Patent US6641981B1 successfully refreshed from Google Patents.
US6641981B1
Expired / Lapsed
US
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Exposure method, exposure apparatus, and device manufacturing method
Assignee: Nikon Corp
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Filing: 2000-11-20
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Granted: 2003-11-04
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Expires: 2020-11-20
Abstract
Abstract In projecting a pattern formed on a mask onto a substrate by using a progressive focus exposure method and transferring/forming an image of the pattern on a substrate, a control unit changes the distribution of energy amounts supplied onto the substrate based on the relative positions of the imaging plane and the substrate surface, and the integrated energy amount supplied onto the substrate in accordance with the position of an irradiation area on the substrate surface which is irradiated with an energy beam through the projection optical system. With this operation, in accordance with information about the distribution of variations in resist layer thickness on the substrate, which is obtained in advance, at least one of the distribution of energy amounts and the integrated energy, which reduce the influences of this distribution, can be changed. As a consequence, the depth of focus of the projection optical system can be substantially increased, and variations in the shapes of pattern images formed on a substrate can be suppressed.
Inventors
- 👤 Kenichirou Kaneko
- 👤 Toshinobu Morioka
- 👤 Seiji Fujitsuka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70066; H; H10; H10P; H10P76/00; G03F7/70216; G03F7/70325; G03F7/70333; G03F7/70358
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
183 words
An exposure method of irradiating a mask on which a pattern is formed with an energy beam; and changing a positional relationship between an imaging plane of a projection optical system and a substrate in an optical axis direction of said projection optical system according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface in the optical axis direction becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: obtaining a plurality of energy distributions in the optical axis direction in accordance with a position on said substrate of said area and storing the plurality of energy distributions in advance; and transferring said pattern onto said substrate, wherein the distribution of energy is changed in accordance with the position on said substrate of said area based on said plurality of energy distributions stored in advance.
Claim 2
Dependent Claim
183 words
An exposure method of irradiating a mask on which a pattern is formed with an energy beam; and changing a positional relationship between an imaging plane of a projection optical system and a substrate in an optical axis direction of said projection optical system according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface in the optical axis direction becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: obtaining a plurality of energy distributions in the optical axis direction in accordance with a position on said substrate of said area and storing the plurality of energy distributions in advance; and transferring said pattern onto said substrate, wherein the distribution of energy is changed in accordance with the position on said substrate of said area based on said plurality of energy distributions stored in advance.
Claim 3
Dependent Claim
32 words
An exposure method according to claim 1 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is continuously changed.
Claim 4
Dependent Claim
32 words
An exposure method according to claim 1 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is intermittently changed.
Claim 5
Dependent Claim
41 words
An exposure method according to claim 1 , wherein a plurality of divided areas are set on said substrate, and said distribution of energy is changed in accordance with a position on said substrate of a divided area subject to exposure.
Claim 6
Dependent Claim
70 words
An exposure method according to claim 1 , wherein said distribution of energy corresponding to a position on said substrate is a distribution having peaks at a plurality of points including at least two points located near two end portions of said range having said predetermined width on said substrate surface with datum to said imaging plane while a predetermined integrated energy is supplied to each point on said substrate.
Claim 7
Dependent Claim
20 words
An exposure method according to claim 1 , wherein said distribution of energy is changed by changing said predetermined width.
Claim 8
Dependent Claim
39 words
An exposure method according to claim 1 , wherein an integrated energy amount supplied to each point in an area irradiated with said energy beam is further changed in accordance with a position on said substrate of said area.
Claim 9
Dependent Claim
176 words
An exposure method of irradiating a mask on which a pattern is formed with an energy beam, and a position of a substrate in an optical axis direction of a proiection optical system is swung according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface in the optical axis direction becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: obtaining a plurality of swing widths of the substrate in the optical axis direction in accordance with a position on said substrate of said area and storing the plurality of swing widths in advance; and transferring said pattern onto said substrates wherein a swing width is changed in accordance with a position on said substrate of said area based on said plurality of swing widths stored in advance.
Claim 10
Dependent Claim
176 words
An exposure method of irradiating a mask on which a pattern is formed with an energy beam, and a position of a substrate in an optical axis direction of a proiection optical system is swung according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface in the optical axis direction becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: obtaining a plurality of swing widths of the substrate in the optical axis direction in accordance with a position on said substrate of said area and storing the plurality of swing widths in advance; and transferring said pattern onto said substrates wherein a swing width is changed in accordance with a position on said substrate of said area based on said plurality of swing widths stored in advance.
Claim 11
Dependent Claim
32 words
An exposure method according to claim 8 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is continuously changed.
Claim 12
Dependent Claim
32 words
An exposure method according to claim 8 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is intermittently changed.
Claim 13
Dependent Claim
41 words
An exposure method according to claim 8 , wherein a plurality of divided areas are set on said substrate, and said distribution of energy is changed in accordance with a position on said substrate of a divided area subject to exposure.
Claim 14
Dependent Claim
203 words
An exposure method of irradiating a pattern with an energy beam and changing a positional relationship between an imaging plane of a projection optical system and a substrate in an optical axis direction of said projection optical system according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface with respect to a position of said substrate surface with datum to said imaging plane becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: preparing a plurality of patterns; obtaining a plurality of energy distributions in the optical axis direction in accordance with said plurality of patterns subject to transfer and storing said plurality of energy distributions in advance; and transferring each of said plurality of patterns onto said substrate, wherein the distribution of energy is changed in accordance with a pattern subject to transfer based on said plurality of energy distributions stored in advance, upon transferring each of said plurality of patterns onto said substrate.
Claim 15
Dependent Claim
203 words
An exposure method of irradiating a pattern with an energy beam and changing a positional relationship between an imaging plane of a projection optical system and a substrate in an optical axis direction of said projection optical system according to a predetermined procedure so that an irradiation area on a substrate surface irradiated with said energy beam through said projection optical system is always located in a range having a predetermined width in said optical axis direction and including said imaging plane, and a distribution of energy supplied onto said substrate surface with respect to a position of said substrate surface with datum to said imaging plane becomes a desired distribution, thereby transferring said pattern onto said substrate, said method comprising: preparing a plurality of patterns; obtaining a plurality of energy distributions in the optical axis direction in accordance with said plurality of patterns subject to transfer and storing said plurality of energy distributions in advance; and transferring each of said plurality of patterns onto said substrate, wherein the distribution of energy is changed in accordance with a pattern subject to transfer based on said plurality of energy distributions stored in advance, upon transferring each of said plurality of patterns onto said substrate.
Claim 16
Dependent Claim
32 words
An exposure method according to claim 12 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is continuously changed.
Claim 17
Dependent Claim
32 words
An exposure method according to claim 12 , wherein said positional relationship between said imaging plane and said substrate in said optical axis direction of said projection optical system is intermittently changed.
Claim 18
Dependent Claim
40 words
An exposure method according to claim 12 , wherein an integrated energy amount supplied to each point in an area on said substrate which is irradiated with said energy beam is changed in accordance with said pattern subject to transfer.
Claim 19
Dependent Claim
21 words
An exposure method according to claim 12 , wherein said plurality of patterns are dispersed on a plurality of different masks.
Claim 20
Dependent Claim
127 words
An exposure method of irradiating a plurality of patterns with energy beams, and transferring said plurality of patterns onto a substrate by using a projection optical system, said method comprising: obtaining a plurality of swing widths of said substrate in said optical axis direction of said projection optical system in accordance with said plurality of patterns subject to transfer and storing the plurality of swing widths in advance; and transferring each of said plurality of patterns onto said substrate, wherein a swing width of said substrate in said optical axis direction of said projection optical system is changed in accordance with a pattern subject to transfer based on said plurality of swing widths stored in advance, upon transferring each of said plurality of patterns onto said substrate.
Claim 21
Dependent Claim
127 words
An exposure method of irradiating a plurality of patterns with energy beams, and transferring said plurality of patterns onto a substrate by using a projection optical system, said method comprising: obtaining a plurality of swing widths of said substrate in said optical axis direction of said projection optical system in accordance with said plurality of patterns subject to transfer and storing the plurality of swing widths in advance; and transferring each of said plurality of patterns onto said substrate, wherein a swing width of said substrate in said optical axis direction of said projection optical system is changed in accordance with a pattern subject to transfer based on said plurality of swing widths stored in advance, upon transferring each of said plurality of patterns onto said substrate.
Claim 22
Dependent Claim
36 words
An exposure method according to claim 17 , wherein said setting is performed in accordance with at least one of a position of said imaging plane and a depth of focus in said projection optical system.
Claim 23
Dependent Claim
21 words
An exposure method according to claim 17 , wherein said plurality of patterns onto different areas on said substrate are transferred.
Claim 24
Dependent Claim
30 words
An exposure method according to claim 17 , wherein said plurality of patterns onto adjacent areas on said substrate are transferred so as to join said patterns to each other.
Claim 25
Dependent Claim
43 words
An exposure method according to claim 17 , wherein an integrated energy amount to be supplied to each point in an area on said substrate which is irradiated with said energy beam is independently set in accordance with said pattern subject to transfer.
Claim 26
Dependent Claim
38 words
An exposure method according to claim 17 , wherein said plurality of patterns are dispersed on a plurality of masks, and said plurality of masks are sequentially interchanged and said plurality of patterns are transferred onto said substrate.
Claim 27
Dependent Claim
21 words
A device manufacturing method including a lithography process, wherein said lithography process uses the exposure method according to claim 1 .
Claim 28
Dependent Claim
21 words
A device manufacturing method including a lithography process, wherein said lithography process uses the exposure method according to claim 8 .
Claim 29
Dependent Claim
21 words
A device manufacturing method including a lithography process, wherein said lithography process uses the exposure method according to claim 12 .
Claim 30
Dependent Claim
21 words
A device manufacturing method including a lithography process, wherein said lithography process uses said exposure method according to claim 17 .
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2006-11-03 | 2007-05-05 | 2007-11-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-11-03 | 2011-05-05 | 2011-11-04 | $3760.00 | Window Closed / Lapsed |
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