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Semiconductor light source on the basis of silicon carbide single crystal

Assignee: Individual
•
Filing: 1973-09-06
•
Granted: 1976-08-03
•
Expires: 1993-09-06
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Abstract

Abstract A semiconductor light source on the basis of n-type silicon carbide single crystal, wherein an epitaxial silicon carbide film of the same type is disposed on the basic single crystal, a p-n junction with a depth of 0.1-2 μm is arranged on the surface of this film, the basic silicon carbide single crystal having a concentration of uncompensated donor atoms of 5.sup.. 10 17 - 5.sup.. 10 18 cm - 3 and a concentration of atoms of secondary impurities not greater than 2.sup.. 10 18 cm - 3 , while the epitaxial film has a concentration of uncompensated donor atoms of 0.8.sup.. 10 18 -3.sup.. 10 18 cm - 3 , a concentration of atoms of secondary impurities of 0.4.sup.. 10 17 -1.5.sup.. 10 17 cm - 3 and a thickness of 5-100 μm.

Inventors

  • 👤 Vadim Ivanovich Pavlichenko

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 23:56
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/822; H10H20/826; Y; Y10; Y10S; Y10S438/00; Y10S438/931

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 96 words
A silicon carbide semiconductor light device capable of electroluminescence, comprising a basic silicon carbide single crystal of low resistance having uncompensated impurity atoms therein of given conductivity type, an epitaxial silicon carbide film thereon having uncompensated impurity atoms therein of said conductivity type, a first layer of low ohmic resistance having impurity atoms therein of opposite conductivity type formed in the surface of said epitaxial film, and a second layer of high ohmic resistance having impurity atoms of said opposite conductivity type and disposed between said first layer and a basic part of said epitaxial film.
Claim 2
Dependent Claim 96 words
A silicon carbide semiconductor light device capable of electroluminescence, comprising a basic silicon carbide single crystal of low resistance having uncompensated impurity atoms therein of given conductivity type, an epitaxial silicon carbide film thereon having uncompensated impurity atoms therein of said conductivity type, a first layer of low ohmic resistance having impurity atoms therein of opposite conductivity type formed in the surface of said epitaxial film, and a second layer of high ohmic resistance having impurity atoms of said opposite conductivity type and disposed between said first layer and a basic part of said epitaxial film.
Claim 3
Dependent Claim 173 words
The silicon carbide semiconductor light device according to claim 1, comprising a basic n-type silicon carbide single crystal having a concentration of uncompensated donor atoms of 5.sup.. 10 17 to 5.sup.. 10 18 cm.sup. -3 and a concentration of atoms of residual impurities not greater than 2.sup.. 10 18 cm.sup. -3 , said basic single crystal offering a low ohmic resistance and being doped with nitrogen and oxygen, an epitaxial n-type silicon carbide film thereon having a concentration of uncompensated donor atoms of 0.8.sup.. 10 18 to 3.sup.. 10 18 cm.sup. -3 , a concentration of atoms of secondary impurities of 0.4.sup.. 10 17 to 1.5.sup.. 10 17 cm.sup. -3 and a thickness of 5-100 μm, a p-layer offering a low ohmic resistance doped with aluminum and boron and having a thickness of 0.1-2 μm formed in the surface of said n-type epitaxial film, and a layer doped with boron of 0.1-1.5 μm offering a high ohmic resistance which is disposed between said p-layer and the basic part of said n-type epitaxial film.
Claim 4
Dependent Claim 47 words
A device according to claim 2, wherein said concentration of uncompensated donor atoms in said basic n-type silicon carbide single crystal in 5.sup.. 10 18 cm.sup. -3 , and said concentration of uncompensated donor atoms in said epitaxial n-type silicon carbide film is 2.8.sup.. 10 18 .

References Cited (Backward Citations)

US3030704A Cited
US2937323A Cited
US3121829A Cited
US3210624A Cited
US3517281A Cited
US3577285A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-08-03 1980-02-02 1980-08-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-08-03 1984-02-02 1984-08-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-08-03 1988-02-02 1988-08-03 $7700.00 Window Closed / Lapsed

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