US3594168A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for fabricating photographic artwork for printed circuits
Assignee: General Electric Information Systems SpA
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Filing: 1968-02-12
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Granted: 1971-07-20
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Expires: 1988-02-12
Abstract
Abstract THIS INVENTION RELATES TO A METHOD FOR FABRICATING PHOTOGRAPHIC ARTWORK FOR USE IN THE MANUFACTURE OF PRINTED CIRUCITS, THE ARTWORK BEING OBTAINED THROUGH THE USE OF A FIRST MASK OF HIGH PRECISION PATTERN CLOSE TO A PHOTOSENSITIVE PLATE AND A SECOND MASK FOR OPAQUING SELECTED PORTIONS OF THE PATTERN OF SAID FIRST MASK AND EXPOSING THE SAME TO APPROPRIATE RADIATION. THIS PROCESS IS REPEATED UNTIL THE DESIRED ARTWORK IS OBTAINED.
Inventors
- 👤 Giampiero Compare
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 00:37
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/0002; H05K2203/00; H05K2203/05; H05K2203/0548; H05K2203/056
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-07-19 | 1975-01-18 | 1975-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-07-19 | 1979-01-18 | 1979-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-07-19 | 1983-01-18 | 1983-07-20 | $7700.00 | Window Closed / Lapsed |