Patent US4078102A successfully refreshed from Google Patents.
US4078102A
Expired / Lapsed
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Process for stripping resist layers from substrates
Assignee: International Business Machines Corp
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Filing: 1976-10-29
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Granted: 1978-03-07
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Expires: 1996-10-29
Abstract
Abstract Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
Inventors
- 👤 Diana Jean Bendz
- 👤 Gerald Andrei Bendz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 13:11
CPC Classifications
C; C09; C09D; C09D9/00; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
80 words
A process for removing an organic polymer resist layer from a substrate comprising treating the layer with a mixture consisting essentially of an alcoholic solution of an activator compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates and an aldehyde or ketone in proportions to provide between about 0.005 mole to 0.1 mole of activator compound per mole of aldehyde or ketone so as to remove said resist layer from said substrate.
Claim 2
Dependent Claim
80 words
A process for removing an organic polymer resist layer from a substrate comprising treating the layer with a mixture consisting essentially of an alcoholic solution of an activator compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates and an aldehyde or ketone in proportions to provide between about 0.005 mole to 0.1 mole of activator compound per mole of aldehyde or ketone so as to remove said resist layer from said substrate.
Claim 3
Dependent Claim
21 words
The process of claim 1 wherein the process is carried out at a temperature of from about 30° to 100° C.
Claim 4
Dependent Claim
14 words
The process of claim 1 wherein the activator compound is a strong inorganic base.
Claim 5
Dependent Claim
11 words
The process of claim 3 wherein the base is sodium hydroxide.
Claim 6
Dependent Claim
11 words
The process of claim 1 wherein the mixture includes an aldehyde.
Claim 7
Dependent Claim
11 words
The process of claim 1 wherein the mixture includes a ketone.
Claim 8
Dependent Claim
10 words
The process of claim 6 wherein the ketone is cyclohexanone.
Claim 9
Dependent Claim
27 words
The process of claim 1 wherein the alcoholic solution of the activator compound is a saturated solution in an alcohol which contains 1 to 4 carbon atoms.
Claim 10
Dependent Claim
25 words
The process of claim 1 wherein the proportions provide between about 0.006 mole to 0.01 mole of activator compound per mole of aldehyde or ketone.
Claim 11
Dependent Claim
82 words
A process for removing an organic polymer resist layer from a substrate having a pattern of metal conductor lines formed on its surface comprising treating the layer with a mixture consisting essentially of a saturated isopropyl alcohol solution of sodium hydroxide and cyclohexanone, in proportions to provide between about 0.006 mole to 0.01 mole of activator compound per mole of aldehyde or ketone, at a temperature of about 80° C with agitation so as to remove said resist layer from said substrate.
Claim 12
Dependent Claim
82 words
A process for removing an organic polymer resist layer from a substrate having a pattern of metal conductor lines formed on its surface comprising treating the layer with a mixture consisting essentially of a saturated isopropyl alcohol solution of sodium hydroxide and cyclohexanone, in proportions to provide between about 0.006 mole to 0.01 mole of activator compound per mole of aldehyde or ketone, at a temperature of about 80° C with agitation so as to remove said resist layer from said substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-03-06 | 1981-09-05 | 1982-03-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-03-06 | 1985-09-05 | 1986-03-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-03-06 | 1989-09-05 | 1990-03-07 | $7700.00 | Window Closed / Lapsed |