US4026735A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for growing thin semiconducting epitaxial layers
Assignee: Raytheon Co
•
Filing: 1976-08-26
•
Granted: 1977-05-31
•
Expires: 1996-08-26
Abstract
Abstract The specification describes a liquid phase epitaxial (LPE) crystal growth process wherein semi-insulating epitaxial layers of gallium arsenide (GaAs) are formed on selected substrates by dipping the substrates into a saturated solution of GaAs in gallium. Prior to exposing the substrates to the above solution, the substrates are shielded by a nonreactive container of a material possessing a high thermal conductivity which, when immersed in the solution, serves to establish a thermal equilibrium between the substrate and the solution. This insures good nucleation in and crystal growth of the high quality semiconductor layers grown, and these layers may be grown to minimum thicknesses on the order of 0.2 micrometers or less with excellent control.
Inventors
- 👤 G. Sanjiv Kamath
- 👤 Hollen P. Mitchell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 23:24
CPC Classifications
C; C30; C30B; C30B19/00; C30B19/06; C30B19/068; C30B19/062; Y; Y10; Y10S; Y10S117/00; Y10S117/90
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
147 words
A liquid phase epitaxial process for growing thin high quality epitaxial semiconductor layers on a substrate with good nucleation and growth at the epitaxial layer-substrate interface, comprising the steps of: (a) providing a solution of a selected semiconductor material and at a predetermined elevated temperature; (b) enclosing a selected semiconductor substrate in a nonreactive container of a material having a known high thermal conductivity; (c) vertically immersing said container in said solution and maintaining said semiconductor substrate enclosed therein until substantial thermal equilibrium is established between said semiconductor substrate and said solution; (d) bringing said solution to approximately its saturation equilibrium temperature at which epitaxial deposition would normally begin to occur in said solution; and then (e) exposing said semiconductor substrate to said solution, whereby epitaxial growth on said substrate begins under conditions of substantial thermal equilibrium and substantial saturation equilibrium between said substrate and said solution.
Claim 2
Dependent Claim
147 words
A liquid phase epitaxial process for growing thin high quality epitaxial semiconductor layers on a substrate with good nucleation and growth at the epitaxial layer-substrate interface, comprising the steps of: (a) providing a solution of a selected semiconductor material and at a predetermined elevated temperature; (b) enclosing a selected semiconductor substrate in a nonreactive container of a material having a known high thermal conductivity; (c) vertically immersing said container in said solution and maintaining said semiconductor substrate enclosed therein until substantial thermal equilibrium is established between said semiconductor substrate and said solution; (d) bringing said solution to approximately its saturation equilibrium temperature at which epitaxial deposition would normally begin to occur in said solution; and then (e) exposing said semiconductor substrate to said solution, whereby epitaxial growth on said substrate begins under conditions of substantial thermal equilibrium and substantial saturation equilibrium between said substrate and said solution.
Claim 3
Dependent Claim
49 words
The process defined in claim 1 wherein said semiconductor substrate is GaAs and said solution is GaAs in gallium doped with a predetermined amount of chromium sufficient to make epitaxial layers grown on said substrate semi-insulating and having a sheet resistivity greater than at least 10 5 ohm.sup.. centimeters.
Claim 4
Dependent Claim
52 words
The process defined in claim 1 which further includes stirring said solution with said nonreactive container prior to exposing said substrate thereto in order to improve the uniformity of temperature throughout said solution and to improve the doping homogeneity therein, whereby epitaxial layers of substantially uniform electrical and optical properties are obtained.
Claim 5
Dependent Claim
46 words
The process defined in claim 1 wherein the exposure of said semiconductor substrate to said solution includes vertically withdrawing a graphite cover of said nonreactive container from one surface of said substrate while maintaining said substrate in position on a graphite support member of said container.
Claim 6
Dependent Claim
19 words
The process defined in claim 4 wherein said semiconductor substrate is GaAs and said solution is GaAs in gallium.
Claim 7
Dependent Claim
69 words
The process defined in claim 5 which further includes: (a) mounting another GaAs substrate on said nonreactive container to aid in equilibrating said solution, and (b) stirring said solution with said nonreactive container prior to exposing said substrate thereto in order to improve the uniformity of temperature throughout said solution and to improve the doping homogeneity therein, whereby epitaxial layers of substantially uniform electrical and optical properties are obtained.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-05-30 | 1980-11-29 | 1981-05-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-05-30 | 1984-11-29 | 1985-05-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-05-30 | 1988-11-29 | 1989-05-31 | $7700.00 | Window Closed / Lapsed |