of the synchrotron radiation and produce a more nearly parallel beam.
Claim 3
Dependent Claim
15 words
A method of claim 1 in which the crystalline body is shaped by elastic deformation.
Claim 4
Dependent Claim
111 words
Method of photolithographic processing comprising directing a beam of electromagnetic radiation in the wavelength range 1 A to 50 A through a shadow mask, against a device precursor consisting of a substrate and an image forming layer, sensitive to the radiation, producing a change in the cohesiveness of the irradiated portion of the layer characterized in that the radiation is directed against the device precursor by means of Bragg reflection from an inhomogeneously reflecting crystalline body, which radiation is synchroton radiation, and which inhomogeneously reflecting crystalline body consists of a multitude of crystallites whose angular spread of the crystalline orientation is from 10.sup. -3 radians to 10.sup. -2 radians of angle.
Claim 5
Dependent Claim
111 words
Method of photolithographic processing comprising directing a beam of electromagnetic radiation in the wavelength range 1 A to 50 A through a shadow mask, against a device precursor consisting of a substrate and an image forming layer, sensitive to the radiation, producing a change in the cohesiveness of the irradiated portion of the layer characterized in that the radiation is directed against the device precursor by means of Bragg reflection from an inhomogeneously reflecting crystalline body, which radiation is synchroton radiation, and which inhomogeneously reflecting crystalline body consists of a multitude of crystallites whose angular spread of the crystalline orientation is from 10.sup. -3 radians to 10.sup. -2 radians of angle.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-06-06 | 1980-12-06 | 1981-06-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-06-06 | 1984-12-06 | 1985-06-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-06-06 | 1988-12-06 | 1989-06-07 | $7700.00 | Window Closed / Lapsed |