Patent CH449916A successfully refreshed from Google Patents.
Patent US4096821A successfully refreshed from Google Patents.
US4096821A
Expired / Lapsed
US
⏱️ 0.0 years remaining
System for fabricating thin-film electronic components
Assignee: Townsend and Townsend Khourie and Crew
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Filing: 1976-12-13
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Granted: 1978-06-27
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Expires: 1996-12-13
Abstract
Abstract A system is disclosed for fabricating thin-film electronic components upon a substrate. A unitary metal aperture mask is utilized which includes a plurality of linearly aligned aperture patterns formed in the unitary mask. The mask is coupled with a linear motion assembly, and an electro-optic sensor which reads position indicating alignment marks upon the mask to provide precise and accurate mask alignment during subsequent fabrication steps in the vacuum deposition process. This system avoids the use of individual deposition masks which must be successively aligned.
Inventors
- 👤 Edwin W. Greeneich
- 👤 William S. Escott
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 23:48
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/04; C23C14/042; H; H10; H10P; H10P72/00; H10P72/50; H10P72/57
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
213 words
A system for fabricating thin-film electronic components upon a substrate comprising: (a) an evacuable chamber connectable to a vacuum system; and within the chamber are disposed, (b) at least one evaporant material source; (c) a substrate holder alignable with the evaporant source; (d) movable aperture mask means comprising guide means on which is movably mounted a mask holder, a unitary elongated aperture mask supported by the mask holder between the substrate holder and the aligned evaporant source, which aperture mask has discrete spaced apart aperture patterns in a linear array, which guide means are linear parallel rails extending in the direction of the linear array of aperture patterns, with the mask holder slidably mounted on said rails so that the aperture mask is constrained to movement in the direction of the linear array, and wherein the aperture mask has light reflective or absorptive alignment position indicia disposed thereon aligned with each of the discrete spaced apart aperture patterns; and (e) position indicia sensing and indicating means including fiber optic means, aligned with the substrate holder and the evaporant source, for directing light onto the aperture mask position indicia and for collecting light from the position indicia to permit determining when a desired aperture pattern is aligned between the evaporant source and the substrate.
Claim 2
Independent Claim
213 words
A system for fabricating thin-film electronic components upon a substrate comprising: (a) an evacuable chamber connectable to a vacuum system; and within the chamber are disposed, (b) at least one evaporant material source; (c) a substrate holder alignable with the evaporant source; (d) movable aperture mask means comprising guide means on which is movably mounted a mask holder, a unitary elongated aperture mask supported by the mask holder between the substrate holder and the aligned evaporant source, which aperture mask has discrete spaced apart aperture patterns in a linear array, which guide means are linear parallel rails extending in the direction of the linear array of aperture patterns, with the mask holder slidably mounted on said rails so that the aperture mask is constrained to movement in the direction of the linear array, and wherein the aperture mask has light reflective or absorptive alignment position indicia disposed thereon aligned with each of the discrete spaced apart aperture patterns; and (e) position indicia sensing and indicating means including fiber optic means, aligned with the substrate holder and the evaporant source, for directing light onto the aperture mask position indicia and for collecting light from the position indicia to permit determining when a desired aperture pattern is aligned between the evaporant source and the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-06-26 | 1981-12-26 | 1982-06-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-06-26 | 1985-12-26 | 1986-06-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-06-26 | 1989-12-26 | 1990-06-27 | $7700.00 | Window Closed / Lapsed |