Patent EP0253361A1 successfully refreshed from Google Patents.
EP0253361A1
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Thin film forming device
Assignee: Mitsubishi Electric Corp
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Filing: 1987-07-14
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Granted: —
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Expires: 2007-07-14
Abstract
Abstract A thin film forming device comprises a vacuum tank (1 a) held at the predetermined degree of vacuum; a substrate (2) placed in the vacuum tank; an internal tank (32) disposed in the vacuum tank (1 a) and having an opening opposite to the substrate (2); gas jet nozzles (33,34) arranged in the internal tank (32) and connected with reactive gas sources (6, 7) outside the vacuum tank (1a) for jetting reactive gases of different types toward the substrate (2) through the opening of the internal tank (32); and electron beam irradiation means (37) disposed close to a passage, through which the reactive gases jetted from the gas jet nozzles (33, 34) pass, for irradiating electron beams to the reactive gases.
Inventors
- 👤 Hiroki C/O Mitsubishi Denki K.K. Ito
- 👤 Teruo C/O Mitsubishi Denki K.K. Ina
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 09:28
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/452; C23C16/48; C23C16/487; C23G; C23G5/00; H; H10; H10P; H10P14/00; H10P14/20; H10P14/24; H10P72/00; H10P72/04; H10P72/0402
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
111 words
A thin film forming device comprising; a vacuum tank held at the predetermined degree of vacuum; a substrate placed in said vacuum tank; a single internal tank disposed in said vacuum tank and having an opening opposite to said substrate; a plurality of gas jet nozzles arranged in said internal tank and connected with a plurality of reactive gas sources outside said vacuum tank for jetting reactive gases of different types toward said substrate through the opening of said internal tank; and electron beam irradiation means disposed close to a passage, through which the reactive gases jetted from said gas jet nozzles pass, for irradiating electron beams to the reactive gases.
Claim 2
Dependent Claim
111 words
A thin film forming device comprising; a vacuum tank held at the predetermined degree of vacuum; a substrate placed in said vacuum tank; a single internal tank disposed in said vacuum tank and having an opening opposite to said substrate; a plurality of gas jet nozzles arranged in said internal tank and connected with a plurality of reactive gas sources outside said vacuum tank for jetting reactive gases of different types toward said substrate through the opening of said internal tank; and electron beam irradiation means disposed close to a passage, through which the reactive gases jetted from said gas jet nozzles pass, for irradiating electron beams to the reactive gases.
Claim 3
Dependent Claim
34 words
A thin film forming device according to claim 1, wherein acceleration means for accelerating the reactive gases subjected to irradiation of electron beams is provided between said electron beam irradiation means and said substrate.
Claim 4
Dependent Claim
25 words
A thin film forming device according to claim 2, wherein said acceleration means comprises an acceleration electrode provided at the opening of said internal tank.
Claim 5
Dependent Claim
38 words
A thin film forming device according to claim 1, wherein said electron beam irradiation means comprises an electron beam emission electrode and an electron beam draw-out electrode which are arranged in said internal tank close to each other.
Claim 6
Dependent Claim
41 words
A thin film forming device according to claim 4, wherein said electron beam draw-out electrode is disposed in the passage of the reactive gases jetted from said gas jet nozzles for heating the reactive gases when the reactive gases pass therethrough.
Claim 7
Dependent Claim
37 words
A thin film forming device according to claim 1, wherein a gas flow rate regulation valve is fitted midway each of supply passages communicating said plurality of reactive gas sources with said plurality of gas jet nozzles.
Claim 8
Dependent Claim
29 words
A thin film forming device according to claim 1, wherein the degree of vacuum in the interior of said internal tank is lower than that in said vacuum tank.
Claim 9
Dependent Claim
124 words
A thin film forming device comprising; a vacuum tank held at the predetermined degree of vacuum; a substrate placed in said vacuum tank; a plurality of internal tanks disposed in said vacuum tank and each having an opening opposite to said substrate; a plurality of gas jet nozzles each arranged in each of said internal tanks and connected with a plurality of reactive gas sources outside said vacuum tank one to one for jetting reactive gases of different types toward said substrate through the openings of said internal tanks; and a plurality of beam irradiation means each disposed close to a passage, through which the reactive gas from each of said gas jet nozzles passes, for irradiating electron beams to the corresponding reactive gases.
Claim 10
Dependent Claim
124 words
A thin film forming device comprising; a vacuum tank held at the predetermined degree of vacuum; a substrate placed in said vacuum tank; a plurality of internal tanks disposed in said vacuum tank and each having an opening opposite to said substrate; a plurality of gas jet nozzles each arranged in each of said internal tanks and connected with a plurality of reactive gas sources outside said vacuum tank one to one for jetting reactive gases of different types toward said substrate through the openings of said internal tanks; and a plurality of beam irradiation means each disposed close to a passage, through which the reactive gas from each of said gas jet nozzles passes, for irradiating electron beams to the corresponding reactive gases.
Claim 11
Dependent Claim
36 words
A thin film forming device according to claim 8, wherein acceleration means for accelerating the reactive gas subjected to irradiation of electron beams is provided between each of said electron beam irradiation means and said substrate.
Claim 12
Dependent Claim
27 words
A thin film forming device according to claim 9, wherein said acceleration means comprises an acceleration electrode provided at the opening of each of said internal tanks.
Claim 13
Dependent Claim
42 words
A thin film forming device according to claim 8, wherein each of said electron beam irradiation means comprises an electron beam emission electrode and an electron beam draw-out electrode which are arranged in each of said internal tanks close to each other.
Claim 14
Dependent Claim
43 words
A thin film forming device according to claim 11, wherein said electron beam draw-out electrode is disposed in the passage of the reactive gas jetted from each of said gas jet nozzles for heating the reactive gas when the reactive gas passes therethrough.
Claim 15
Dependent Claim
37 words
A thin film forming device according to claim 8, wherein a gas flow rate regulation valve is fitted midway each of supply passages communicating said plurality of reactive gas sources with said plurality of gas jet nozzles.
Claim 16
Dependent Claim
31 words
A thin film forming device according to claim 8, wherein the degree of vacuum in the interior of each of said internal tanks is lower than that in said vacuum tank.
Claim 17
Dependent Claim
117 words
A thin film forming device comprising; a vacuum tank and an internal tank; a gas jet nozzle arranged within said internal tank; said internal tank having a wall cut out at a part corresponding to a passage through which reactive gas jetted from said gas jet nozzle passes; a substrate placed in said vacuum tank transversely to the direction of jetting of the reactive gas; an electron beam draw-out electrode and an electron beam emission means . both disposed along said passage of the reactive gas within said internal tank; and accleration electrodes provided in said passage of the reactive gas within said internal tank and at the cut-out portion in the wall of said internal tank.
Claim 18
Dependent Claim
117 words
A thin film forming device comprising; a vacuum tank and an internal tank; a gas jet nozzle arranged within said internal tank; said internal tank having a wall cut out at a part corresponding to a passage through which reactive gas jetted from said gas jet nozzle passes; a substrate placed in said vacuum tank transversely to the direction of jetting of the reactive gas; an electron beam draw-out electrode and an electron beam emission means . both disposed along said passage of the reactive gas within said internal tank; and accleration electrodes provided in said passage of the reactive gas within said internal tank and at the cut-out portion in the wall of said internal tank.
Claim 19
Dependent Claim
30 words
A thin film forming device according to claim 15, wherein the gas pressure in said vacuum tank is regulated to a range of approximately 10 -4 to 10 -3 Torr.
Claim 20
Dependent Claim
35 words
A thin film forming device according to claim 15, wherein said electron beam draw-out electrode comprises a tungsten wire and is applied with voltage in order of 10 to 100 V using a direct current.
Claim 21
Dependent Claim
31 words
A thin film forming device according to claim 15, wherein said electron beam-emission means comprises a filament and is supplied with an alternating current for heating up to about 2000 °C.
Claim 22
Dependent Claim
98 words
A substrate cleaning device comprising; a gas jet nozzle for jetting gas therefrom; an electron beam irradiation section disposed above said gas jet nozzle for irradiating electron beams to the gas jetted from said gas jet nozzle to induce glow discharge; an ion acceleration section disposed above said electron beam irradiation section for accelerating ions produced by said glow discharge; a substrate holder disposed above said ion acceleration section for mounting thereon a substrate onto which the accelerated ions are to be bombarded; and power supplies connected to said electron beam irradiation section and said ion acceleration section.
Claim 23
Dependent Claim
98 words
A substrate cleaning device comprising; a gas jet nozzle for jetting gas therefrom; an electron beam irradiation section disposed above said gas jet nozzle for irradiating electron beams to the gas jetted from said gas jet nozzle to induce glow discharge; an ion acceleration section disposed above said electron beam irradiation section for accelerating ions produced by said glow discharge; a substrate holder disposed above said ion acceleration section for mounting thereon a substrate onto which the accelerated ions are to be bombarded; and power supplies connected to said electron beam irradiation section and said ion acceleration section.
Claim 24
Dependent Claim
24 words
A substrate cleaning device according to claim 19, wherein said gas is one selected from a group consisting of argon, nitogen, oxygen and hydrogen.
Claim 25
Dependent Claim
28 words
A substrate cleaning device according to claim 19, wherein said electron beam irradiation section comprises a filament, a grid, an electrid field shield plate, and a grid electrode.
Claim 26
Dependent Claim
21 words
A substrate cleaning device according to claim 19, wherein said ion acceleration section comprises a grid electrode and an acceleration electrode.
Claim 27
Dependent Claim
31 words
A substrate cleaning device according to claim 19, wherein said substrate is one selected from a group consisting of a vapor-deposited thin film, a multilayer thin film, and a metal substrate.
References Cited (Backward Citations)
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