Patent EP0609012A2 successfully refreshed from Google Patents.
EP0609012A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method for manufacturing a thermal ink-jet print head
Assignee: HP Inc
•
Filing: 1994-01-19
•
Granted: —
•
Expires: 2014-01-19
Abstract
Abstract An ink fill slot 18 can be precisely manufactured in a substrate 12 utilizing photolithographic techniques with chemical etching, plasma etching, or a combination thereof. These methods may be used in conjunction with laser ablation, mechanical abrasion, or electromechanical machining to remove additional substrate material in desired areas. The ink fill slots may be appropriately configured to provide the requisite volume of ink at increasingly higher frequency of operation of the printhead.
Inventors
- 👤 Kit C. Baughman
- 👤 Jeffrey A. Kahn
- 👤 Paul H. Mcclelland
- 👤 Kenneth E. Trueba
- 👤 Ellen R. Tappon
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 06:47
CPC Classifications
B; B41; B41J; B41J2/00; B41J2/005; B41J2/01; B41J2/135; B41J2/14; B41J2/14016; B41J2/14032; B41J2/1404; B41J2/14145; B41J2/16; B41J2/1601; B41J2/1603; B41J2/1621; B41J2/1626; B41J2/1628; B41J2/1629; B41J2/1631; B41J2/1632; B41J2/1634
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
455 words
A method for fabricating ink fill slots 18 for fluidically communicating with ink feed channels 14 in thermal ink-jet printheads 13 , comprising: (a) providing a silicon substrate 12 having a <100> or <110> crystallographic orientation and two opposed, substantially parallel major surfaces 12a , 12b , defining a primary surface 12a and a secondary surface 12b; (b) forming an insulating dielectric layer 26 on both said surfaces 12a , 12b; (c) patterning said insulating dielectric layer 26 on said secondary surface 12b to expose underlying portions of said silicon substrate 12 ; (d) etching part way through said silicon substrate 12 with an anisotropic etchant at said exposed portions to thereby form a portion 18' of said ink fill slot 18 ; and either (e1) forming and defining thin film resistor elements 16 and conductive traces on said insulating dielectric layer 26 on said primary surface 12a ; (f1) etching from said primary surface 12a to connect with said portion of said ink fill slot 18' to thereby completely form said ink fill slot 18 and to extend the portion of said ink fill slot 18 terminating at said primary surface toward said ink feed channels 14 to cause a widening thereof 18a ; and (g1) forming a barrier layer 17 on the major surface of said dielectric material 26 and defining openings therein to expose said resistor elements 16 to define a drop ejection chamber 15 and to provide said ink feed channels 14 from each said resistor element 16 to a terminus region A , said terminus region A fluidically communicating with said ink fill slot 18 for introducing ink from a reservoir to said drop ejection chamber 15 , whereby the shelf length defined by the distance from the entrance to said ink feed channel 14 and said ink fill slot 18 is decreased; or (e2) forming a barrier layer 17 on the major surface of said dielectric material 26 and defining openings therein to expose said resistor elements 16 to define a drop ejection chamber 15 and to provide an ink feed channel 14 from each said resistor element 16 to a terminus region A , said terminus region A fluidically communicating with said ink fill slot 18 for introducing ink from a reservoir to said drop ejection chamber 15 , said ink fill slot 18 precisely defined relative to said terminus region A ; and (f2) micromachining from said secondary surface 12b to connect with said portion 18' of said ink fill slot 18 to thereby completely form said ink fill slot 18 , whereby the shelf length defined by the distance from the entrance to said ink feed channel 14 and said ink fill slot 18 is decreased.
Claim 2
Dependent Claim
35 words
The method of Claim 1 further comprising providing a nozzle plate 22 with nozzle openings 20 , each nozzle opening 20 operatively associated with a resistor element 16 to define an ink-propelling element 10 .
Claim 3
Dependent Claim
49 words
The method of Claim 2 wherein said terminus region A is provided with a pair of opposed projections 24 formed in walls in said layer 17 defining said ink feed channel 14 and separated by a width B to cause a constriction in said ink feed channel 14 .
Claim 4
Dependent Claim
36 words
The method of Claim 3 wherein each ink-propelling element 10 is provided with lead-in lobes 24a disposed between said projections 24 and separating one ink feed channel 14 from a neighboring ink feed channel 14 .
Claim 5
Dependent Claim
18 words
The method of Claim 4 wherein said ink fill slot 18a extends to said lead-in lobes 24a .
Claim 6
Dependent Claim
52 words
The method of Claim 5 wherein said extended portion 18a of said ink fill slot 18 either terminates at a fixed location and constant distance from the centerline of said ink fill slot 18 of follows the contour of said barrier layer 17 to provide an equalized shelf length S L .
Claim 7
Dependent Claim
35 words
The method of Claim 1 wherein said etching through said primary surface 12a to completely form said ink fill slot 18 in Step (f1) is done by at least one of anisotropic and isotropic etching.
Claim 8
Dependent Claim
28 words
The method of Claim 1 wherein said micromachining from said secondary surface 12b in Step (f2) is done by one of mechanical abrasion, laser ablation, or electromechanical machining.
Claim 9
Dependent Claim
22 words
An improved ink-jet printhead 13 including a plurality of ink-propelling elements 10 , formed by any of the methods of Claims 1-8.
Claim 10
Dependent Claim
18 words
The ink-jet printhead 13 of Claim 10 wherein said shelf length ranges from about 10 to 50 µm.
References Cited (Backward Citations)
US4601777A
Cited
US4612554A
Cited
US4638337A
Cited
US4789425A
Cited
US4882595A
Cited
US4829324A
Cited
US4863560A
Cited
US4851371A
Cited
US4899181A
Cited
US4875968A
Cited
US4899178A
Cited
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.