US6781670B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Immersion lithography
Assignee: Intel Corp
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Filing: 2002-12-30
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Granted: 2004-08-24
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Expires: 2022-12-30
Abstract
Abstract Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is juxtaposed between the target surface and the lens element. A projected light is directed through the lens element and the immersion liquid to image a mask on the target surface.
Inventors
- 👤 Christof Gabriel Krautschik
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:44
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
92 words
An apparatus for lithograpy, comprising: a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface, and to image a point of a mask onto the target surface; and an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
Claim 2
Independent Claim
92 words
An apparatus for lithograpy, comprising: a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface, and to image a point of a mask onto the target surface; and an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
Claim 3
Dependent Claim
13 words
The apparatus of claim 1 , wherein the target surface bears a photoresist.
Claim 4
Dependent Claim
20 words
The apparatus of claim 2 , wherein the photoresist and the immersion liquid are characterized by essentially equal refractive indices.
Claim 5
Dependent Claim
17 words
The apparatus of claim 1 , wherein the target surface comprises a substrate surface of a wafer.
Claim 6
Dependent Claim
20 words
The apparatus of claim 1 , wherein the lens element and the immersion liquid are characterized by essentially refractive indices.
Claim 7
Dependent Claim
24 words
The apparatus of claim 1 , wherein the lens element minimizes refraction of the projected light entering the lens element at the convex surface.
Claim 8
Dependent Claim
22 words
The apparatus of claim 1 , wherein the immersion liquid is characterized by a refractive index that is substantially larger than 1.0.
Claim 9
Dependent Claim
43 words
The apparatus of claim 1 , further comprising: an aperture element defining an aperture, and positioned between the immersed surface of the lens element and the target surface, the aperture element limiting the area of the target surface exposed to the projected light.
Claim 10
Dependent Claim
16 words
The apparatus of claim 8 , wherein the aperture has a diameter of approximately 10 microns.
Claim 11
Dependent Claim
18 words
The apparatus of claim 1 , wherein the immersed surface of the lens element comprises a flat surface.
Claim 12
Dependent Claim
17 words
The apparatus of claim 1 wherein the immersed surface of the lens element comprises a concave surface.
Claim 13
Independent Claim
94 words
A method for lithography, comprising: positioning a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface and to image a point of a mask onto the target surface; and juxtaposing an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
Claim 14
Independent Claim
94 words
A method for lithography, comprising: positioning a lens element comprising an immersed surface and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at a target surface, the lens element positioned to focus a projected light onto the target surface and to image a point of a mask onto the target surface; and juxtaposing an immersion liquid between the target surface and the lens element, the projected light entering the immersion liquid after leaving the immersed surface of the lens element.
Claim 15
Dependent Claim
27 words
The method of claim 12 , wherein the target surface bears a photoresist, and the immersion liquid and the photoresist are characterized by essentially equal refractive indices.
Claim 16
Dependent Claim
34 words
The method of claim 12 , wherein positioning the lens element comprises adjusting the position of the lens element to minimize refraction of the projected light entering the lens element at the convex surface.
Claim 17
Dependent Claim
26 words
The method of claim 12 , further comprising: repositioning the target surface or the mask to image another point of the mask onto the target surface.
Claim 18
Dependent Claim
109 words
A lithographic system, comprising: a projection device operable to project light on a target surface, the projected light imaging a point of a mask onto the target surface, the projection device having characteristic resolution, the projected light having a characteristic wavelength; and a lens element comprising an immersed and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at the target surface, the immersed surface of the lens element being immersed in an immersion liquid to improve the characteristics resolution of the projection device by decreasing the characteristic wavelength as the light reaches the target surface.
Claim 19
Dependent Claim
109 words
A lithographic system, comprising: a projection device operable to project light on a target surface, the projected light imaging a point of a mask onto the target surface, the projection device having characteristic resolution, the projected light having a characteristic wavelength; and a lens element comprising an immersed and a convex surface opposite the immersed surface, the convex surface being defined by a hemisphere, the center of the hemisphere being substantially at the target surface, the immersed surface of the lens element being immersed in an immersion liquid to improve the characteristics resolution of the projection device by decreasing the characteristic wavelength as the light reaches the target surface.
Claim 20
Dependent Claim
28 words
The lithographic system of claim 16 , wherein the target surface bears a photoresist, and the immersion liquid and the photoresist are characterized by essentially equal refractive indices.
Claim 21
Dependent Claim
25 words
The lithographic system of claim 16 , wherein the lens element minimizes refraction of the projected light entering the lens element at the convex surface.
Claim 22
Dependent Claim
30 words
The lithographic system of claim 16 , further comprising: a scanning device to reposition the target surface or the mask image another point of the mask onto the target surface.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-08-24 | 2008-02-23 | 2008-08-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-08-24 | 2012-02-23 | 2012-08-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-08-24 | 2016-02-23 | 2016-08-24 | $7700.00 | Window Closed / Lapsed |