Ion microprobe analyzer

Claim 2

An ion microprobe analyzer comprising: means for generating a primary ion beam; means for bombarding a specimen with said primary ion beam; means for detecting a part of the secondary particles emitted from all elements contained in the specimen as a result of the bombardment thereof by said primary ion beam; means for mass-analyzing a part of the secondary ions in the secondary particles emitted from said specimen; means for detecting ions of an element to be analyzed derived from the secondary ions in the mass-analyzing means; and means for measuring the ratio of the output signals from said means for detecting a part of the secondary particles and said means for detecting ions of an element to be analyzed; whereby the influence of the work function of the bombarded surface of the specimen can be determined so that a measurement of the concentration distribution of an element of the specimen in the direction of the depth of the specimen can be measured precisely.

Claim 3

An ion microprobe analyzer according to claim 1, which further comprises a shielding electrode surrounding the specimen.

Claim 4

An ion microprobe analyzer according to claim 2, in which said means for detecting a part of the secondary particles is provided outside of the shielding electrode.

Claim 5

An ion microprobe analyzer according to claim 2, in which said shielding electrode is made of a conductor mesh in the shape of a hemisphere and has a common potential for the specimen holder and the specimen.

Claim 6

An ion microprobe analyzer according to claim 1, in which said means for detecting a part of the secondary particles is provided between the specimen and said means for mass-analyzing secondary ions.

Claim 7

An ion microprobe analyzer according to claim 1, in which said means for detecting a part of the secondary particles is a monitoring electrode.

Claim 8

An ion microprobe analyzer according to claim 1, in which said means for detecting a part of the secondary particles is a secondary electron multiplier.

Claim 9

An ion microprobe analyzer according to claim 1, further including a ratio circuit connected to said two detecting means, and in which said means for measuring the ratio comprises means for visually indicating the output from the ratio circuit connected to the respective means for detecting a part of the secondary particles and the ions of an element to be analyzed.

Claim 10

An ion microprobe analyzer according to claim 1, in which said means for measuring the ratio comprises means for visually indicating at the same time the outputs from said means for detecting a part of the secondary particles and said means for detecting a part of the secondary ions.

Claim 11

An ion microprobe analyzer according to claim 1, in which said means for mass-analyzing a part of the secondary ions includes an electrostatic sector and a magnetic sector and said means for detecting a part of the secondary particles is provided between said electrostatic sector and said magnetic sector.

Claim 12

An ion microprobe analyzer according to claim 10, further comprising a shielding electrode surrounding the specimen.

Claim 13

An ion microprobe analyzer according to claim 10, in which said shielding electrode is made of a conductor mesh in the shape of a hemisphere and has a common potential for the specimen holder and the specimen.

Claim 14

An ion microprobe analyzer according to claim 10, in which said means for detecting a part of the secondary particles comprises means for converting an ion input to an electron output having a through hole, a scintillater having an electrode, a mesh electrode disposed between said converting means and said scintillater and photo multiplier for receiving light from said scintillater.

Claim 15

An ion microprobe analyzer according to claim 13, which further comprises a shieLding electrode surrounding the specimen.

Claim 16

An ion microprobe analyzer according to claim 13, in which said shielding electrode is made of a conductor mesh in the shape of a hemisphere and has a common potential for the specimen holder and the specimen.

Claim 19

A method of measurement according to claim 16, which further comprises the step of (g) visually indicating said compared results after said step (f) of measuring the ratio.

Claim 20

An ion microprobe analyzer comprising: first means for generating a primary ion beam; second means for directing said primary ion beam onto a specimen, the concentration distribution of an element in which is to be measured; third means for detecting a portion of each of the types of secondary particles emitted from said specimen as a result of the bombardment of said specimen with said primary ion beam and generating a first signal representative thereof; fourth means for mass-analyzing a portion of the secondary ions included among the secondary particles emitted from said specimen; fifth means for detecting the ions of a selected element from the secondary ions mass-analyzed by said fourth means and generating a second signal representative thereof; and sixth means, coupled to said third means and said fifth means, for measuring the ratio of said first and second signals, whereby the influence of the work function of the surface of said specimen bombarded with said primary ion beam can be determined, so that a measurement of the concentration distribution of an element in said specimen with respect to its depth in said specimen from the surface thereof may be precisely effected.

Claim 21

An ion microprobe analyzer comprising: first means for generating a primary ion beam; second means for directing said primary ion beam onto a specimen, the concentration distribution of an element in which is to be measured; third means for detecting a portion of each of the types of secondary particles emitted from said specimen as a result of the bombardment of said specimen with said primary ion beam and generating a first signal representative thereof; fourth means for mass-analyzing a portion of the secondary ions included among the secondary particles emitted from said specimen; fifth means for detecting the ions of a selected element from the secondary ions mass-analyzed by said fourth means and generating a second signal representative thereof; and sixth means, coupled to said third means and said fifth means, for measuring the ratio of said first and second signals, whereby the influence of the work function of the surface of said specimen bombarded with said primary ion beam can be determined, so that a measurement of the concentration distribution of an element in said specimen with respect to its depth in said specimen from the surface thereof may be precisely effected.