Patent US6980277B2 successfully refreshed from Google Patents.
US6980277B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Immersion photolithography system and method using inverted wafer-projection optics interface
Assignee: ASML Holding NV
•
Filing: 2004-04-26
•
Granted: 2005-12-27
•
Expires: 2024-04-26
Abstract
Abstract A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.
Inventors
- 👤 Harry Sewell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; B; B82; B82Y; B82Y10/00; B82Y40/00; G03F7/70233
Claims Analysis
Total Claims: 38
Claim 1
Independent Claim
36 words
A liquid immersion photolithography system comprising: a projection optical system that directs the electromagnetic radiation upwards onto a substrate; and a liquid source that provides a liquid onto an upper surface of the projection optical system.
Claim 2
Dependent Claim
36 words
A liquid immersion photolithography system comprising: a projection optical system that directs the electromagnetic radiation upwards onto a substrate; and a liquid source that provides a liquid onto an upper surface of the projection optical system.
Claim 3
Dependent Claim
25 words
The liquid immersion photolithography system of claim 1 , wherein the liquid source is adapted to form a liquid meniscus above the projection optical system.
Claim 4
Dependent Claim
24 words
The liquid immersion photolithography system of claim 1 , wherein the liquid source is adapted to form a fountainhead above the projection optical system.
Claim 5
Dependent Claim
28 words
The liquid immersion photolithography system of claim 1 , wherein the projection optical system includes a housing with at least one catch basin positioned to capture stray liquid.
Claim 6
Dependent Claim
71 words
The liquid immersion photolithography system of claim 1 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 7
Dependent Claim
25 words
The liquid immersion photolithography system of claim 5 , wherein a distance between the substrate and the top of the housing is approximately 50-150 microns.
Claim 8
Dependent Claim
28 words
The liquid immersion photolithography system of claim 5 , wherein a distance between the substrate and the top of the housing is between 50 microns and 500 microns.
Claim 9
Dependent Claim
19 words
The liquid immersion photolithography system of claim 5 , wherein the top of the housing has a hydrophobic surface.
Claim 10
Dependent Claim
23 words
The liquid immersion photolithography system of claim 1 , wherein the liquid source selectively provides the liquid only when wet exposure is needed.
Claim 11
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 193 nanometers.
Claim 12
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 157 nanometers.
Claim 13
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 435 nanometers.
Claim 14
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 405 nanometers.
Claim 15
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 365 nanometers.
Claim 16
Dependent Claim
16 words
The liquid immersion photolithography system of claim 1 , wherein the electromagnetic radiation is 248 nanometers.
Claim 17
Dependent Claim
33 words
A liquid immersion photolithography system comprising: a projection optical system that directs electromagnetic radiation upwards onto a substrate; and means for providing a liquid onto an upper surface of the projection optical system.
Claim 18
Dependent Claim
33 words
A liquid immersion photolithography system comprising: a projection optical system that directs electromagnetic radiation upwards onto a substrate; and means for providing a liquid onto an upper surface of the projection optical system.
Claim 19
Dependent Claim
28 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid is adapted to form a liquid meniscus above the projection optical system.
Claim 20
Dependent Claim
27 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid is adapted to form a fountainhead above the projection optical system.
Claim 21
Dependent Claim
28 words
The liquid immersion photolithography system of claim 16 , wherein the projection optical system includes a housing with at least one catch basin positioned to capture stray liquid.
Claim 22
Dependent Claim
71 words
The liquid immersion photolithography system of claim 16 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 23
Dependent Claim
25 words
The liquid immersion photolithography system of claim 20 , wherein a distance between the substrate and the top of the housing is approximately 50-150 microns.
Claim 24
Dependent Claim
28 words
The liquid immersion photolithography system of claim 20 , wherein a distance between the substrate and the top of the housing is between 50 microns and 500 microns.
Claim 25
Dependent Claim
19 words
The liquid immersion photolithography system of claim 20 , wherein the top of the housing has a hydrophobic surface.
Claim 26
Dependent Claim
26 words
The liquid immersion photolithography system of claim 16 , wherein the means for providing a liquid selectively provides the liquid only when wet exposure is needed.
Claim 27
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 193 nanometers.
Claim 28
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 157 nanometers.
Claim 29
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 435 nanometers.
Claim 30
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 405 nanometers.
Claim 31
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 365 nanometers.
Claim 32
Dependent Claim
16 words
The liquid immersion photolithography system of claim 16 , wherein the electromagnetic radiation is 248 nanometers.
Claim 33
Dependent Claim
54 words
A liquid immersion photolithography system comprising: an inverted projection optical system adapted for exposure of a lower surface of a substrate; and a liquid source adapted for providing a liquid between the projection optical system and the substrate, wherein the liquid source is adapted for forming a liquid meniscus above the projection optical system.
Claim 34
Dependent Claim
54 words
A liquid immersion photolithography system comprising: an inverted projection optical system adapted for exposure of a lower surface of a substrate; and a liquid source adapted for providing a liquid between the projection optical system and the substrate, wherein the liquid source is adapted for forming a liquid meniscus above the projection optical system.
Claim 35
Dependent Claim
28 words
The liquid immersion photolithography system of claim 31 , wherein the projection optical system includes a housing with at least one catch basin adapted to capture stray liquid.
Claim 36
Dependent Claim
71 words
The liquid immersion photolithography system of claim 31 , wherein the projection optical system includes: a housing in which a plurality of lenses are mounted, the housing including a pressure region between an uppermost lens of the plurality of lenses and a top of the housing; an opening in the top of the housing; and a liquid seal between an uppermost lens of the plurality of lenses and the pressure region.
Claim 37
Dependent Claim
19 words
The liquid immersion photolithography system of claim 33 , wherein the top of the housing has a hydrophobic surface.
Claim 38
Dependent Claim
26 words
The liquid immersion photolithography system of claim 33 , wherein the liquid source is adapted to selectively provide the liquid only when wet exposure is needed.
References Cited (Backward Citations)
SU302658A1
Cited
JPH04305915A
Cited
US5691802A
Cited
US5715039A
Cited
JPH10255139A
Cited
US20020008862A1
Cited
US20040160582A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-12-26 | 2009-06-27 | 2009-12-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-12-26 | 2013-06-27 | 2013-12-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-12-26 | 2017-06-27 | 2017-12-27 | $7700.00 | Window Closed / Lapsed |