← Back to Patent Explorer
US3962000A Expired / Lapsed US ⏱️ 0.0 years remaining

Barium aluminoborosilicate glass-ceramics for semiconductor doping

Assignee: OI Glass Inc
•
Filing: 1974-12-20
•
Granted: 1976-06-08
•
Expires: 1994-12-20
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Disclosed is a method for diffusion doping of silicon and germanium semiconductors by the vapor phase transport of B 2 O 3 from a solid B 2 O 3 source to the semiconductor, wherein the solid B 2 O 3 source comprises a rigid, dimensionally stable, glass-ceramic body formed from certain barium aluminoborosilicate parent glass compositions which in mole percent consist essentially of over 40 and up to 60 SiO 2 , 10 to 30 Al 2 O 3 , 20 to 40 B 2 O 3 and 3 to 20 alkaline earth oxides including 1 to 15 BaO.

Inventors

  • 👤 James E. Rapp

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 13:04
CPC Classifications
C; C30; C30B; C30B31/00; C30B31/06; C30B31/16; C30B31/165; C03; C03C; C03C10/00; C03C10/0036; C03C3/00; C03C3/04; C03C3/062; C03C3/064; H; H10; H10P; H10P32/00; H10P32/10; H10P32/12; H10P32/17; H10P32/171; H10P32/19; Y; Y10; Y10S; Y10S252/00; Y10S252/95; Y10S252/951

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 144 words
In the process doping a semiconductor wherein a semiconductor and a glass-ceramic dopant host for vapor phase transport of B 2 O 3 are maintained in vapor phase communication at a temperature and for a time sufficient to form a zone of P-type conductivity in said semiconductor, the improvement comprising using a glass-ceramic dopant host which has been formed by the in-situ thermal crystallization of a barium alumino borosilicate parent glass composition containing less than about 0.5 mol percent of alkali metal oxides and consisting essentially of:Components Mole %SiO 2 40<to 60Al 2 O 3 10 to 30B 2 O 3 20 to 40BaO 1 to 15Alkaline earth 3 to 20oxides selectedfrom the groupconsisting of BaO,MgO, CaO, SrO, andmixtures thereof Al 2 O 3 Wherein 4 ≧ ≧ 1.5 Alkaline earth oxides Wherein the BaO content is about 1-15 mole % of said composition.
Claim 2
Dependent Claim 144 words
In the process doping a semiconductor wherein a semiconductor and a glass-ceramic dopant host for vapor phase transport of B 2 O 3 are maintained in vapor phase communication at a temperature and for a time sufficient to form a zone of P-type conductivity in said semiconductor, the improvement comprising using a glass-ceramic dopant host which has been formed by the in-situ thermal crystallization of a barium alumino borosilicate parent glass composition containing less than about 0.5 mol percent of alkali metal oxides and consisting essentially of:Components Mole %SiO 2 40<to 60Al 2 O 3 10 to 30B 2 O 3 20 to 40BaO 1 to 15Alkaline earth 3 to 20oxides selectedfrom the groupconsisting of BaO,MgO, CaO, SrO, andmixtures thereof Al 2 O 3 Wherein 4 ≧ ≧ 1.5 Alkaline earth oxides Wherein the BaO content is about 1-15 mole % of said composition.
Claim 3
Dependent Claim 60 words
The process of claim 1 wherein said glass-ceramic dopant wafer consists essentially of: Component Mole % SiO.sub.2 40 < to 55 Al.sub.2 O.sub.3 10 to 30 B.sub.2 O.sub.3 20 to 40 BaO 3 to 15 Alkaline earth 5 to 15 oxides Al.sub.2 O.sub.3 Wherein 4 ≧ ≧ 2 Alkaline earth oxides Wherein the BaO component is at least about 3%.
Claim 4
Dependent Claim 13 words
The process of claim 1 wherein said semiconductor is an N-type silicon semiconductor.
Claim 5
Dependent Claim 33 words
The process of claim 3 wherein said silicon semiconductor is contacted with an atmosphere consisting essentially of B 2 O 3 vapors and a carrier gas for said B 2 O 3 vapors.
Claim 6
Dependent Claim 18 words
The process of claim 3 wherein said temperature is in the range of about 1050°C to about 1200°C.
Claim 7
Dependent Claim 20 words
The process of claim 3 wherein said semiconductor and said glass-ceramic dopant host are in the form of thin wafers.
Claim 8
Dependent Claim 34 words
The process of claim 6 wherein a plurality of semiconductor wafers and a plurality of glass-ceramic dopant wafers are alternately positioned with the planar wafer surfaces being substantially parallel and in spaced, confronting relationship.

References Cited (Backward Citations)

US3314833A Cited
US3540895A Cited
US3518510A Cited
US3540951A Cited
US3530016A Cited
US3852128A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-06-08 1979-12-08 1980-06-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-06-08 1983-12-08 1984-06-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-06-08 1987-12-08 1988-06-08 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag