US7005218B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for performing target-image-based optical proximity correction
Assignee: Synopsys Inc
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Filing: 2003-04-29
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Granted: 2006-02-28
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Expires: 2023-04-29
Abstract
Abstract A system that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit is presented. The system operates by first receiving a plurality of masks that are used to expose features on the integrated circuit. Next, the system computes a target image for a target feature defined by the plurality of masks, wherein mask features from different masks define the target image. The system dissects the feature into a plurality of segments, wherein dissecting the mask feature involves using dissection parameters associated with geometric characteristics of the target image, instead of using dissection parameters associated with geometric characteristics of the mask feature. The system then performs an optical proximity correction (OPC) operation on the plurality of masks, wherein the OPC operation uses parameters associated with geometric characteristics of the target image to perform optical proximity correction on the mask features that define the target image.
Inventors
- 👤 Youping Zhang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:26
CPC Classifications
G; G03; G03F; G03F9/00; G03F1/00; G03F1/26; G03F1/30; G03F1/36; G03F1/68; G03F1/70
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
137 words
A method that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit, comprising: receiving a plurality of masks that are used to expose features on the integrated circuit; computing a target image for a target feature defined by the plurality of masks, wherein mask features from different masks define the target image; dissecting the mask feature into a plurality of segments, wherein dissecting the mask feature involves using dissection parameters associated with geometric characteristics of the target image, instead of using dissection parameters associated with geometric characteristics of the mask feature; and performing an optical proximity correction (OPC) operation on the plurality of masks, wherein the OPC operation uses parameters associated with geometric characteristics of the target image to perform optical proximity correction on mask features that define the target image.
Claim 2
Independent Claim
137 words
A method that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit, comprising: receiving a plurality of masks that are used to expose features on the integrated circuit; computing a target image for a target feature defined by the plurality of masks, wherein mask features from different masks define the target image; dissecting the mask feature into a plurality of segments, wherein dissecting the mask feature involves using dissection parameters associated with geometric characteristics of the target image, instead of using dissection parameters associated with geometric characteristics of the mask feature; and performing an optical proximity correction (OPC) operation on the plurality of masks, wherein the OPC operation uses parameters associated with geometric characteristics of the target image to perform optical proximity correction on mask features that define the target image.
Claim 3
Dependent Claim
30 words
The method of claim 1 , wherein different OPC parameters are associated with line edges, space edges, outer corners, inner corners, line ends, and slot ends of the target image.
Claim 4
Dependent Claim
38 words
The method of claim 1 , wherein performing OPC on a mask feature involves placing evaluation points on the plurality of segments, and using dissection and associated evaluation points in performing the OPC operation on the mask feature.
Claim 5
Dependent Claim
43 words
The method of claim 1 , wherein placing evaluation points on the mask feature involves using evaluation point placement rules associated with geometric characteristics of the target image, instead of using evaluation point placement rules associated with geometric characteristics of the mask feature.
Claim 6
Dependent Claim
41 words
The method of claim 1 , wherein performing an OPC operation on a mask feature from the plurality of masks involves using a resist threshold associated with geometric characteristics of the target feature instead of geometric characteristics of the mask feature.
Claim 7
Dependent Claim
37 words
The method of claim 1 , wherein performing an OPC operation on the mask feature involves using tolerances associated with geometric characteristics of the target feature instead of tolerances associated with geometric characteristics of the mask feature.
Claim 8
Dependent Claim
23 words
The method of claim 1 , wherein the plurality of masks includes at least one phase-shift mask and at least one trim mask.
Claim 9
Dependent Claim
38 words
The method of claim 1 , wherein identifying target image shape involves computing the target image for the shape specification defined by a printed image and which refers back to corresponding mask features from a plurality of masks.
Claim 10
Dependent Claim
156 words
A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit, the method comprising: receiving a plurality of masks that are used to expose features on the integrated circuit; computing a target image for a target feature defined by the plurality of masks, wherein mask features from different masks define the target image; dissecting the mask feature into a plurality of segments, wherein dissecting the mask feature involves using dissection parameters associated with geometric characteristics of the target image, instead of using dissection parameters associated with geometric characteristics of the mask feature; and performing an optical proximity correction (OPC) operation on the plurality of masks, wherein the OPC operation uses parameters associated with geometric characteristics of the target image to perform optical proximity correction on mask features that define the target image.
Claim 11
Dependent Claim
156 words
A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit, the method comprising: receiving a plurality of masks that are used to expose features on the integrated circuit; computing a target image for a target feature defined by the plurality of masks, wherein mask features from different masks define the target image; dissecting the mask feature into a plurality of segments, wherein dissecting the mask feature involves using dissection parameters associated with geometric characteristics of the target image, instead of using dissection parameters associated with geometric characteristics of the mask feature; and performing an optical proximity correction (OPC) operation on the plurality of masks, wherein the OPC operation uses parameters associated with geometric characteristics of the target image to perform optical proximity correction on mask features that define the target image.
Claim 12
Dependent Claim
32 words
The computer-readable storage medium of claim 9 , wherein different OPC parameters are associated with line edges, space edges, outer corners, inner corners, line ends, and slot ends of the target image.
Claim 13
Dependent Claim
40 words
The computer-readable storage medium of claim 9 , wherein performing OPC on a mask feature involves placing evaluation points on the plurality of segments, and using dissection and associated evaluation points in performing the OPC operation on the mask feature.
Claim 14
Dependent Claim
45 words
The computer-readable storage medium of claim 9 , wherein placing evaluation points on the mask feature involves using evaluation point placement rules associated with geometric characteristics of the target image, instead of using evaluation point placement rules associated with geometric characteristics of the mask feature.
Claim 15
Dependent Claim
43 words
The computer-readable storage medium of claim 9 , wherein performing an OPC operation on a mask feature from the plurality of masks involves using a resist threshold associated with geometric characteristics of the target feature instead of geometric characteristics of the mask feature.
Claim 16
Dependent Claim
39 words
The computer-readable storage medium of claim 9 , wherein performing an OPC operation on the mask feature involves using tolerances associated with geometric characteristics of the target feature instead of tolerances associated with geometric characteristics of the mask feature.
Claim 17
Dependent Claim
25 words
The computer-readable storage medium of claim 9 , wherein the plurality of masks includes at least one phase-shift mask and at least one trim mask.
Claim 18
Dependent Claim
40 words
The computer-readable storage medium of claim 9 , wherein identifying target image shape involves computing the target image for the shape specification defined by a printed image and which refers back to corresponding mask features from a plurality of masks.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-02-27 | 2009-08-29 | 2010-02-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-02-27 | 2013-08-29 | 2014-02-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-02-27 | 2017-08-29 | 2018-02-28 | $7700.00 | Window Closed / Lapsed |