US4021242A
Expired / Lapsed
US
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Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
Assignee: HECULES INCORPORATED A CORP OF DE
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Filing: 1975-08-15
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Granted: 1977-05-03
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Expires: 1995-08-15
Abstract
Abstract A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.
Inventors
- 👤 Raymond W. Newyear
- 👤 James M. Lewis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 11:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/029; G03F7/0295; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/109
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
104 words
In a photoresist which consists of a photosensitive composition and a support for said composition, wherein the photosensitive composition consists essentially of (1) an N-vinyl monomer selected from the group consisting of N-vinylamines, N-vinylamides, and N-vinylimides, and (2) an organic halogen compound which splits off free radicals which assist in the polymerization of said monomer when said composition is exposed to a suitable dose of actinic radiation, the improvement which consists in providing as a binder for said N-vinyl monomer and said organic halogen compound, a maleic anhydride modified rosin having an acid number between 80 and 135 and which is soluble in alcohol.
Claim 2
Dependent Claim
104 words
In a photoresist which consists of a photosensitive composition and a support for said composition, wherein the photosensitive composition consists essentially of (1) an N-vinyl monomer selected from the group consisting of N-vinylamines, N-vinylamides, and N-vinylimides, and (2) an organic halogen compound which splits off free radicals which assist in the polymerization of said monomer when said composition is exposed to a suitable dose of actinic radiation, the improvement which consists in providing as a binder for said N-vinyl monomer and said organic halogen compound, a maleic anhydride modified rosin having an acid number between 80 and 135 and which is soluble in alcohol.
Claim 3
Dependent Claim
71 words
The photoresist of claim 1 wherein the N-vinyl monomer is N-vinylcarbazole, and the organic halogen compound is represented by the formula QCX 3 wherein Q is selected from the group consisting of H, Cl, Br, I, alkyl, substituted alkyl, aryl, substituted aryl, aroyl and aralkyl, and each X is selected from the group consisting of Cl, Br and I and all of the X's are not required to be the same.
Claim 4
Dependent Claim
14 words
The composition of claim 2 wherein the organic halogen compound is CHI 3 .
Claim 5
Dependent Claim
14 words
The composition of claim 2 wherein the organic halogen compound is CBr 4 .
Claim 6
Dependent Claim
16 words
The composition of claim 2 wherein the organic halogen compound is C 2 Br 5 .
Claim 7
Dependent Claim
21 words
The composition of claim 1 including in addition at least one sensitizing dye which extends the spectral response of the composition.
Claim 8
Dependent Claim
13 words
The composition of claim 6 wherein the sensitizing dye is a rhodanine dye.
Claim 9
Dependent Claim
27 words
The composition of claim 1 including in addition at least one pigment or dye in an amount sufficient to enhance visual contrast when the resist is developed.
Claim 10
Dependent Claim
34 words
The photoresist of claim 1 wherein the composition comprises the following proportions in parts by weight: organic halogen compound: 10 to 150; N-vinyl compound: 25 to 150; maleic anhydride modified rosin: 100 to 2000.
Claim 11
Dependent Claim
51 words
The photoresist of claim 9 wherin the organic halogen compound is iodoform, the N-vinyl compund is N-vinyl carbazole, and the proportions are between 1:2 and 1:3 by weight and the maleic anhydride modified rosin binder is present between 2.5 and 3 times the combined weight of the iodoform and N-vinyl carbazole.
Claim 12
Dependent Claim
12 words
The resist of claim 1 wherein the support is a metal substrate.
Claim 13
Dependent Claim
11 words
The resist of claim 11 wherein the metal substrate is copper.
Claim 14
Dependent Claim
11 words
The resist of claim 11 wherein the metal is anodized aluminum.
Claim 15
Dependent Claim
10 words
The resist of claim 1 wherein the support is glass.
Claim 16
Dependent Claim
53 words
The process which comprises: preparing a solution of the photosensitive material defined in claim 1; coating the solution onto a solid substrate; drying the coating; imagewise exposing the coating to suitable radiation; heating to complete polymerization of the exposed portions of the coating; and developing the resulting resist with an aqueous alkaline solution.
Claim 17
Dependent Claim
17 words
The process of claim 15 wherein the developing solution has a pH between about 8 and 14.
Claim 18
Dependent Claim
15 words
The process of claim 16 wherein the pH is between about 9.5 and about 11.5.
Claim 19
Dependent Claim
12 words
The composition of claim 2 wherein the organic halogen compound is ααα-tribromoacetophenone.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-05-02 | 1980-11-01 | 1981-05-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-05-02 | 1984-11-01 | 1985-05-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-05-02 | 1988-11-01 | 1989-05-03 | $7700.00 | Window Closed / Lapsed |