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US4110586A Expired / Lapsed US ⏱️ 0.0 years remaining

Manufacture of doped semiconductor rods

Assignee: Siltronic AG
•
Filing: 1976-08-26
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Granted: 1978-08-29
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Expires: 1996-08-26
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Abstract

Abstract Process for doping a semiconductor rod which comprises securing a semicontor rod containing a dopant and having a substantially smaller cross section than the rod to be doped against said rod, with the axes of the two rods substantially parallel to one another, both rods consisting of the same semiconductor material, fusing the two rods into a single rod and subjecting the rod so formed to a crucible zone melting process either subsequently or simultaneously.

Inventors

  • 👤 Franz Kohl
  • 👤 Walter Hoch

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 10:52
CPC Classifications
C; C30; C30B; C30B13/00; C30B13/08; C30B13/10

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 74 words
A process for doping a semiconductor rod, which comprises securing a semiconductor rod containing a dopant and having a substantially smaller cross-section than the rod to be doped against the rod to be doped with the axes of the two rods substantially parallel to one another, both rods consisting of the same semiconductor materials, fusing the two rods into a single rod, and subjecting the rod so formed to a crucible-free zone melting process.
Claim 2
Dependent Claim 74 words
A process for doping a semiconductor rod, which comprises securing a semiconductor rod containing a dopant and having a substantially smaller cross-section than the rod to be doped against the rod to be doped with the axes of the two rods substantially parallel to one another, both rods consisting of the same semiconductor materials, fusing the two rods into a single rod, and subjecting the rod so formed to a crucible-free zone melting process.
Claim 3
Dependent Claim 29 words
The process as claimed in claim 1, wherein the rod to be doped has a narrow flat longitudinal surface portion and the dopant-containing rod is secured against this portion.
Claim 4
Dependent Claim 24 words
The process as claimed in claim 1 wherein the two rods are secured together by means of a heat-resistant wire of a non-doping material.
Claim 5
Dependent Claim 34 words
The process as claimed in claim 1, wherein fusion is effected by advancing an induction heating coil tangentially toward the side of the rod to be doped to which the dopant-containing rod is secured.
Claim 6
Dependent Claim 45 words
The process as claimed in claim 4, wherein the induction heating coil has a straight section diametrically opposite the position where current supply lines enter and leave the coil, and wherein this straight section is advanced toward the side of the rod to be doped.
Claim 7
Dependent Claim 21 words
The process as claimed in claim 5, wherein from 15 to 25% of the coil winding lies along the straight section.
Claim 8
Dependent Claim 70 words
The process as claimed in claim 1, wherein the rods are caused to pass simultaneously through a first heating coil suitable for effecting the fusion and through a second heating coil suitable for effecting the zone melting, in such a manner that each part of the rods passes first through the first coil and subsequently through the second coil, while rotating the rod to be doped about its longitudinal axis.
Claim 9
Dependent Claim 34 words
The process as claimed in claim 7, wherein the rods are held stationary in a longitudinal direction and the rods are caused to pass through the coils by moving the coils along the rods.
Claim 10
Dependent Claim 14 words
The process as claimed in claim 1, wherein the seiconductor rods are of silicon.
Claim 11
Dependent Claim 20 words
The process as claimed in claim 1, wherein the dopant is an element of Group III of the Periodic Table.
Claim 12
Dependent Claim 20 words
The process as claimed in claim 1, wherein the dopant is an element of Group V of the Periodic Table.

References Cited (Backward Citations)

US3685973A Cited
US3622282A Cited
US3935059A Cited
US3769484A Cited
US3954416A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-08-28 1982-02-27 1982-08-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-08-28 1986-02-27 1986-08-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-08-28 1990-02-27 1990-08-29 $7700.00 Window Closed / Lapsed

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