Patent EP0462563A1 successfully refreshed from Google Patents.
EP0462563A1
Expired / Lapsed
EP
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Treating apparatus for semiconductor
Assignee: Tokyo Electron Ltd
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Filing: 1991-06-18
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Granted: —
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Expires: 2011-06-18
Abstract
Abstract A treating apparatus is adapted to introduce a gas between a semiconductor wafer (6) and a mounting table (2) used also as a lower electrode so that heat transfer between the wafer (6) and the mounting table (2) is efficiently carried out and consequently cooling the wafer (6) effectively. The treating apparatus has means for controlling an amount of a heat-transfer medium gas introduced into a gap between the wafer (6) and the mounting table (2) so as to maintain pressure of the heat-transfer medium gas to a constant value. A plurality of gas inlets (13a) are formed in the mounting table (2) so that they maintain pressure in the gap between the wafer (6) and the mounting table (2) to a uniform value. A synthetic resin film (5) is formed on a face of the mounting table (2) which is disposed opposed to the wafer (6).
Inventors
- 👤 Izumi Arai
- 👤 Yoshifumi Tahara
- 👤 Takao Horiuchi
- 👤 Kunitoshi Fujisawa
- 👤 Hiroshi 305 Green-Heim-Midoriyama Kojima
- 👤 Makoto 101 Verdée-Ichigao Aoki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 01:27
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/0451; H10P72/0452; H10P72/0431; H10P72/0434; H10P72/70; H10P72/78
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
84 words
A treating apparatus for treating an article to be treated under a reduced pressure by adjusting temperature of said article through a heat-transfer medium gas, comprising: a base member (2) for holding an article to be treated; means (13) for introducing a heat-transfer medium gas into a gap between said article (6) and said base member (2); and means for controlling an amount of said heat-transfer medium gas introduced into said gap to maintain pressure of said heat-transfer medium gas to a constant value.
Claim 2
Dependent Claim
56 words
The treating apparatus according to claim 1, characterized in that said pressure maintaining means comprises means (17) for controlling an amount of flow of said heat-transfer medium gas, means (19) for detecting said pressure of said heat-transfer medium gas, and means (22, 24) for exhausting said heat-transfer medium gas in response to a detected pressure signal.
Claim 3
Dependent Claim
39 words
The treating apparatus according to claim 1, characterized in that said base member (2) is provided with a plurality of gas inlets (13a) for retaining uniform pressure in said gap between said article (6) and said base member (2).
Claim 4
Dependent Claim
24 words
The treating apparatus according to claim 1, characterized in that said base member (2) has a uniform-load face disposed opposed to said article (6).
Claim 5
Dependent Claim
33 words
The treating apparatus according to claim 1, characterized in that said base member (2) has a face which is disposed opposed to said article (6) and formed with a synthetic resin film (5).
Claim 6
Dependent Claim
32 words
The treating apparatus according to claim 1, characterized by further comprising means (8) for pressing a peripheral portion of said article (6) against said base member (2) and holding said article (6).
Claim 7
Dependent Claim
30 words
The treating apparatus according to claim 1, which is an apparatus selected from the group consisting of an etching apparatus, an ashing apparatus, an ion-implanting apparatus and a spattering apparatus.
Claim 8
Dependent Claim
76 words
A treating apparatus for treating an article to be treated under a reduced pressure by adjusting temperature of said article through a heat-transfer medium gas, comprising: a base member (2) for holding an article (6) to be treated; means (13) for introducing a heat-transfer medium gas into a gap between said article and said base member; and a plurality of gas inlets (13a) formed in said base member (2) for maintaining uniform pressure in said gap.
Claim 9
Dependent Claim
17 words
The treating apparatus according to claim 8, characterized in that said gas inlets (13a) are arranged concentrically.
Claim 10
Dependent Claim
24 words
The treating apparatus according to claim 8, characterized in that said base member (2) has a uniform-load face disposed opposed to said article (6).
Claim 11
Dependent Claim
33 words
The treating apparatus according to claim 8, characterized in that said base member (2) has a face which is disposed opposed to said article (6) and formed with a synthetic resin film (5).
Claim 12
Dependent Claim
32 words
The treating apparatus according to claim 8, characterized by further comprising means (8) for pressing a peripheral portion of said article (6) against said base member (2) and holding said article (6).
Claim 13
Dependent Claim
27 words
The treating apparatus according to claim 8, which is an apparatus selected from the group consisting of an etching apparatus, an ion-implanting apparatus and a spattering apparatus.
Claim 14
Dependent Claim
89 words
A treating apparatus for treating an article to be treated under a reduced pressure by adjusting temperature of said article through a heat-transfer medium gas, comprising: a base member (2) for holding an article (6) to be treated, said base member (2) having a face disposed opposed to an article (6) to be treated; means (13) for introducing a heat-transfer medium gas into a gap between said article (6) and said base member (2); and a synthetic resin film (5) formed on said face of said base member (2).
Claim 15
Dependent Claim
20 words
The treating apparatus according to claim 14, characterized in that said synthetic resin film (5) is made of polyimide-based resin.
Claim 16
Dependent Claim
21 words
The treating apparatus according to claim 14, characterized in that said face of said base member 2 is a uniform-load face.
Claim 17
Dependent Claim
30 words
The treating apparatus according to claim 14, which is an apparatus selected from the group consisting of an etching apparatus, an ashing apparatus, an ion-implanting apparatus and a spattering apparatus.
Claim 18
Dependent Claim
156 words
A treating apparatus comprising: a storage section (32) for storing a plurality of articles; alignment means (34) for positioning the articles; transport means (33) for transporting the articles from said storing section (32) to said alignment means (34); and processing means (35) for treating the articles positioned by said alignment means (34), said processing means (35) having a load-locking chamber (43) for storing the articles, and a processing chamber (42) in which the articles transferred from said load-locking chamber (43) are to be treated, said processing chamber (42) comprising a mounting table on which the articles are to be placed, means for introducing gas capable of transferring heat between the articles and mounting table, and means for controlling the flow of the gas, thereby to maintain the pressure of the gas at a predetermined value, characterized in that the articles are treated under a reduced pressure, while adjusting the temperature of the articles with the gas.
Claim 19
Independent Claim
98 words
An apparatus having a vacuum vessel comprising: a base member (2) for holding an article (6) to be heat-transferred; means (13) for introducing a heat-transfer medium gas into a gap defined between the article (6) to be heat-transferred and the base member (2); and means for controlling an amount of the heat-transfer medium gas introduced into the gap so as to maintain pressure of the heat-transfer medium gas to a constant value whereby heat transfer is carried out through the article (6) under a reduced pressure by adjusting temperature of the article (6) through the heat-transfer medium gas.
References Cited (Backward Citations)
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