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EP0517033A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Cleaning device for wafer mount plate

Assignee: Enya Systems Ltd
•
Filing: 1992-05-20
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Granted: —
•
Expires: 2012-05-20
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Abstract

Abstract A cleaning device for a wafer mount plate (6) formed into a disk-like shape having a surface for mounting wafers thereon by an adhesive. The wafer mount plate is rotatably mounted on a receiving roller (7) and is rotated round its own axis horizontally by bringing a driving roller (29) into contact with the peripheral side surface of the mount plate. An upper surface washing brush (31), a lower surface washing brush (31) and a side surface washing brush (33) are provided against the wafer mount plate, which are facing to the upper surface, lower surface and peripheral side surface of the wafer mount plate, respectively. Whole surface of the wafer mount plate is washed at the same time by bringing respective brushes into slidable contact with the wafer mount plate. After washing, the wafer mount plate is dried by blowing a gas (78,79) thereto.

Inventors

  • 👤 Shizuo Suzuki
  • 👤 Noriyoshi Yokosuka

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-03 22:33
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0412; B; B24; B24B; B24B37/00; B24B37/34; B24B37/345; B08; B08B; B08B1/00; B08B1/30; B08B1/32; B08B1/34; B08B1/36; F; F26; F26B; F26B11/00; F26B11/18; F26B21/00; F26B21/50; H10P72/0408; H10P72/30; H10P72/32; H10P72/3202; Y; Y10; Y10S; Y10S134/00; Y10S134/902

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 147 words
A cleaning device for a wafer mount plate formed into a disk-like shape having a surface for mounting wafers thereon by an adhesive, characterised in that the cleaning device comprises a receiving roller (7) supporting the wafer mount plate (6) so as to rotate the wafer mount plate round its own axis horizontally, an upper surface washing brush (31) being slidably in contact with an upper surface of the wafer mount plate (6), a lower surface washing brush (32) being slidably in contact with a lower surface of the wafer mount plate (6), and a side surface washing brush (33) being slidably in contact with a peripheral side surface of the wafer mount plate (6), wherein the whole surface of the wafer mount plate is washed by brushing at the same time while applying a washing liquid thereto, and then blowing a gas thereto to dry it.
Claim 2
Dependent Claim 48 words
The cleaning device for the wafer mount plate according to Claim 1, which further comprises a driving roller or rollers (29) being in contact with the peripheral side surface of the mount plate for rotating the mount plate (6) round its own axis on the receiving roller (7).
Claim 3
Dependent Claim 25 words
The cleaning device for the wafer mount plate according to Claim 2, wherein three driving rollers (29) are provided to surround the wafer mount plate.
Claim 4
Dependent Claim 47 words
The cleaning device for the mount plate according to Claim 1, wherein each of the upper surface washing brush (31), the lower surface washing brush (32) and the side surface washing brush (33) can be brought into and out of contact with the wafer mount plate (6).
Claim 5
Dependent Claim 44 words
The cleaning device for the wafer mount plate according to Claim 1, which further comprises nozzles (78), (79) which blow a gas to the wafer mount plate (6), and each are pivotally mounted against the upper or lower surface of the wafer mount plate.

References Cited (Backward Citations)

EP0402520A2 Cited

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