Process for improving the adhesion of coatings made of photoresistant polymers to surfaces of inorganic oxides

Abstract

Abstract The adhesion between inorganic oxides and photoresistant polymers is improved by, prior to contacting the oxide and the polymer, treating the oxide with (a) an aminosilane of the formulae R 3 SiNHR' and R 2 Si(NHR') 2 ; or a polysilazane, with the exception of hexaalkyldisilazanes, having 0.8 to 3 organic groups per silicon atom, and having units of the formulae R 3 Si(NH) 0 .5, R 2 SiNH, RSi(NH) 1 .5 or Si(NH) 2 , in which formulae each R, which may be identical or different, represents hydrogen or an alkyl radical of 1 to 8 carbon atoms, an alkenyl radical of 2 to 4 carbon atoms, a cycloalkyl radical of 5 to 6 carbon atoms in the ring, an aryl radical of 6 to 8 carbon atoms, a benzyl radical, an alkoxy radical of 1 to 6 carbon atoms or an aryloxy radical of 6 to 8 carbon atoms; each R' represents hydrogen or an alkyl radical of 1 to 4 carbon atoms; or (b) a cyclopolysiloxazane of the general formulae: ##STR1## in which formulae each R", which may be identical or different, represents a methyl or phenyl radical, at least 40% of these radicals being methyl radicals; m represents an integer of 2 to 5 and the symbols n, which are identical, each is 1 or 2.

Inventors

• 👤 Andre Lesaicherre
• 👤 Louis Linguenheld

Bibliographic Details