US6351304B1
Expired / Lapsed
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Multiple exposure method
Assignee: Canon Inc
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Filing: 2000-06-01
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Granted: 2002-02-26
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Expires: 2020-06-01
Abstract
Abstract An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern, wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a pattern or a boundary between adjacent patterns as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location, and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.
Inventors
- 👤 Miyoko Kawashima
- 👤 Yumiko Ohsaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 20:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70466; G03B; G03B27/00; G03B27/32; G03B27/52; G03F7/70216; G03F7/70283
Claims Analysis
Total Claims: 42
Claim 1
Independent Claim
150 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern: wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a pattern or a boundary between adjacent patterns as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location; and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.
Claim 2
Dependent Claim
150 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern: wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a pattern or a boundary between adjacent patterns as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location; and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.
Claim 3
Dependent Claim
158 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern: wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a light blocking region or a boundary of a phase serviceable as a light blocking area as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location; and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.
Claim 4
Dependent Claim
158 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern: wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a light blocking region or a boundary of a phase serviceable as a light blocking area as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location; and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.
Claim 5
Dependent Claim
30 words
A method according to claim 1 or 2 , wherein the periodicity direction of the periodic pattern is registered with a direction along which most fine line elements are arrayed.
Claim 6
Dependent Claim
23 words
A method according to claim 1 or 2 , wherein the particular direction different from the predetermined direction corresponds to the periodicity direction.
Claim 7
Dependent Claim
48 words
A method according to claim 1 or 2 , wherein the periodic pattern comprises a periodic pattern having a periodicity of not less than two and being provided by one of a Levenson type phase shift mask, an edge type phase shift mask and a binary type mask.
Claim 8
Dependent Claim
56 words
A method according to claim 1 or 2 , wherein the second pattern has a region where no periodic pattern is formed, and wherein an isolated line element is formed in that region so that the isolated line element is to be superposed with a fine line element of a direction different from the predetermined direction.
Claim 9
Dependent Claim
30 words
A method according to claim 6 , wherein the periodic pattern and the isolated line element are defined by one of a light blocking area and a light transmitting area.
Claim 10
Dependent Claim
36 words
A method according to claim 6 , wherein the isolated line element has a size or a shape which is different in accordance with a fine line element of a direction different from the predetermined direction.
Claim 11
Dependent Claim
35 words
A method according to claim 1 or 2 , wherein those of the fine line elements of a direction different from the predetermined direction include at least one having a linewidth larger than a resolution.
Claim 12
Dependent Claim
57 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern and a second exposure using a second pattern: wherein the first pattern includes a periodic pattern and has a region for correcting pattern distortion due to an optical proximity effect in the exposure of the second pattern.
Claim 13
Dependent Claim
57 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern and a second exposure using a second pattern: wherein the first pattern includes a periodic pattern and has a region for correcting pattern distortion due to an optical proximity effect in the exposure of the second pattern.
Claim 14
Dependent Claim
43 words
A method according to claim 10 , wherein the region for correcting pattern distortion due to the optical proximity effect is provided by a region inside a pattern region for the periodic pattern of the first pattern where no periodic structure is formed.
Claim 15
Dependent Claim
28 words
A method according to claim 10 , wherein the second pattern is adapted to produce a light intensity distribution of multiple levels, upon a surface of the substrate.
Claim 16
Dependent Claim
32 words
A method according to claim 10 , wherein the second pattern has a shape directly corresponding to a design pattern to be produced on the substrate or similar to the design pattern.
Claim 17
Dependent Claim
44 words
A method according to claim 13 , wherein the first pattern is arranged so that the correction of pattern distortion due to the optical proximity effect is performed such that a light intensity distribution to be provided thereby becomes similar to the design pattern.
Claim 18
Dependent Claim
58 words
A method according to claim 13 , wherein the first and second patterns are arranged so that the correction of pattern distortion due to the optical proximity effect is performed such that a light intensity distribution of a composite image to be produced by superposed exposures of the first and second patterns, becomes similar to the design pattern.
Claim 19
Dependent Claim
50 words
A method according to claim 11 , wherein, in the region inside the periodic pattern region of the first pattern where there is no periodic structure, a region having a locally thickened linewidth is defined by which the correction of pattern distortion due to the optical proximity effect is performed.
Claim 20
Dependent Claim
83 words
A method according to claim 16 , wherein, in the region inside the periodic pattern region of the first pattern where there is no periodic structure, and in such portion where a fine line element of the second pattern, of a direction not orthogonal to a periodicity direction of the first pattern, there is an isolated line element formed, and wherein a linewidth of the isolated line element is made larger than the linewidth of the fine line element of the second pattern.
Claim 21
Dependent Claim
60 words
A method according to claim 17 , wherein the linewidth of the isolated line element is optimized so that a fine line element of a composite image to be produced by the periodic pattern of the first pattern and a fine line element of a composite image to be produced by the isolate line element have substantially the same linewidth.
Claim 22
Dependent Claim
46 words
A method according to claim 11 , wherein a correction pattern is formed in a region inside the periodic pattern region of the first pattern where no periodic structure is formed, by which the correction of pattern distortion due to the optical proximity effect is performed.
Claim 23
Dependent Claim
72 words
A method according to claim 19 , wherein, when an isolated line element to be superposed with a fine line element of the second pattern, of a direction not orthogonal to the periodicity direction of the first pattern, is present in the region inside the periodic pattern region of the first pattern where no periodic structure is formed, the correction pattern is formed to substantially correct contraction of the isolated line element.
Claim 24
Dependent Claim
42 words
A method according to claim 10 , wherein, in the first pattern, a pattern having a linewidth at least three times larger than the narrowest line element of the second pattern is formed with a light blocking area, for light quantity adjustment.
Claim 25
Dependent Claim
27 words
A method according to claim 10 , wherein, in the first pattern, the linewidth is adjusted to adjust the whole light quantity balance of the first pattern.
Claim 26
Dependent Claim
31 words
A method according to claim 10 , wherein the first pattern includes intersecting patterns, and wherein a light blocking area is defined at or adjacent an intersection of the intersecting patterns.
Claim 27
Dependent Claim
32 words
A method according to claim 10 , wherein the first pattern includes L-shaped orthogonal patterns, and wherein a light blocking area is defined at or adjacent an intersection of the orthogonal patterns.
Claim 28
Dependent Claim
32 words
A method according to claim 10 , wherein the first pattern includes T-shaped orthogonal patterns, and wherein a light blocking area is defined at or adjacent an intersection of the orthogonal patterns.
Claim 29
Dependent Claim
39 words
A method according to claim 10 , wherein the first pattern comprises a periodic pattern having a periodicity not less than 2 and being provided by one of a Levenson type phase shift mask and a binary type mask.
Claim 30
Dependent Claim
85 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein a length of a predetermined light passing region of the periodic pattern is made shorter than another light passing region of the periodic pattern, to thereby suppress distortion in a predetermined portion of the first pattern ranging to the predetermined light passing region in the multiple exposure process.
Claim 31
Dependent Claim
85 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein a length of a predetermined light passing region of the periodic pattern is made shorter than another light passing region of the periodic pattern, to thereby suppress distortion in a predetermined portion of the first pattern ranging to the predetermined light passing region in the multiple exposure process.
Claim 32
Dependent Claim
112 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein a length of a predetermined light passing pattern of the periodic pattern is set so that an exposure amount distribution at an edge of the predetermined light passing pattern of the periodic pattern has a tilt opposite to that of an exposure amount distribution at an edge of a predetermined portion of the first pattern, ranging to the predetermined light passing pattern, such that they are combined with each other during the multiple exposure process.
Claim 33
Dependent Claim
112 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein a length of a predetermined light passing pattern of the periodic pattern is set so that an exposure amount distribution at an edge of the predetermined light passing pattern of the periodic pattern has a tilt opposite to that of an exposure amount distribution at an edge of a predetermined portion of the first pattern, ranging to the predetermined light passing pattern, such that they are combined with each other during the multiple exposure process.
Claim 34
Dependent Claim
60 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein the second pattern is arranged so as to suppress distortion in a predetermined portion of the first pattern during the multiple exposure process.
Claim 35
Dependent Claim
60 words
An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having a fine line and a second exposure using a second pattern having a periodic pattern: wherein the second pattern is arranged so as to suppress distortion in a predetermined portion of the first pattern during the multiple exposure process.
Claim 36
Dependent Claim
53 words
A method according to claim 28 , wherein a length of the periodic pattern is adjusted such that a length of a periodic pattern upon the substrate in its lengthwise direction is made equal to the length of the first pattern in the same direction as the lengthwise direction of the periodic pattern.
Claim 37
Dependent Claim
82 words
A method according to claim 30 , wherein the length of the periodic pattern upon the substrate is set within an extent from the length equal to a length of a fine line element of the first pattern in the same direction as the lengthwise direction of the periodic pattern, to a length as determined by subtracting, from the length of the fine line element, a pattern width of of a pattern portion of the first pattern, ranging from the periodic pattern.
Claim 38
Dependent Claim
39 words
A method according to claim 31 , wherein, as regards the length of the periodic pattern upon the substrate, a length corresponding to the periodic pattern length plus a length corresponding to contraction of the periodic pattern are accumulated.
Claim 39
Dependent Claim
45 words
A method according to claim 27 , wherein the periodic pattern comprises a periodic pattern having a periodicity not less than two and being provided by one of a Levenson type phase shift mask, an edge type phase shift mask and a binary type mask.
Claim 40
Dependent Claim
27 words
A mask usable with an exposure method as recited in any one of claims 1 - 33 , for supplying the first pattern in that exposure method.
Claim 41
Dependent Claim
27 words
A mask usable with an exposure method as recited in any one of claims 1 - 33 , for supplying the second pattern in that exposure method.
Claim 42
Independent Claim
28 words
A device manufacturing method including a process for producing a device by use of an exposure method as recited in any one of claims 1 - 33 .
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-02-25 | 2005-08-27 | 2006-02-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-02-25 | 2009-08-27 | 2010-02-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-02-25 | 2013-08-27 | 2014-02-26 | $7700.00 | Window Closed / Lapsed |