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US4079405A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor photodetector

Assignee: Hitachi Ltd
•
Filing: 1975-06-24
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Granted: 1978-03-14
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Expires: 1995-06-24
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Abstract

Abstract A semiconductor photodetector comprising a first semiconductor layer having N-type conductivity; a second semiconductor layer having N-type conductivity, disposed in the vicinity of the first semiconductor layer and having a resistivity higher than that of the first semiconductor layer; a third region having P-type conductivity, disposed in the vicinity of the second semiconductor layer and having a thickness smaller than that of the second semiconductor layer; a first main electrode kept in ohmic contact with the first semiconductor layer; and a second main electrode kept in ohmic contact with a portion of the third region, the surface of the third region serving as a light receiving surface.

Inventors

  • 👤 Hirobumi Ohuchi
  • 👤 Masahiro Okamura
  • 👤 Sumio Kawakami
  • 👤 Takuzo Ogawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 12:02
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/22; H10F30/221; H10F99/00; H10F10/00; H10F10/10; Y; Y02; Y02E; Y02E10/00; Y02E10/50

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 160 words
A semiconductor photodetector comprising a semiconductor substrate having a pair of main surfaces and three continuous semiconductor regions between said main surfaces, a first semiconductor region having one conductivity and exposed in one of said main surfaces, a second semiconductor region having the same conductivity, a resistivity higher than that of said first semiconductor region and a thickness of 1-3 μm, and a third semiconductor region having a thickness smaller than that of said second semiconductor region and a conductivity opposite to that of said first and second semiconductor regions, exposed in the other main surface, and forming a PN junction between itself and said second semiconductor region and the surface of said third semiconductor region serving as a light receiving area; a first main electrode in ohmic contact with said first semiconductor region in said one main surface; and a second main electrode in ohmic contact with a portion of said third semiconductor region in said other main surface.
Claim 2
Dependent Claim 160 words
A semiconductor photodetector comprising a semiconductor substrate having a pair of main surfaces and three continuous semiconductor regions between said main surfaces, a first semiconductor region having one conductivity and exposed in one of said main surfaces, a second semiconductor region having the same conductivity, a resistivity higher than that of said first semiconductor region and a thickness of 1-3 μm, and a third semiconductor region having a thickness smaller than that of said second semiconductor region and a conductivity opposite to that of said first and second semiconductor regions, exposed in the other main surface, and forming a PN junction between itself and said second semiconductor region and the surface of said third semiconductor region serving as a light receiving area; a first main electrode in ohmic contact with said first semiconductor region in said one main surface; and a second main electrode in ohmic contact with a portion of said third semiconductor region in said other main surface.
Claim 3
Dependent Claim 29 words
A semiconductor photodetector as claimed in claim 2, wherein the thickness of said third semiconductor region is greater in the peripheral portion thereof than in the other portions thereof.
Claim 4
Dependent Claim 21 words
A semiconductor photodetector as claimed in claim 2, wherein the resistivity of said second semiconductor region is higher than several ohm-cm.
Claim 5
Dependent Claim 54 words
A semiconductor photodetector as claimed in claim 1, wherein said third semiconductor region is an inversion layer formed in the surface of said second semiconductor region by forming an insulator film in said surface of said second semiconductor region through vapor phase chemical reaction and by secondly subjecting said insulator film to heating treatment.
Claim 6
Dependent Claim 18 words
A semiconductor photodetector as claimed in claim 4, wherein said insulator film has a thickness of 0.1-0.4 μm.
Claim 7
Dependent Claim 62 words
A semiconductor photodetector as claimed in claim 2, wherein a fourth semiconductor region having the same conductivity type as said second semiconductor region and an impurity concentration higher than that of said second semiconductor region, is so formed in said second semiconductor region as to encircle said third semiconductor region, with its surface exposed in the surface of said second semiconductor region.
Claim 8
Dependent Claim 21 words
A semiconductor photodetector as claimed in claim 2, wherein the resistivity of said second semiconductor region is higher than several ohm-cm.
Claim 9
Dependent Claim 54 words
A semiconductor photodetector as claimed in claim 3, wherein said third semiconductor region is an inversion layer formed in the surface of said second semiconductor region by forming an insulator film in said surface of said second semiconductor region through vapor phase chemical reaction and by secondly subjecting said insulator film to heating treatment.
Claim 10
Dependent Claim 18 words
A semiconductor photodetector as claimed in claim 8, wherein said insulator film has a thickness of 0.1-0.4 μm.
Claim 11
Dependent Claim 62 words
A semiconductor photodetector as claimed in claim 3 wherein a fourth semiconductor region having the same conductivity type as said second semiconductor region and an impurity concentration higher than that of said second semiconductor region is so formed in said second semiconductor region as to encircle said third semiconductor region, with its surface exposed in the surface of said second semiconductor region.

References Cited (Backward Citations)

US3534231A Cited
US3742317A Cited
US3978511A Cited
US3769558A Cited
US3860945A Cited
US3820235A Cited
US3911465A Cited
US3959646A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-03-13 1981-09-12 1982-03-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-03-13 1985-09-12 1986-03-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-03-13 1989-09-12 1990-03-14 $7700.00 Window Closed / Lapsed

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