EP0171011A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Electrostatic chuck
Assignee: Tokuda Seisakusho Co Ltd
•
Filing: 1985-07-29
•
Granted: —
•
Expires: 2005-07-29
Abstract
Abstract An electrostatic chuck for holding a work by electrostatic forces, which has an electrostatic attraction body for attracting the work, an electrostatic conductive support body for supporting the electrostatic attraction body, channels for passing cooling medium therethrough and cover means for covering the exposed surfaces of the support body except a portion thereof over which the work is placed. This chuck can not only prevent impure matters from generating from the surfaces of the support body but also prevent damages due to heat.
Inventors
- 👤 Hirosuke C/O K. K. Tokuda Seisakusho Ooshio
- 👤 Osamu C/O K. K. Tokuda Seisakusho Watanabe
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-25 21:58
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/72; H10P72/722; Y; Y10; Y10T; Y10T279/00; Y10T279/23
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
160 words
An electrostatic chuck for holding a work such as specimen wafer (A) by electrostatic forces which has: an electrostatic attraction body (3) for attracting the work at its surface, including an electrode (2) and an insulator layer having the electrode (2) therein; an electric conductive support body (1) for supporting the lower surface of the electrostatic attraction body (3); and an electric connection portion for connecting the electrode with a power supply, characterized in that the chuck comprises: a) cover means (8, 8b, 8c) provided at least on the same side as the electrostatic attraction body with respect to the support body, for covering the exposed surfaces of the support body except a portion on which the electrostatic attraction body is placed so that impure matters are prevented from generating therefrom; and b) channel means provided in at least either the electrostatic attraction body (3) or electric conductive support body (1) for passing cooling medium to cool the electrostatic chuck.
Claim 2
Dependent Claim
160 words
An electrostatic chuck for holding a work such as specimen wafer (A) by electrostatic forces which has: an electrostatic attraction body (3) for attracting the work at its surface, including an electrode (2) and an insulator layer having the electrode (2) therein; an electric conductive support body (1) for supporting the lower surface of the electrostatic attraction body (3); and an electric connection portion for connecting the electrode with a power supply, characterized in that the chuck comprises: a) cover means (8, 8b, 8c) provided at least on the same side as the electrostatic attraction body with respect to the support body, for covering the exposed surfaces of the support body except a portion on which the electrostatic attraction body is placed so that impure matters are prevented from generating therefrom; and b) channel means provided in at least either the electrostatic attraction body (3) or electric conductive support body (1) for passing cooling medium to cool the electrostatic chuck.
Claim 3
Dependent Claim
54 words
An electrostatic chuck as set forth in claim 1 in which the support body (1) has, at its center, a round protrusion (la) on which the electrostatic attraction body (3) is placed, and the cover means is formed of a cover plate (8) with an aperture (8a) in which the work (A) is placed.
Claim 4
Dependent Claim
62 words
An electrostatic chuck as set forth in claim 1 in which the support body (1) has an annular groove (9) for forming a protrusion (la) on which the electrostatic attraction body (3) is placed, a cover ring (8c) is placed in the groove (9), and the other surfaces of the support body except the groove are covered by a cover plate (8b).
Claim 5
Dependent Claim
23 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is made of a ceramic material.
Claim 6
Dependent Claim
24 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is made of a heat-resistant synthetic resin.
Claim 7
Dependent Claim
26 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is in the form of an anodic oxidation layer.
Claim 8
Dependent Claim
28 words
An electrostatic chuck as set forth in claim 1 in which the support body (1) comprises a material with a high thermal conductivity such as copper or aluminum.
Claim 9
Dependent Claim
90 words
An electrostatic chuck as set forth in claim 1 in which said insulator layer of said electrostatic attraction body (3) is formed of an organic resin layer such as a polyimide.layer or a polyester layer with the thickness of 10 to 100 µm, and said electrode is made either of a metallic film with the thickness of 10 to 50 µm or of a metallic film formed by means of vacuum evaporation or sputtering on an insulator film of the insulator layer with the thickness of less than 2 µm.
Claim 10
Dependent Claim
32 words
An electrostatic chuck as set forth in claim 1 in which the attracting surface of said electrostatic attraction body (3) is smaller than the surface, to be attracted, of the work (A).
Claim 11
Dependent Claim
49 words
An electrostatic chuck as set forth in claim 1 in which said chuck has a loading mechanism for loading and unloading the work and the electrostatic attraction body and the support body (1) have apertures for permitting the vertical movement of the moving portion of said loading mechanism, respectively.
Claim 12
Dependent Claim
34 words
An electrosatic chuck as set forth in claim 1 in which said electrostatic attraction body (3) further has an adhesive layer (6) as a means to securely affix itself onto the support body (1).
Claim 13
Dependent Claim
46 words
An electrostatic chuck as set forth in claim 1 in which the electric connection portion (3a) is extended from the main body (3b) of electrostatic attraction body (3) outwardly between the cover means (8) and the spport body (1) for connection with the external power source.
Claim 14
Dependent Claim
42 words
An electrostatic chuck as set forth in claim 1 in which the electric connection portion (3a) is extended outwardly from the main body (3b) of the electrostatic attraction body (3) through said support body (1) for connection to the external power source.
Claim 15
Dependent Claim
29 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is securedly affixed onto the support body by means of an adhesive.
Claim 16
Dependent Claim
28 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is securely held onto the support body by means of screws.
Claim 17
Dependent Claim
48 words
An electrostatic chuck as set forth in claim 1 in which the cover means (8, 8b, 8c) is simply placed upon the support body or is clamped upon the support body by means of a clamping member provided on the periphery of said cover means (8, 8b, 8c).
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.