Patent US3982610A successfully refreshed from Google Patents.
Patent EP0476480A1 successfully refreshed from Google Patents.
EP0476480A1
Expired / Lapsed
EP
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Vacuum film forming apparatus
Assignee: Canon Anelva Corp
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Filing: 1991-09-10
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Granted: —
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Expires: 2011-09-10
Abstract
Abstract A film forming apparatus comprises a vacuum vessel (6) having a first vacuum chamber (6a) with an associated first evacuating means (7) and a second vacuum chamber (6b) with an associated second evacuating means (9). A substrate heater (3) is arranged in the first vacuum chamber (6a) and a gas supplying means (8) is arranged in said second vacuum chamber (6b). A substrate holder (1) holds the film forming surface of a substrate (2) so that said film forming surface is oriented toward the second vacuum chamber. The substrate holder (1) is arranged so as to isolate said first and second vacuum chambers from each other.
Inventors
- 👤 Ken-Ichi C/O Anelva Corporation Aketagawa
- 👤 Junro C/O Anelva Corporation Sakai
- 👤 Shun-Ichi C/O Anelva Corporation Murakami
- 👤 Hiroyoshi C/O Anelva Corporation Murota
- 👤 Toru Tatsumi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 22:50
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/564; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/54
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
146 words
A vacuum film forming apparatus comprising a vacuum vessel (6), a substrate heater (3), gas supplying means and a substrate holder (1) serving to hold a substrate (2) characterized in that said vacuum vessel (6) includes a first vacuum chamber (6a) and a second vacuum chamber (6b); first evacuating means (7) is communicated with said first vacuum chamber (6a); second evacuating means (9) is communicated with said second vacuum chamber (6b); said substrate heater (3) is arranged in said first vacuum chamber (6a), said gas supplying means (8) is arranged in said second vacuum chamber (6b); and said substrate holder (1) is arranged at a position where said first vacuum chamber and said second vacuum chamber are isolated from each other with said substrate holder interposed therebetween together with a substrate (2) having a film forming surface which is oriented toward said second vacuum chamber (6b).
Claim 2
Dependent Claim
146 words
A vacuum film forming apparatus comprising a vacuum vessel (6), a substrate heater (3), gas supplying means and a substrate holder (1) serving to hold a substrate (2) characterized in that said vacuum vessel (6) includes a first vacuum chamber (6a) and a second vacuum chamber (6b); first evacuating means (7) is communicated with said first vacuum chamber (6a); second evacuating means (9) is communicated with said second vacuum chamber (6b); said substrate heater (3) is arranged in said first vacuum chamber (6a), said gas supplying means (8) is arranged in said second vacuum chamber (6b); and said substrate holder (1) is arranged at a position where said first vacuum chamber and said second vacuum chamber are isolated from each other with said substrate holder interposed therebetween together with a substrate (2) having a film forming surface which is oriented toward said second vacuum chamber (6b).
Claim 3
Dependent Claim
62 words
The apparatus as claimed in claim 1, characterized in that said substrate holder (1) comprises a device (1 b, 4, 5) serving as an isolating member for gastightly isolating said first vacuum chamber (6a) from said second vacuum chamber (6b) while holding said substrate (2) thereon, said member being vertically displaceably arranged on an inner wall (6c) of said vacuum vessel (6).
Claim 4
Dependent Claim
36 words
The apparatus as claimed in claim 1 or 2 characterized in that said substrate holder (1) is constituted by using a same material as that of a thin film to be deposited on said substrate (2).
Claim 5
Independent Claim
53 words
The apparatus as claimed in any of claims 1 to 3 further including actuating means (5) for displacing said substrate holder (1) so as to allow said substrate (2) to be replaced with another one, said actuating means being arranged at a position outside of said vacuum vessel (6) in an environment atmosphere.
Claim 6
Independent Claim
22 words
The apparatus as claimed in any of claims 1 to 4, characterized in that said substrate heater (3) comprises an electric heater.
Claim 7
Independent Claim
32 words
The apparatus as claimed in any of claims 1 to 5, characterized in that said gas supplying means (8) comprises a nozzle through which a gas is blown toward said substrate (2).
Claim 8
Independent Claim
39 words
The apparatus as claimed in any of claims 1 to 6, characterized in that said evacuating means (7, 9) arranged for each of said first vacuum chamber (6a) and said second vacuum chamber (6b) comprises a turbo molecular pump.
Claim 9
Independent Claim
51 words
The apparatus as claimed in any of claims 1 to 7, characterized in that an evacuating capacity of said evacuating means (7) arranged for said first vacuum chamber (6a) is determined to be smaller than an evacuating capacity of said second evacuating means (9) arranged for said second vacuum chamber (6b).
Claim 10
Independent Claim
29 words
The apparatus as claimed in any of claims 1 to 8, characterized in that a thin film to be deposited on said substrate (2) is an epitaxial silicon film.
References Cited (Backward Citations)
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