Method for producing a photomask

Claim 3

The method of claim 1, wherein said support is a glass plate, quartz, sapphire, or a synthetic resin film.

Claim 4

The method of claim 1, wherein said masking layer is a layer of a material which transmits visible light and absorbs ultraviolet light.

Claim 5

The method of claim 1, wherein said masking layer is a layer of a metal, a metal oxide, a semi-metal, or a chalcogen glass.

Claim 6

The method of claim 4, wherein said metal oxide is silicon dioxide, chromium oxide, ferric oxide, magnetic iron oxide, iron (II)-iron (III) oxide, cuprous oxide, cupric oxide, nickel oxide, cobalt oxide, germanium oxide, cadmium oxide, titanium oxide, or tantalum oxide, said metal is chromium, aluminum, silver, titanium, cobalt, tungsten, tellurium, nickel, gold, platinum, iridium, palladium, rhodium, molybdenum, tantalum, a nickel-iron alloy, a nickel-chromium-iron alloy, an aluminum-iron alloy, a chromium-iron alloy, a chromium-aluminum alloy, a silicon-gold alloy, a titanium-aluminum alloy, a copper-beryllium alloy, a cobalt-iron alloy, a cobalt-nickel alloy or a nickel-chromium alloy, said semi-metal is silicon or germanium and said chalcogen glass is As--S--Ge, As--Se--Ge, or Ge--S.

Claim 7

The method of claim 3, wherein said masking layer transmits well light of a wavelength not less than about 400 nm and well absorbs light having a wavelength shorter than about 400 nm.

Claim 8

The method of claim 1, wherein said masking layer has a thickness ranging from about 0.01 to 10 microns.

Claim 9

The method of claim 1, wherein said silver halide emulsion layer is an emulsion layer of silver chloride, silver bromide, silver iodide, silver chlorobromide, silver bromoiodide, or silver chlorobromoiodide.

Claim 10

The method of claim 8, wherein said silver halide emulsion is an emulsion containing about 90 mole % or higher silver bromide and not more than about 5 mole % silver iodide and the mean grain size of the silver halide grains is not more than about 0.1 micron and wherein the weight ratio of the silver halide to the water-soluble binder of the emulsion is about 1:4 to about 6:1.

Claim 11

The method of claim 8, wherein said silver halide emulsion is an emulsion which contains about 50 mole % or higher silver chloride and contains silver halide grains having a mean grain size of not more than about 1 micron.

Claim 12

The method of claim 1, wherein said silver halide emulsion layer has a thickness of less than about 10 microns.

Claim 13

The method of claim 1 wherein the source of said hexavalent chromium ion is sodium dichromate, potassium dichromate, ammonium dichromate, sodium chromate, potassium chromate or ammonium chromate.

Claim 14

The method of claim 1, wherein the baking is in an oxygen containing atmosphere at a temperature of at least about 150° C.

Claim 15

The method of claim 1, wherein said etching is by chemical etching or sputter etching.

Claim 16

The method of claim 1, wherein the removing of the non-silver image areas is by swelling or dissolving the binder layer remaining using an alkali solution, a hypochlorite solution or an acid solution.

Claim 17

The method of claim 1, wherein said bleaching of said silver image is with a solution containing hexavalent chromium ion and a mineral acid.

Claim 18

The method of claim 16, wherein the source of said hexavalent chromium ion is sodium dichromate, potassium dichromate, ammonium dichromate, sodium chromate, potassium chromate or ammonium chromate.

Claim 19

The method of claim 1, wherein in said bleaching said silver image is converted to a silver halide image and said method further comprises dissolving away said silver halide prior to heating.

Claim 20

The method of claim 1, wherein in said bleaching said silver is dissolved in a bleaching solution to result in image areas which do not contain silver halide.

Claim 21

The method of claim 1, wherein, said bleaching solution also contains halide ion, and said method additionally includes dissolving away silver halide formed during said bleaching prior to said heating in the presence of oxygen.

Claim 22

The method of claim 14, wherein said chemical etching is with an aqueous etching solution.

Claim 23

The method of claim 1, wherein said photographic light-sensitive material comprises a transparent support having thereon in order from the support a masking layer and a silver halide emulsion layer.

Claim 24

The method of claim 1 wherein said photographic light-sensitive material consists essentially of a transparent support having thereon in order from the support a masking layer and a silver halide emulsion layer.

Claim 25

The method of claim 14 wherein said photographic light-sensitive material consists essentially of a transparent support having thereon in order from the support masking layer and a silver halide emulsion layer.

Claim 26

The method of claim 21 wherein said photographic light-sensitive material consists essentially of a transparent support having thereon in order from the support a masking layer and a silver halide emulsion layer.