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US4172756A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for the accelerated growth from the gaseous phase of crystals, and products obtained in this manner

Assignee: US Philips Corp
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Filing: 1977-01-27
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Granted: 1979-10-30
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Expires: 1997-01-27
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Abstract

Abstract A method of growing gallium arsenide crystals obtained by reaction of a first gaseous phase containing hydrogen and arsenic trichloride and a liquid gallium phase, in which the reaction forms a second gaseous phase from which gallium arsenide is deposited in such circumstances that the molar fraction of arsenic trichloride is larger than 2×10 -2 and is preferably between 2×10 -2 and 10 -1 .

Inventors

  • 👤 Laszlo Hollan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 12:43
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2907; H10P14/2911; H10P14/24; H10P14/32; H10P14/3202; H10P14/3214; H10P14/3221; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3421; Y; Y10; Y10S; Y10S117/00; Y10S117/901; Y10S117/902

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 59 words
A method of growing gallium arsenide crystals, comprising the steps of reacting a first gaseous phase containing hydrogen and arsenic trichloride with a liquid phase of gallium, said reaction forming a second gaseous phase from which the gallium arsenide is deposited, wherein the molar fraction of arsenic trichloride in said first gaseous phase is higher than 2×10 -2 .
Claim 2
Independent Claim 59 words
A method of growing gallium arsenide crystals, comprising the steps of reacting a first gaseous phase containing hydrogen and arsenic trichloride with a liquid phase of gallium, said reaction forming a second gaseous phase from which the gallium arsenide is deposited, wherein the molar fraction of arsenic trichloride in said first gaseous phase is higher than 2×10 -2 .
Claim 3
Dependent Claim 25 words
A method as claimed in claim 1, wherein the molar fraction of arsenic trichloride in said first gaseous phase is lower than 10 -1 .
Claim 4
Dependent Claim 27 words
A method as in claim 2, wherein the molar fraction of arsenic trichloride in said first gaseous phase is chosen to be equal to 3×10 -2 .
Claim 5
Dependent Claim 12 words
A crystalline body obtained by using the method recited in claim 1.
Claim 6
Independent Claim 101 words
A method of manufacturing a semiconductor device comprising a monocrystalline substrate and monocrystalline layer of gallium arsenide, said layers being deposited by reacting a first gaseous phase containing hydrogen and arsenic trichloride with a liquid phase of gallium, said reaction forming a second gaseous phase from which the gallium arsenide is deposited, wherein the molar fraction of arsenic trichloride in said first gaseous phase is higher than 2×10 -2 and wherein the growth face of said monocrystalline substrate on which said layers are deposited is a face that makes an angle of 6° to 12° with the (1, 0, 0) face.
Claim 7
Independent Claim 101 words
A method of manufacturing a semiconductor device comprising a monocrystalline substrate and monocrystalline layer of gallium arsenide, said layers being deposited by reacting a first gaseous phase containing hydrogen and arsenic trichloride with a liquid phase of gallium, said reaction forming a second gaseous phase from which the gallium arsenide is deposited, wherein the molar fraction of arsenic trichloride in said first gaseous phase is higher than 2×10 -2 and wherein the growth face of said monocrystalline substrate on which said layers are deposited is a face that makes an angle of 6° to 12° with the (1, 0, 0) face.
Claim 8
Dependent Claim 12 words
A semiconductor device obtained by using the method recited in claim 5.
Claim 9
Dependent Claim 25 words
A method as claimed in claim 5, wherein the molar fraction of arsenic trichloride in said first gaseous phase is lower than 10 -1 .

References Cited (Backward Citations)

US3476592A Cited
US3471324A Cited
US4007074A Cited
US3893876A Cited
US3975218A Cited
UST951008I4 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-10-29 1983-04-30 1983-10-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-10-29 1987-04-30 1987-10-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-10-29 1991-04-30 1991-10-30 $7700.00 Window Closed / Lapsed

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