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US3725150A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for making a fine geometry, self-aligned device structure

Assignee: Motorola Solutions Inc
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Filing: 1971-10-29
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Granted: 1973-04-03
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Expires: 1991-10-29
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Abstract

Abstract A fine geometry, self-aligned device structure is fabricated by interspersing diffusion and pattern steps, including preferential etching, by which line widths of one micron, and pattern repeat distances of five microns in transistors, are easily attained.

Inventors

  • 👤 W George

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 22:27
CPC Classifications
H; H10; H10P; H10P95/00; H10D; H10D10/00; H10D10/01; H10D10/051; H10D10/056; H10D10/058; H10W; H10W74/00; H10W74/40; Y; Y10; Y10S; Y10S148/00; Y10S148/043; Y10S148/051; Y10S148/053; Y10S148/106; Y10S148/113; Y10S148/114; Y10S148/122

Claims Analysis

Total Claims: 1
Claim 1
Independent Claim 87 words
The process of claim 1 wherein said plurality of layers comprises first, second the third layers of silicon nitride, polycrystalline silicon, and silicon dioxide respectively, and the additional steps of: first etching said polysilicon layer to define said second complementary area before performing said first diffusion to insulate and protect said first and third layers from interreaction and to serve as a mask for a subsequent etch of said first layer; and etching said first layer, using the second layer as a mask, after the first diffusion.

References Cited (Backward Citations)

US3484313A Cited
US3479237A Cited
US3519504A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1976-04-02 1976-10-02 1977-04-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1980-04-02 1980-10-02 1981-04-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1984-04-02 1984-10-02 1985-04-03 $7700.00 Window Closed / Lapsed

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