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US3858237A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor integrated circuit isolated through dielectric material

Assignee: Toshiba Corp
•
Filing: 1973-05-09
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Granted: 1974-12-31
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Expires: 1993-05-09
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Abstract

Abstract A semiconductor integrated circuit includes a plurality of semiconductor elements formed on one side of a substrate. The semiconductor element is surrounded by a dish-like outer dielectric layer so as to be insulated from the substrate, and includes therein a bottomless inner dielectric layer adjacent to the outer dielectric layer. A PN junction is formed in the region enclosed by the inner layer with the peripheral edge located thereat.

Inventors

  • 👤 K Niwa
  • 👤 E Inaba
  • 👤 H Tsutsumi
  • 👤 Y Sumitomo
  • 👤 H Sawazaki
  • 👤 K Sakai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 17:03
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/20; H10D; H10D99/00; H10W10/00; H10W10/01; H10W10/011; H10W10/019; H10W10/10; Y; Y10; Y10S; Y10S148/00; Y10S148/051; Y10S148/085; Y10S148/122; Y10S438/00; Y10S438/977

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 175 words
A SEMICONDUCTOR INTERGREATED CIRCUIT COMPRISING; A SUPPORT SUBSTRATE (11); A PLURALITY OF BOTTOMED ENCLOSED OUTER DIELECTRIC LAYERS (12) WHOSE ONE END IS OPEN AT ONE SURFACE OF THE SUPPORT SUBSTRATE (11), SAID BOTTOMED OUTER DIELECTRIC LAYERS (12) HAVING SUBSTANTIALLY NO DISCONTINUITIES THEREIN OTHER THAN THE ONE OPEN END; A BOTTOMLESS INNER DIELECTRIC LAYER (13) FORMED WITHIN AND ADJACNT TO THE OUTER DIELECTRIC LAYER (12); AND AN ISLAND REGION (10) HAVING; AN OUTER SEMICONDUCTOR REGION (14) OF POLYCRYSTALLINE MATRIAL DEFINED BETWEEN THE INNER AND OUTER DIELECTRIC LAYERS (13,12); AND AN INNER SEMICONDUCTOR REGION (24,25,26) OF MONOCRYSTALLINE MATERIAL WITHIN THE INNER DIELECTRIC LAYER (13); A TRAISISTOR ELEMENT (16) BEING FORMED IN SAID ISLAND REGION (10) AND HAVING ELECTRODES WHICH ARE POSITIONED ON SAID ONE SURFACE OF SAID SUBSTRATE (11), SAID TRANSISTOR ELEMENT (16) COMPRISING: A BASE REGION (25) OF ONE CONDUCTIVITY TYPE AND SITUATED WITHIN SAID INNER DIELECTRIC LAYER (13); A COLLECTOR REGION (24) OF THE OTHER CONDUCTIVITY TYPE AND INCLUDING A PORTION (15) SITUATED WITHIN SAID INNER DLELECTRIC LAYER (13), SAID COLLECTOR REGION (24) FURTHER INCLUDING
Claim 2
Dependent Claim 175 words
A SEMICONDUCTOR INTERGREATED CIRCUIT COMPRISING; A SUPPORT SUBSTRATE (11); A PLURALITY OF BOTTOMED ENCLOSED OUTER DIELECTRIC LAYERS (12) WHOSE ONE END IS OPEN AT ONE SURFACE OF THE SUPPORT SUBSTRATE (11), SAID BOTTOMED OUTER DIELECTRIC LAYERS (12) HAVING SUBSTANTIALLY NO DISCONTINUITIES THEREIN OTHER THAN THE ONE OPEN END; A BOTTOMLESS INNER DIELECTRIC LAYER (13) FORMED WITHIN AND ADJACNT TO THE OUTER DIELECTRIC LAYER (12); AND AN ISLAND REGION (10) HAVING; AN OUTER SEMICONDUCTOR REGION (14) OF POLYCRYSTALLINE MATRIAL DEFINED BETWEEN THE INNER AND OUTER DIELECTRIC LAYERS (13,12); AND AN INNER SEMICONDUCTOR REGION (24,25,26) OF MONOCRYSTALLINE MATERIAL WITHIN THE INNER DIELECTRIC LAYER (13); A TRAISISTOR ELEMENT (16) BEING FORMED IN SAID ISLAND REGION (10) AND HAVING ELECTRODES WHICH ARE POSITIONED ON SAID ONE SURFACE OF SAID SUBSTRATE (11), SAID TRANSISTOR ELEMENT (16) COMPRISING: A BASE REGION (25) OF ONE CONDUCTIVITY TYPE AND SITUATED WITHIN SAID INNER DIELECTRIC LAYER (13); A COLLECTOR REGION (24) OF THE OTHER CONDUCTIVITY TYPE AND INCLUDING A PORTION (15) SITUATED WITHIN SAID INNER DLELECTRIC LAYER (13), SAID COLLECTOR REGION (24) FURTHER INCLUDING
Claim 3
Dependent Claim 24 words
A semiconductor integrated circuit as claimed iln claim 1 in which said PN junction is parallel to the top surface of the support substrate.
Claim 4
Dependent Claim 20 words
A semiconductor integrated circuit as claimed in claim 1 in which said inner dielectric layer has a bottomless plate shape.
Claim 5
Dependent Claim 25 words
A semiconductor integrated circuit as claimed in claim 1 in which said outer semiconductor region has a uniform distribution of impurities doped in high concentration.
Claim 6
Dependent Claim 44 words
A semiconductor integrated circuit as claimed in claim 1 in which said outer dielectric layer has a peripheral side portion inclined in the same direction as that of the inner dielectric layer and a bottom portion parallel to the top surface of the substrate.

References Cited (Backward Citations)

US3381182A Cited
US3440498A Cited
US3432919A Cited
US3624463A Cited
US3738877A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1977-12-30 1978-07-01 1978-12-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1981-12-30 1982-07-01 1982-12-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1985-12-30 1986-07-01 1986-12-31 $7700.00 Window Closed / Lapsed

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