US3916041A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of depositing titanium dioxide films by chemical vapor deposition
Assignee: Westinghouse Electric Corp
•
Filing: 1974-02-14
•
Granted: 1975-10-28
•
Expires: 1994-02-14
Abstract
Abstract A method is provided for depositing thin adherent films of high purity titanium dioxide on a substrate. A gaseous mixture of a titanium tetrahalide, hydrogen and oxygen containing a molar excess of hydrogen is passed over a heated substrate surface. The substrate is heated to a temperature between 227*C. and 927*C. and preferably below 600*C. to provide a reaction between the gaseous mixture which results in the formation of an adherent titanium dioxide on the surface of the substrate.
Inventors
- 👤 Ting L Chu
- 👤 John R Szedon
- 👤 Joseph E Johnson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 09:31
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/405
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
65 words
A METOD FR DEPOSITING A THIN FILM OF TITANIUM DIOXIDE ON A SUBSTRATE, COMPRISING: A. HEATING A SUBSTANTIALLY NON-OXIDIZABLE SUBSTRATE SURFACE TO A TEMPERATURE BETWEEN 227*C. AND 927*C., B. PASSING A GASEOUS MIXTURE OF A TITANIUM TETRAHALIDE VAPOR, HYDROGEN GAS AND OXYGEN GAS CONTAINING A MOLAR EXCESS OF HYDROGEN QVER SAID SUBSTRATE SURFACE TO REACT AND FORM AN ADHERENT TITANIUM DIOXIDE FILM ON SAID SURFACE.
Claim 2
Dependent Claim
65 words
A METOD FR DEPOSITING A THIN FILM OF TITANIUM DIOXIDE ON A SUBSTRATE, COMPRISING: A. HEATING A SUBSTANTIALLY NON-OXIDIZABLE SUBSTRATE SURFACE TO A TEMPERATURE BETWEEN 227*C. AND 927*C., B. PASSING A GASEOUS MIXTURE OF A TITANIUM TETRAHALIDE VAPOR, HYDROGEN GAS AND OXYGEN GAS CONTAINING A MOLAR EXCESS OF HYDROGEN QVER SAID SUBSTRATE SURFACE TO REACT AND FORM AN ADHERENT TITANIUM DIOXIDE FILM ON SAID SURFACE.
Claim 3
Dependent Claim
26 words
A method for depositing a thin film of titanium dioxide as claimed in claim 1 wherein: the substrate surface is heated to a temperature below 600*C.
Claim 4
Dependent Claim
78 words
A method for depositing a thin film of titanium dioxide as set forth in claim 1 wherein: the molar ratios of oxygen and titanium tetrahalide to hydrogen are less than 0.02 to 1. 4. A method for depositing a thin film of titanium dioxide as set forth in claim 3 wherein: the oxygen, hydrogen and titanium tetrahalide are passed over said surface at flow rates of 1.6 X 10 2, 1.0 and 4.2 X 10 4 mole/minute, respectively.
Claim 5
Dependent Claim
25 words
A method for depositing a thin film of titanium dioxide as set forth in claim 1 wherein: said gaseous mixture includes an inert carrier gas.
Claim 6
Dependent Claim
33 words
A method for depositing a thin film of titanium dioxide as set forth in claim 5 wherein: said inert carrier gas is selected from the group consisting of argon, neon, krypton and helium.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-10-27 | 1979-04-28 | 1979-10-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-10-27 | 1983-04-28 | 1983-10-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-10-27 | 1987-04-28 | 1987-10-28 | $7700.00 | Window Closed / Lapsed |