Swing type vertical washer

Abstract

Abstract PURPOSE:To uniformalize washing while shortening treating time by composing the device of a rotatory means turning a material to be washed, a rotatory brush vertically contacting with a washing surface, a motor rotating the brush and a driving mechanism advancing and backing the brush in the diameterial direction of the material to be washed. CONSTITUTION:An adsorbing chuck 11, a nose section thereof is opened in a trumpet-shaped form, is fitted to a shaft 10, a semiconductor wafer 12 as the material to be washed is placed on the chuck 11, a hollow inside of the shaft 10 is brought to a decompression conditin, and the wafer 12 is fixed. The rotatory brush 13 is disposed onto the surface of the wafer 12, a brush 13a attached to the nose section is vertically contacted with the surface of the wafer 12, and the brush 13 is turned by means of the motor 14. Oscillating motion is generated at the brush 13 by using the driving mechanism 15, and the brush 13a is advanced and backed on the surface of the wafer 12. The oscillating action of the brush 13 is controlled so that the speed of advance and backing is maximum at a central section of the wafer 12 and ais minimum in an outer circumferential section at that time.

Inventors

• 👤 Noriaki Mori

Bibliographic Details