Patent US5126033A successfully refreshed from Google Patents.
Patent US3790404A successfully refreshed from Google Patents.
US3790404A
Expired / Lapsed
US
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Continuous vapor processing apparatus and method
Assignee: International Business Machines Corp
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Filing: 1972-06-19
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Granted: 1974-02-05
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Expires: 1992-06-19
Abstract
Abstract Apparatus for effecting uniform and continuous mass transport reactions, such as oxidation, diffusion, etching, etc., between a gaseous phase reactant and semiconductor substrates. The apparatus comprises a longitudinal process tube, which includes a reaction zone flanked on either side by a combination entranceexhaust section and an exit-exhaust section. Reactant gas is provided to the reaction zone at a fixed flow rate and allowed to escape from the reaction zone axially through the two exhaust zones. Accurate isolation of the reaction zone is accomplished by passing additional gases into the entrance and exit zones at a rate sufficient to cause some gas to flow into the reaction zone where it is carried away through the exhaust zones by the axially flowing reacting gas.
Inventors
- 👤 R Garnache
- 👤 A Ghatalia
- 👤 R Michaud
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 07:30
CPC Classifications
C; C30; C30B; C30B31/00; C30B31/06; C30B31/10; C30B31/106; C23; C23C; C23C16/00; C23C16/44; C23C16/54; C30B31/16; Y; Y10; Y10S; Y10S438/00; Y10S438/935
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
238 words
Apparatus for continuously effecting mass transport between a gaseous reactant and solid substrate surfaces comprising: a process tube having a longitudinal axis a longitudinal first portion of said tube defining a reaction zone; a longitudinally extending first partition means mounted adjacent to one end of said process zone, said first partition means dividing a longitudinal second portion of said process tube into an upper first gas exhaust zone and a lower substrate entrance zone, a longitudinally extending second partition means mounted adjacent to the other end of said process zone, said second partition dividing a longitudinal third portion of said process tube into an upper second gas exhaust zone and a lower substrate exit zone; a gas inlet means in said reaction zone for providing a continuous flow of a first gaseous reactant through said reaction zone and said first and second exhaust zones; a gas means in said entrance zone for continuously providing a first gas, other than said gaseous reactant, to said entrance zone at a rate sufficient to cause at least some of said first gas to flow into said reaction zone and said first exhaust zone; and a gas inlet means in said exit zone for continuously providing a second gas, other than said gaseous reactant, to said exit zone at a rate sufficient to cause at least some of said second gas to flow into said reaction zone and said second exhaust zone.
Claim 2
Dependent Claim
37 words
The apparatus of claim 2 wherein the linear flow rate of said first gaseous reactant through said reaction and exhaust zones is greater than the diffusion velocity of said first and second gases in said gaseous reactant.
Claim 3
Dependent Claim
18 words
The apparatus for claim 2 wherein said first and sEcond gases are inert to said first gaseous reactant.
Claim 4
Dependent Claim
32 words
The apparatus of claim 3 wherein the flow rate of said gaseous reactant exceeds the diffusion velocity of said first and second gases by a factor of at least 10 to 1.
Claim 5
Dependent Claim
14 words
The apparatus of claim 2 wherein said first gas is a second gaseous reactant.
Claim 6
Dependent Claim
14 words
The apparatus of claim 2 wherein said second gas is a second gaseous reactant.
Claim 7
Dependent Claim
19 words
The apparatus of claim 2 wherein both said first and second gases comprise a second and third gaseous reactant.
Claim 8
Dependent Claim
17 words
The apparatus of claim 2 including heating means to maintain said reaction zone at a predetermined temperature.
Claim 9
Dependent Claim
38 words
The apparatus of claim 2 wherein the ends of said partitions adjacent to said reaction zone include means to restrict the flow of said first and second gases between said entrance and exit zones and said reaction zone.
Claim 10
Dependent Claim
38 words
The apparatus of claim 9 wherein means are provided at the ends of said partition not adjacent to said reaction zone to restrict the flow of said first and second gases out of said entrance and exit zones.
Claim 11
Independent Claim
143 words
The method of continually effecting mass transport between a gaseous phase reactant and a solid substrate in a process tube including a substrate entrance, reaction, and exit zones, comprising the steps of: providing a constant flow rate of a first gaseous reactant to said reaction zone; providing a constant flow rate of said first gas to said entrance zone; passing substrates sequentially through said entrance, reaction, and exit zones; providing a flow of a second gas in increasing increments, starting from zero flow rate, to said exit zone until the effect of said first gaseous reactant on said substrates remains constant and independent of the flow rate of said second gas; and varying the flow rate of said first gas until the effect of said first gaseous reactant on said substrates remains constant and independent of the flow rate of said first gas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-02-04 | 1977-08-06 | 1978-02-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-02-04 | 1981-08-06 | 1982-02-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-02-04 | 1985-08-06 | 1986-02-05 | $7700.00 | Window Closed / Lapsed |