Patent US3784380A successfully refreshed from Google Patents.
US3784380A
Expired / Lapsed
US
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Method for manufacturing artwork for printed circuit boards
Assignee: Bull HN Information Systems Italia SpA
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Filing: 1971-10-28
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Granted: 1974-01-08
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Expires: 1991-10-28
Abstract
Abstract A method is provided for manufacturing matrix artworks for use in fabricating printed circuit boards which includes submitting a photographic plate to subsequent exposures through different masking means, to obtain latent images whose superposition, after development, results in the final artwork. Optical reference means, for ensuring the exact superposition of the latent images, are obtained by partial development of the plate in well defined marginal areas of the same.
Inventors
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Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 17:04
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/0002; H05K2203/00; H05K2203/05; H05K2203/0548; H05K2203/056; Y; Y10; Y10S; Y10S430/00; Y10S430/153
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
225 words
The method for preparing photographic artwork of claim 1, whereby the secondary pad mask is obtained by a process comprising the steps of: contact collimation of an unexposed photographic plate with a master positive mask comprising at least part of the lead connection layout along a first direction, for obtaining, after exposure to substantially parallel light rays, a negative latent image of said part of the lead connection layout, contact collimation of said plate with a master positive mask comprising at least part of the connection lead layout along a second direction, to obtain, after exposure to substantially parallel light rays, a negative latent image of the crossover regions of said connection leads, development of said plate to obtain a negative mask comprising said crossover regions of said connection leads, distance collimation of an unexposed photographic plate with said mask comprising said crossover regions, and exposure of said plate through said mask to a suitable source of diffused substantially uniform at all points, sufficiently distant from said mask to obtain a latent positive image of rounded-off and enlarged regions corresponding in position to said crossover regions, such rounded off and enlarged regions being suitable to be used as a layout of all possible pads, and said process being followed by the development of said plate to obtain a positive secondary mask of the pad layout.
Claim 2
Dependent Claim
195 words
The method for preparing photographic artwork of claim 1, whereby the partial masks comprising respectively the lines of connection leads specific to a printed circuit, along a first direction, are obtained by a process comprising the steps of: providing, by known means, an auxiliary negative mask of the layout of the connection leads specific to a predetermined printed circuit, superimposing said auxiliary negative mask onto a master positive mask of the connection leads along at least one direction in such a way, that the positive image of the connection leads of the master mask covers the negative image of the connection lead lines of said auxiliary mask along the same direction, distant collimation of a photosensitive unexposed film with said two superimposed masks, and exposure to a suitable diffused light source, at suitable distance from said superimposed masks, to obtain a positive latent image enlarged and uninterrupted of these specific connection lead lines which are not covered by the positive images of the master mask, and said process being followed by development of said photosensitive film to obtain a partial positive mask comprising enlarged and uninterrupted lines of the specific connection leads along one direction.
Claim 3
Dependent Claim
112 words
The method for preparing photographic artwork of claim 3, which further includes the steps of obtaining a complete positive mask comprising all enlarged and uninterupted lines of the specific connection leads of a predetermined circuit by distant collimation of an unexposed photosensitive film with only said auxiliary mask, and exposure to a suitable diffused light source suitably removed from said auxiliary mask, followed by development of said film to obtain said complete mask, and wherein said complete mask is employed to delete crossover points of leads, which points are not specific to said printed circuit from said other secondary mask containing all possible connection leads common to a plurality of printed circuits.
Claim 4
Independent Claim
140 words
A method for preparing photographic artwork in the form of a mask, to be used for photoetching a printed circuit, whereby a negative mask comprising all connection leads specific to a single printed circuit is obtained by the use of a secondary complete positive mask comprising all possible connection leads common to a plurality of printed circuits, followed by deleting all the connection lead lines not specific to said printed circuit from a latent image obtained from said complete secondard mask, said deleting being obtained by the combined use of a plurality of partial masks comprising the layout of only the connection leads specific to the desired circuit and of master masks comprising the layout of all possible leads for the whole surface of the printed circuit, a separate mask respectively for each direction of the desired printed circuit leads.
Claim 5
Dependent Claim
208 words
The method for preparing photographic artwork of claim 5, whereby the negative mask comprising all possible connection lead lines specific for printed circuit is obtained by the following steps: contact collimating an unexposed plate with said complete positive mask, to obtain a latent negative image comprising all possible connection leads along every direction and for the whole extension of the surface of the printed circuit, contact collimation of said plate comprising said latent image with a first composite mask obtained by superimposing to a master positive mask of the connection leads along a first direction, a partial positive mask comprising the lines of the connection leads specific for the printed circuit according to a second direction and exposed at illuminating parallel light rays to obtain a first modified latent image, contact collimation of said plate comprising said first modified latent image with a second composite mask obtained superimposing to a master positive mask of the connection leads along said second direction a positive mask comprising the lines of the connection leads specific for the printed circuiT along said first direction, and exposure to parallel light rays to obtain a second modified latent image, said process being followed by development of said plate to obtain the required positive mask.
Claim 6
Dependent Claim
71 words
The method for preparing photographic artworks of claim 6, whereby the plate comprising the second modified latent image is collimated with said complete positive mask comprising all the lines of the specific connection leads, and exposure to parallel illuminating rays to obtain a third modified latent image, followed by development of said plate to obtain a positive mask comprising all and solely the connection lead lines specified by the printed circuit.
Claim 7
Independent Claim
218 words
A method for preparing artwork for photoetching printed circuit boards of the type having pads with connection leads therebetween comprising lines of uniform width arranged along at least two directions, the method comprising: forming a plurality of master masks defining the layout of all possible leads for the entire surface of the printed circuit a separate mask respectively for each of said directions, forming a plurality of secondary masks defining the layout of all possible pads on the surface of the desired printed circuit by exposing a photosensitive medium to a radiation source through said master connection lead masks in an optical photographic process, said master masks and said secondary masks being common for a plurality of printed circuits, and forming a plurality of distinct partial masks defining the layout of the lines of the specific connection leads of each desired printed circuit by exposing a photosensitive medium to a radiation source through said master connection lead masks in an optical photographic process, and employing said partial masks and said master masks in combination to delete all the connection lead lines from another secondary mask containing all possible connection leads common to said plurality of printed circuits by subjecting said other secondary mask to a series of successive exposures by a radiation source through said combination of masks.
Claim 8
Dependent Claim
211 words
The method for preparing photographic artwork of claim 8, whereby the secondary pad mask is formed by the following steps: contact collimating an unexposed photographic plate employing a master positive mask comprising at least part of the lead connection layout along a first direction, for obtaining a negative latent image of said part of the lead connection layout after exposure to substantially parallel light rays; contact collimating said plate with a master positive mask comprising at least part of the connection lead layout along a second direction, to obtain, negative latent image of the crossover regions of said connection leads after exposure to substantially parallel light rays, developing said plate to obtain a negative mask comprising said crossover regions of said connection leads; distance collimating another unexposed photographic plate with said mask comprising said crossover regions, and exposure of said plate through said mask to a suitable source of diffused light substantially uniform at all points, sufficiently distant from said mask to contain a latent positive image of rounded-off and enlarged regions corresponding in position to said crossover regions, such rounded off and enlarged regions being suitable to be used as layout of all possible pads; and developing said other plate to obtain a positive secondary mask of the pad layout.
Claim 9
Dependent Claim
186 words
The method for preparing photographic artwork of claim 8, whereby the partial masks comprising respectively the lines of connection leads specific to a printed circuit, along a first direction, are obtained by a process comprising the following steps: providing, by known means, an auxiliary negative mask of the layout of the specific connection leads of a predetermined printed circuit, superimposing said auxiliary negative mask on a master positive mask of the connection leads along at least one direction such that tHe positive image of the connection leads of the master mask covers the negative image of the connection lead lines of said auxiliary mask along the same direction, distant collimation of a photosensitive unexposed film with said two superimposed masks, and exposure to a suitable diffused light source, at suitable distance from said superimposed masks, to obtain an enlarged and uninterrupted positive latent image of these specific connection lead lines which are not covered by the positive images of the master mask, and developing said photosensitive film to obtain a partial positive mask comprising enlarged and uninterrupted lines of the specific connection leads along one direction.
Claim 10
Dependent Claim
205 words
The method for preparing photographic artwork of claim 8, whereby the negative mask comprising all possible connection lead lines specific for a printed circuit is obtained by the following steps: contact collimating an unexposed plate with said complete positive mask, to obtain a latent negative image comprising all possible connection leads along every direction and for the whole extension of the surface of the printed circuit; contact collimation of said plate comprising said latent image with a first composite mask obtained by superimposing on a master positive mask of the connection leads along a first direction, a partial positive mask comprising the lines of the connection leads specific for the printed circuit along a second direction and exposing said plate to illuminating parallel light rays to obtain a first modified latent image, contact collimating said plate comprising said first modified latent image with a second composite mask obtained by superimposing a master positive mask of the connection leads along said second direction to a positive mask comprising the lines of the connection leads specific for the printed circuit along said first direction, and exposure to parallel light rays to obtain a second modified latent image; and developing said plate to obtain the required positive mask.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-01-07 | 1977-07-09 | 1978-01-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-01-07 | 1981-07-09 | 1982-01-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-01-07 | 1985-07-09 | 1986-01-08 | $7700.00 | Window Closed / Lapsed |