Patent US6426168B1 successfully refreshed from Google Patents.
US6426168B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of inspecting photo masks
Assignee: International Business Machines Corp
•
Filing: 2000-08-15
•
Granted: 2002-07-30
•
Expires: 2020-08-15
Abstract
Abstract A method of inspecting photo masks by patterning at least one image in a first region of a substrate using a first photo mask, patterning at least one second image in a second region of the substrate using a second photo mask, wherein the first and second regions are substantially near one another. Comparing the first and second images to determine if the first photo mask forms a pattern substantially similar to the image formed by the second mask.
Inventors
- 👤 Kurt A. Johnson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:51
CPC Classifications
G; G06; G06T; G06T7/00; G06T7/0002; G06T7/0004; G03; G03F; G03F1/00; G03F1/68; G03F1/82; G03F1/84; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70633; G01; G01N; G01N21/00; G01N21/84; G01N21/88; G01N21/95; G01N21/956; G01N2021/95676; G06T2207/00; G06T2207/30; G06T2207/30108; G06T2207/30148
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
102 words
A method of comparing a first photo mask and a second photo mask, comprising: providing a substrate; applying a first resist on a surface of the substrate; removing a portion of the first resist from the surface of the substrate; applying a second resist on the surface of the substrate; exposing the first resist to pattern a first image within the first resist using the first photo mask; exposing the second resist to pattern a second image within the second resist using the second photo mask; then developing the first and second images; and comparing the first image and the second image.
Claim 2
Independent Claim
102 words
A method of comparing a first photo mask and a second photo mask, comprising: providing a substrate; applying a first resist on a surface of the substrate; removing a portion of the first resist from the surface of the substrate; applying a second resist on the surface of the substrate; exposing the first resist to pattern a first image within the first resist using the first photo mask; exposing the second resist to pattern a second image within the second resist using the second photo mask; then developing the first and second images; and comparing the first image and the second image.
Claim 3
Dependent Claim
17 words
The method of claim 1 , wherein the first resist and the second resist comprise different materials.
Claim 4
Dependent Claim
20 words
The method of claim 1 , wherein the first and second resists comprise a positive and a negative photo resist.
Claim 5
Dependent Claim
18 words
The method of claim 1 , wherein the first and second photo masks pattern images having different magnifications.
Claim 6
Dependent Claim
24 words
The method of claim 1 , wherein the second resist is applied at a location on the substrate spatially removed from the first resist.
Claim 7
Dependent Claim
20 words
The method of claim 1 , further comprising: baking the first and second resists following application of the second resist.
Claim 8
Dependent Claim
28 words
The method of claim 6 , further comprising baking the first and second resists in a temperature of approximately 80-120° C. for about 30 seconds to 2 minutes.
Claim 9
Dependent Claim
29 words
The method of claim 1 , further comprising: baking the first resist following application of the second resist; and baking the second resists following application of the second resist.
Claim 10
Dependent Claim
28 words
The method of claim 8 , further comprising baking the first and second resists in a temperature of approximately 80-120° C. for about 30 seconds to 2 minutes.
Claim 11
Dependent Claim
22 words
The method of claim 1 , further comprising: baking the first and second resists following patterning of the first and second resists.
Claim 12
Dependent Claim
28 words
The method of claim 10 , further comprising baking the first and second resists in a temperature of approximately 80-120° C. for about 30 seconds to 2 minutes.
Claim 13
Dependent Claim
16 words
The method of claim 1 , wherein the first and second photo masks are different masks.
Claim 14
Dependent Claim
44 words
The method of claim 1 , wherein following comparing the first and second images, further comprises: selecting the second photo mask if the second image formed by the second photo mask is substantially similar to the first image formed by the first photo mask.
Claim 15
Dependent Claim
26 words
The method of claim 1 , wherein comparing the first and second images further comprises inspecting the first and second image using a pattern comparison tool.
Claim 16
Independent Claim
92 words
A method of comparing a first photo mask and a second photo mask, comprising: providing a substrate; applying a first resist in at least one first region of the substrate; applying a second resist in at least one second region of the substrate; exposing the first resist to pattern a first image within the first resist using the first mask; exposing the second resist to pattern a second image within the second resist using the second mask; then developing the first and second images; and comparing the first and second patterned images.
Claim 17
Independent Claim
92 words
A method of comparing a first photo mask and a second photo mask, comprising: providing a substrate; applying a first resist in at least one first region of the substrate; applying a second resist in at least one second region of the substrate; exposing the first resist to pattern a first image within the first resist using the first mask; exposing the second resist to pattern a second image within the second resist using the second mask; then developing the first and second images; and comparing the first and second patterned images.
Claim 18
Dependent Claim
34 words
The method of claim 15 , wherein following applying the first resist further comprises: selectively removing the first resist from the at least one second region of the substrate before applying the second resist.
Claim 19
Dependent Claim
26 words
The method of claim 15 , wherein comparing the first and second images further comprises inspecting the first and second image using a pattern comparison tool.
Claim 20
Independent Claim
73 words
A method of comparing patterned images comprising: providing a substrate; applying a first resist on a surface of the substrate; spinning the substrate; applying a solvent to the surface of the spinning substrate to selectively remove a portion of the first resist; applying a second resist adjacent the first resist; patterning the first and second resists to form a first and a second patterned image; and comparing the first and second patterned images.
Claim 21
Independent Claim
73 words
A method of comparing patterned images comprising: providing a substrate; applying a first resist on a surface of the substrate; spinning the substrate; applying a solvent to the surface of the spinning substrate to selectively remove a portion of the first resist; applying a second resist adjacent the first resist; patterning the first and second resists to form a first and a second patterned image; and comparing the first and second patterned images.
Claim 22
Dependent Claim
55 words
The method of claim 18 , wherein patterning the first and second resists to form the first and second images further comprises: exposing a first photo mask in a first region of the first resist and a second photo mask in a second region of the second resist; and developing the first and second resist.
Claim 23
Dependent Claim
27 words
The method of claim 18 , wherein comparing the first and second patterned images further comprises inspecting the first and second image using a pattern comparison tool.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-07-29 | 2006-01-28 | 2006-07-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-07-29 | 2010-01-28 | 2010-07-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-07-29 | 2014-01-28 | 2014-07-30 | $7700.00 | Window Closed / Lapsed |