EP0092873A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Charged-particle beam exposure device incorporating beam splitting
Assignee: Koninklijke Philips NV
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Filing: 1983-04-19
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Granted: —
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Expires: 2003-04-19
Abstract
Abstract For the formation of an array or a series of elementary beams of charged particles a beam exposure device includes a mirror system comprising a matrix of sub-mirrors. Using the composite mirror, a multiple beam image is formed in a location which deviates from the position of the cross-over of the principal rays of the elementary beams. Consequently, the elementary beams, which may be ion beams as well as electron beams, can be separately modulated and controlled. For suitable imaging, for example, for the writing of patterns for a micro-electronic circuit element, the images and the cross-over are combined again. For this purpose use can be made of a second mirror whose sub-mirrors have an optical effect which opposes that of the first mirror.
Inventors
- 👤 Bernardus J.G.M. Roelofs
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 17:24
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3002; H01J37/3007
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
89 words
1 . A device for exposing a target (28) to be positioned in an object space (22) to a beam of charged particles (26), comprising a radiation source (i) and a beam s plitting/modulation device for the formation and control of a matrix of elementary beams of charged particles, characterized in that the beam splitting/modulation device comprises a mirror system (12), a reflective surface (13) of which is provided with a matrix of sub-mirrors (14), each of said sub-mirrors being constructed as:an elementary beam (31) selecting, charged-particle optical element.
Claim 2
Dependent Claim
89 words
1 . A device for exposing a target (28) to be positioned in an object space (22) to a beam of charged particles (26), comprising a radiation source (i) and a beam s plitting/modulation device for the formation and control of a matrix of elementary beams of charged particles, characterized in that the beam splitting/modulation device comprises a mirror system (12), a reflective surface (13) of which is provided with a matrix of sub-mirrors (14), each of said sub-mirrors being constructed as:an elementary beam (31) selecting, charged-particle optical element.
Claim 3
Dependent Claim
45 words
A device as claimed in Claim 1, characterized in that the sub-mirrors (14) are formed by a matrix of spherical recesses (42) in the mirror surface (15) with a geometrical radius of curvature which deviates from the geometrical radius of curvature of the reflective surface.
Claim 4
Dependent Claim
35 words
A device as claimed in Claim 1 or 2, characterized in that the sub-mirrors comprise a system of electrodes (46-62) which are provided in the mirror and which are to be activated separately or group-wise.
Claim 5
Dependent Claim
34 words
A device as claimed in Claim 3, characterized in that at least a part of the electrodes is constructed as cylindrical bushes (5-4) which form the sub-mirrors and which project from the mirror surface.
Claim 6
Dependent Claim
48 words
A device as claimed in Claim 1, characterized in that the reflective surface of the mirror contains a homogeneous layer of moderately conductive material in which a potential distribution which forms a sub-mirror can be generated by means of an electrode assembly which contacts the rear side thereof.
Claim 7
Dependent Claim
21 words
A device as claimed in Claim 1, 2, 3, 4 or 5, characterized in that the sub-mirrors form an orthogonal matrix.
Claim 8
Dependent Claim
31 words
A device as claimed in Claim 1 , 2, 3, 4, 5 or 6, characterized in that a cross-section of the sub-mirrors measured on the reflective surface, substantially forms a square.
Claim 9
Independent Claim
37 words
A device as claimed in any of the preceding Claims, characterized in that around an opti.cal centre of curvature (30) of the mirror there is situated an aperture ( 1 0) which determines an elementary beam cross-section.
Claim 10
Independent Claim
43 words
A device as claimed in any of the preceding Claims, characterized in that near the radiation source ( 11 ) there is included a second aperture (2) which can be imaged in the plane of the first aperture (10) by the radiation beam.
Claim 11
Independent Claim
85 words
A device as claimed in any of the preceding Claims, characterized in that the beam deflection device (6) comprises a high-frequency electrostatic prism (70). 11 . A device as claimed in any of the preceding Claims, characterized in that it also comprises a device for the optical combination of source images (32) of the elementary beams which are separated by the mirror ( 1 2) on the one hand and the cross-over of the principal rays (33) of the elementary beams on the other hand.
Claim 12
Dependent Claim
26 words
1 2. A device as claimed in any of the preceding Claims, characterized in that a reducing optical system is included near the object carrier (24).
Claim 13
Dependent Claim
40 words
13 . A device as claimed in Claim 1, 2, 5, 6, 7, 8, 9, 1 0, 1 1 or q2, characterized in that a charged-particle system is included for the control and modulation of each of the elementary beams.
Claim 14
Dependent Claim
25 words
1 4. A device as claimed in any of the preceding Claims, characterized in that it forms part of a device for manufacturing micro-electronic components.
Claim 15
Dependent Claim
21 words
A device as claimed in Claim 14, characterized in that it comprises an ion source, the optical elements being adapted thereto.
Claim 16
Dependent Claim
43 words
1 6. A device as claimed in any of the preceding Claims, characterized in that for the exposure of a composite pattern the device includes a multiple beam splitting device instead of a system for the imaging of two apertures on one another.
Claim 17
Dependent Claim
19 words
17 . A method of manufacturing micro-electronic elements utilizing a device as claimed in any of the preceding Claims.
References Cited (Backward Citations)
No citation records indexed.
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