Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
125 words
A system for exposure processing of a semiconductor device in which a predetermined pattern is transferred onto a semiconductor device, comprising: a database to store illumination parameters, photoresist parameters, circuit pattern information, and sets of aberration information of projection lenses used with exposure devices to carry out a pattern transfer; a computation processing device to perform optical development simulation based on the illumination parameters, photoresist parameters, circuit pattern information and the sets of aberration information, and to calculate margins of exposure energy and focus as well as optimum values of exposure energy and focus offset; and a device to instruct one of the plurality of exposure devices for which the margins of exposure energy and focus satisfy a predetermined tolerance to perform an exposure processing.
Claim 2
Independent Claim
125 words
A system for exposure processing of a semiconductor device in which a predetermined pattern is transferred onto a semiconductor device, comprising: a database to store illumination parameters, photoresist parameters, circuit pattern information, and sets of aberration information of projection lenses used with exposure devices to carry out a pattern transfer; a computation processing device to perform optical development simulation based on the illumination parameters, photoresist parameters, circuit pattern information and the sets of aberration information, and to calculate margins of exposure energy and focus as well as optimum values of exposure energy and focus offset; and a device to instruct one of the plurality of exposure devices for which the margins of exposure energy and focus satisfy a predetermined tolerance to perform an exposure processing.
Claim 3
Dependent Claim
63 words
The system for exposure processing of a semiconductor device in accordance with claim 1 , wherein: the computation processing device calculates an assignment priority order of exposure devices using the calculated margins of exposure energy and focus in the plurality of exposure devices; and the exposure device used for the exposure processing is selected based on the priority order of the exposure devices.
Claim 4
Dependent Claim
59 words
The system for exposure processing of a semiconductor device in accordance with claim 1 , wherein the computation processing device determines, with an optical development simulator, ranges of exposure energy and focus in which variations of the transfer pattern are within a predetermined range, and takes their central values as the optimum values of exposure energy and focus offset.
Claim 5
Independent Claim
130 words
A system for exposing a semiconductor device, comprising: a first database portion storing aberration information of projection lenses of a plurality of exposure devices; a second database portion storing illumination parameter information of exposure steps for semiconductor device fabrication; a third database portion storing circuit pattern information used for the exposure steps of the semiconductor device fabrication; a fourth database portion storing criteria for assigning semiconductor devices; a first data computation portion for calculating the optimum values and margins of exposure energy and focus offset; and a second data computation portion for assigning, from the plurality of exposure devices, an exposure device for which the margins of exposure energy and focus are maximal, based on the criteria for assigning semiconductor devices, and executing the exposure processing with that exposure device.
Claim 6
Independent Claim
130 words
A system for exposing a semiconductor device, comprising: a first database portion storing aberration information of projection lenses of a plurality of exposure devices; a second database portion storing illumination parameter information of exposure steps for semiconductor device fabrication; a third database portion storing circuit pattern information used for the exposure steps of the semiconductor device fabrication; a fourth database portion storing criteria for assigning semiconductor devices; a first data computation portion for calculating the optimum values and margins of exposure energy and focus offset; and a second data computation portion for assigning, from the plurality of exposure devices, an exposure device for which the margins of exposure energy and focus are maximal, based on the criteria for assigning semiconductor devices, and executing the exposure processing with that exposure device.