Patent US3344054A successfully refreshed from Google Patents.
US3344054A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Art of controlling sputtering and metal evaporation by means of a plane acceptor
Assignee: GT Schjeldahl Co
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Filing: 1964-03-02
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Granted: 1967-09-26
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Expires: 1984-03-02
Abstract
No abstract record available.
Inventors
- 👤 Laegreid Nils
- 👤 Roger M Moseson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 15:09
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/54; C23C14/541; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; Y; Y10; Y10S; Y10S148/00; Y10S148/158; Y10S148/169
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
159 words
IN A CATHODE SPUTTERING APPARATUS INCLUDING A CATHODE TARGET COMPRISING A SOURCE OF MATERIAL TO BE DEPOSITED, AN ANODE MEANS FOR PROVIDING AN ELECTRICAL BIAS POTENTIAL BETWEEN SAID ANODE AND SAID CATHODE TARGET, MEANS FOR RECEIVING A SUBSTRATE HAVING A DEPOSITION AREA FOR RECEIVING SAID MATERIAL DISPOSED IN SPACED RELATIONSHIP FROM SAID SOURCE, AND ENERGY MEANS FOR THE SPUTTERING REMOVAL OF SAID MATERIAL FROM SAID SOURCE AND ENABLING THE SPUTTER REMOVED MATERIAL TO MIGRATE TO SAID SUBSTRATE, SAID MEANS FOR RECEIVING SAID SUBSTRATE POSITIONING SAID SUBSTRATE IN THE LINE OF SIGHT OF SAID TARGET, MEANS FOR PROVIDING THE ARRANGEMENT OF A SEED CRYSTAL ON THE SURFACE OF THE SAID SUBSTRATE AT A FIRST INCREMENTAL AREA THEREOF, MASK MEANS DISPOSED IMMEDIATELY ADJACENT SAID SUBSTRATE AND HAVING A SLOT FORMED THEREIN FOR PERIODICALLY EXPOSING A PORTION OF SAID SUBSTRATE SURFACE INCLUSING SAID FIRST INCREMENTAL AREA TO SAID REMOTE SOURCE, MEANS FOR MOVING SAID MASKING MEANS ACROSS THE SAID DDPOSITION AREA, HEATING
Claim 2
Dependent Claim
159 words
IN A CATHODE SPUTTERING APPARATUS INCLUDING A CATHODE TARGET COMPRISING A SOURCE OF MATERIAL TO BE DEPOSITED, AN ANODE MEANS FOR PROVIDING AN ELECTRICAL BIAS POTENTIAL BETWEEN SAID ANODE AND SAID CATHODE TARGET, MEANS FOR RECEIVING A SUBSTRATE HAVING A DEPOSITION AREA FOR RECEIVING SAID MATERIAL DISPOSED IN SPACED RELATIONSHIP FROM SAID SOURCE, AND ENERGY MEANS FOR THE SPUTTERING REMOVAL OF SAID MATERIAL FROM SAID SOURCE AND ENABLING THE SPUTTER REMOVED MATERIAL TO MIGRATE TO SAID SUBSTRATE, SAID MEANS FOR RECEIVING SAID SUBSTRATE POSITIONING SAID SUBSTRATE IN THE LINE OF SIGHT OF SAID TARGET, MEANS FOR PROVIDING THE ARRANGEMENT OF A SEED CRYSTAL ON THE SURFACE OF THE SAID SUBSTRATE AT A FIRST INCREMENTAL AREA THEREOF, MASK MEANS DISPOSED IMMEDIATELY ADJACENT SAID SUBSTRATE AND HAVING A SLOT FORMED THEREIN FOR PERIODICALLY EXPOSING A PORTION OF SAID SUBSTRATE SURFACE INCLUSING SAID FIRST INCREMENTAL AREA TO SAID REMOTE SOURCE, MEANS FOR MOVING SAID MASKING MEANS ACROSS THE SAID DDPOSITION AREA, HEATING
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1970-09-25 | 1971-03-27 | 1971-09-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1974-09-25 | 1975-03-27 | 1975-09-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1978-09-25 | 1979-03-27 | 1979-09-26 | $7700.00 | Window Closed / Lapsed |