Ultrahigh-purity ferroelectric thin film
Abstract
Abstract Disclosed herein is an ultrahigh-purity ferroelectric thin film of Pb-containing ferroelectric represented by the formula Pb 1-x La x (Zr y Ti 1-y ) 1-x/4 O₃ (where Y is 0 or 1 or a decimal smaller than 1), characterized in that the total content of alkali metal impurities therein is less than 1 ppm, or characterized in that the total content of alkali metal impurities therein is less than 0.1 ppm and the total content of U and Th therein is less than 10 ppb. It will find use as infrared sensor, piezoelectric filter, vibrator, laser modulator, optical shutter, capacitor film, nonvolatile memory, etc. owing to its very low level of leakage current.
Inventors
- 👤 Katsumi C/O Mitsubishi Materials Corp. Ogi
- 👤 Nobuyuku C/O Mitsubishi Materials Corp. Soyama
Bibliographic Details
Claims Analysis
Total Claims: 4References Cited (Backward Citations)
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