US4047284A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Self-aligned CMOS process for bulk silicon and insulating substrate device
Assignee: National Semiconductor Corp
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Filing: 1976-06-17
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Granted: 1977-09-13
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Expires: 1996-06-17
Abstract
Abstract The method for fabrication of a self-aligned gate CMOS structure which employs no additional masking steps as compared to the standard CMOS fabrication process, this improved process providing the advantages of self-alignment between the N+ and P+ source and drain diffusions with respect to their gate regions, and metal contact openings which do not overlap the edges of the P+ or N+ source and drain regions. The self-aligning gate region is defined by a silicon nitride gate layer. Several embodiments of the novel process are described.
Inventors
- 👤 Gregorio Spadea
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 20:12
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/13; H10D62/149; H10D62/151; H10D30/00; H10D30/60; H10D30/67; H10D30/674; H10D30/6757; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0165; H10D84/017; H10D84/02; H10D84/03; H10D84/038; H10D84/80; H10D84/82; H10D84/83; H10D84/85; H10D84/858; H10D86/00; H10P; H10P76/00; H10P76/40; Y; Y10; Y10S; Y10S438/00; Y10S438/981
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
291 words
The method for manufacture of a silicon semiconductor device comprising the steps of: forming a first oxide layer over the surface of a semiconductor substrate of a first conductivity type, masking said first oxide layer and thereafter etching an opening in said first oxide layer over a first region in said substrate, diffusing a dopant into said first region to form a region of a second conductivity type in said substrate, removing the remainder of said first oxide layer, forming a second oxide layer over the surface of said substrate, forming a silicon nitride layer over said second oxide layer, masking and etching said silicon nitride and said second oxide layer to form openings therein spaced from said first region, diffusing a dopant through said latter openings to form source and drain regions of said second conductivity type in said substrate, thus forming a silicon oxide layer in said exposed opening, masking and etching said silicon nitride and said second oxide layer to form openings therein over said first region, diffusing a dopant through said latter openings to form source and drain regions of said first conductivity type in said first region, thus forming a silicon oxide layer in said exposed openings, masking and etching a portion of the silicon oxide layer over each of the source and drain regions to form contact openings to said regions, said silicon nitride layer serving as an outer boundary mask for said openings over said source and drain regions, etching away said silicon nitride layer at said gate regions, depositing a metallization layer over the device, masking to define the metal connect and interconnect openings in said metal layer, and etching the metal to form the gate electrodes and the source and drain connects.
Claim 2
Independent Claim
291 words
The method for manufacture of a silicon semiconductor device comprising the steps of: forming a first oxide layer over the surface of a semiconductor substrate of a first conductivity type, masking said first oxide layer and thereafter etching an opening in said first oxide layer over a first region in said substrate, diffusing a dopant into said first region to form a region of a second conductivity type in said substrate, removing the remainder of said first oxide layer, forming a second oxide layer over the surface of said substrate, forming a silicon nitride layer over said second oxide layer, masking and etching said silicon nitride and said second oxide layer to form openings therein spaced from said first region, diffusing a dopant through said latter openings to form source and drain regions of said second conductivity type in said substrate, thus forming a silicon oxide layer in said exposed opening, masking and etching said silicon nitride and said second oxide layer to form openings therein over said first region, diffusing a dopant through said latter openings to form source and drain regions of said first conductivity type in said first region, thus forming a silicon oxide layer in said exposed openings, masking and etching a portion of the silicon oxide layer over each of the source and drain regions to form contact openings to said regions, said silicon nitride layer serving as an outer boundary mask for said openings over said source and drain regions, etching away said silicon nitride layer at said gate regions, depositing a metallization layer over the device, masking to define the metal connect and interconnect openings in said metal layer, and etching the metal to form the gate electrodes and the source and drain connects.
Claim 3
Dependent Claim
23 words
The method as claimed in claim 1 wherein said first conductivity type is N type and said second conductivity type is P type.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-09-12 | 1981-03-14 | 1981-09-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-09-12 | 1985-03-14 | 1985-09-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-09-12 | 1989-03-14 | 1989-09-13 | $7700.00 | Window Closed / Lapsed |