EP0213664A1
Expired / Lapsed
EP
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Beam of charged particles divided up into thin component beams
Assignee: Koninklijke Philips NV
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Filing: 1986-08-01
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Granted: —
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Expires: 2006-08-01
Abstract
Abstract In a charged-particle pattern generator, such as an electron-beam pattern generator, use is made of a beam or more commonly of a fan of beams whose diameter is sufficiently small to minimize the trajectory displacement effect. For the fan of beams it is preferred that the mutual distance of the component beams should be sufficiently large to minimize mutual trajectory displacement effects. By shaping the beam with a collection of solid-state of field-emitters very fast control can be realized and for example spherical aberration can be corrected in a simple manner by applying a matched potential excursion to the emitters. In this way it is also possible with simple means to apply dynamic brightness correction.
Inventors
- 👤 Karel Diederick Van Der Mast
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 17:14
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/04; H01J37/153; H01J37/30; H01J37/3002; H01J37/3007
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
59 words
Charged-particle pattern generator with a source and an optical system for generating and controlling a beam of charged particles, characterized in that beam-selection means are present for forming a beam of particles which, at least over a substantial part of a trajectory to be travelled by the beam in the generator, has a small diameter to reduce trajectory displacement.
Claim 2
Dependent Claim
59 words
Charged-particle pattern generator with a source and an optical system for generating and controlling a beam of charged particles, characterized in that beam-selection means are present for forming a beam of particles which, at least over a substantial part of a trajectory to be travelled by the beam in the generator, has a small diameter to reduce trajectory displacement.
Claim 3
Dependent Claim
36 words
Charged-particle pattern generator as claimed in Claim 1, characterized in that a device is contained therein for forming a fan of multiple component beams each of which has a small beam diameter to reduce trajectory displacement.
Claim 4
Dependent Claim
49 words
Charged-particle pattern generator as claimed in Claims 1 or 2, characterized in that the beam-selection means are arranged to form a fan of component beams having a small diameter to reduce trajectory displacement, which component beams are mutually spaced at distances such that mutual trajectory displacement effects are reduced.
Claim 5
Dependent Claim
31 words
Charged-particle pattern generator as claimed in Claims 2 or 3, characterized in that the source contains a linear array or a matrix of individual emitters for generating a fan component beams.
Claim 6
Dependent Claim
35 words
Charged-particle pattern generator as claimed in Claims 2 or 3, characterized in that the optical system is equipped with a device for dividing up a beam of charged particles into a fan of component beams.
Claim 7
Dependent Claim
19 words
Charged-particle generator as claimed in any one of the foregoing Claims, characterized in that the charged particles are ions.
Claim 8
Dependent Claim
20 words
Charged-particle pattern generator as claimed in any one of Claims 1 to 5, characterized in that the chargedparticles are electrons.
Claim 9
Dependent Claim
25 words
Charged-particle pattern generator as claimed in Claim 7, characterized in that the source contains a single solid-state electron emitter or a collection of such emitters.
Claim 10
Dependent Claim
24 words
Charged-particle pattern generator as claimed in Claim 7, characterized in that the source contains a single field emitter or a collection of such emitters.
Claim 11
Dependent Claim
43 words
Charged-particle pattern generator as claimed in any one of the foregoing Claims, characterized in that a charged-particle optical device images a collection of particles in or near a lens of an objective lens system of the charged-particle optical system of the pattern generator.
Claim 12
Dependent Claim
21 words
Charged-particle pattern generator as claimed in Claim 10, characterized in that the objective lens forms part of a shaped-beam pattern generator.
Claim 13
Dependent Claim
21 words
Charged-particle pattern generator as claimed in Claim 10, characterized in that the objective lens forms part of a scanning-beam pattern generator.
Claim 14
Dependent Claim
33 words
Charged-particle pattern generator as claimed in Claim 10, characterized in that potentials can be applied to individual emitters of a collection of emittersto provide chromatic compensation for spherical aberration in the optical system.
Claim 15
Dependent Claim
31 words
Charged-particle pattern generator as claimed in any one of the Claims 10 to 13, characterized in that the objective lens contains a gauze with a control electrode to correct spherical aberration.
Claim 16
Dependent Claim
35 words
Charged-particle pattern generator as claimed in Claims 13 or 14, characterized in that a maximum permissible aperture angle for an emitted fan of component beams is matched to an objective lens corrected for spherical aberration.
Claim 17
Dependent Claim
39 words
Charged-particle pattern generator as claimed in Claims 13, 14 or 15, characterized in that the potential distribution of the individual emitters of a collection of emitters dynamically follows a scanning movement of the collective beam in the lens system.
Claim 18
Dependent Claim
27 words
Charged-particle pattern generator as claimed in Claim 16, characterized in that the dynamic correction potential follows the scanning movement of the beam in the objective lens system.
Claim 19
Dependent Claim
38 words
Charged-particle pattern generator as claimed in Claim 17, characterized in that the size of a step for the stepwise following of a radial beam movement in the objective lens system is matched to mesh dimensions of the gauze.
Claim 20
Dependent Claim
39 words
Charged-particle pattern generator as claimed in any one of Claims 16, 17 or 18, characterized in that an area of a target to be scanned by the scanning beam is matched in surface extension to the spherical aberration correction.
Claim 21
Dependent Claim
29 words
Charged-particle pattern generator as claimed in any one of Claims 16, 17, 18 or 19, characterized in that a combined magnetic-electric deflection field is used for achromatic beam scanning.
Claim 22
Dependent Claim
33 words
Charged-particle pattern generator as claimed in any one of Claims 13, 14, 15 or 16, characterized in that a chromatic beam error in the beam scanning device as compensated with a projection doublet.
Claim 23
Dependent Claim
48 words
Charged-particle pattern generator as claimed in any one of the foregoing Claims, characterized in that beam-shaping is used therein together with dynamic brightness control which is matched to the beam shaping in such a way as to keep the effect of non-static beam spread on the beam constant.
Claim 24
Dependent Claim
32 words
Charged-particle pattern generator as claimed in Claim 22, characterized in that the particles source contains a collection of solid-state emitters which is equipped with an electrode system for the dynamic brightness control.
References Cited (Backward Citations)
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