US6348357B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus with a pulsed laser
Assignee: Canon Inc
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Filing: 1999-04-05
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Granted: 2002-02-19
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Expires: 2019-04-05
Abstract
Abstract A semiconductor device manufacturing method includes the steps of providing a projection exposure apparatus, exposing a wafer by using the projection exposure apparatus, the exposing step including projecting a circuit pattern onto the wafer through the projection optical system using light from a first laser, and developing the exposed wafer. Before the providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a harmonic of a second laser having a coherency higher than that of the first laser, and then by analyzing the interference fringe. A wavelength of the light from the first laser is registered with that of the harmonic of the second laser.
Inventors
- 👤 Naoto Sano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/70216; G03F7/70241; Y; Y10; Y10S; Y10S438/00; Y10S438/942
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
158 words
A semiconductor device manufacturing method, comprising the steps of: providing a projection exposure apparatus, the projection exposure apparatus including a pulse laser and a projection optical system; exposing a wafer by using the projection exposure apparatus, said exposing step comprising projecting a circuit pattern onto the wafer through the projection optical system using light from the pulse laser; and developing the exposed wafer, wherein, before said providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a harmonic of a laser having a coherency higher than that of the pulse laser, and then by analyzing the interference fringe, wherein a wavelength of the harmonic of the laser corresponds to a design wavelength of the projection optical system, and wherein a wavelength of the light from the pulse laser is registered with that of the harmonic of the laser.
Claim 2
Dependent Claim
158 words
A semiconductor device manufacturing method, comprising the steps of: providing a projection exposure apparatus, the projection exposure apparatus including a pulse laser and a projection optical system; exposing a wafer by using the projection exposure apparatus, said exposing step comprising projecting a circuit pattern onto the wafer through the projection optical system using light from the pulse laser; and developing the exposed wafer, wherein, before said providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a harmonic of a laser having a coherency higher than that of the pulse laser, and then by analyzing the interference fringe, wherein a wavelength of the harmonic of the laser corresponds to a design wavelength of the projection optical system, and wherein a wavelength of the light from the pulse laser is registered with that of the harmonic of the laser.
Claim 3
Dependent Claim
15 words
A method according to claim 1 , wherein the pulse laser comprises an excimer laser.
Claim 4
Dependent Claim
28 words
A method according to claim 2 , wherein the excimer laser includes means for narrowing a bandwidth of the light and for changing the wavelength of the light.
Claim 5
Dependent Claim
22 words
A method according to claim 2 or 3 , wherein the harmonic of the laser is a harmonic of a gas laser.
Claim 6
Dependent Claim
156 words
A semiconductor device manufacturing method, comprising the steps of: providing a projection exposure apparatus, the projection exposure apparatus including a KrF excimer laser and a projection optical system; exposing a wafer by using the projection exposure apparatus, said exposing step comprising projecting a circuit pattern onto the wafer through the projection optical system using light from the KrF excimer laser; and developing the exposed wafer, wherein, before said providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a second harmonic of an Argon laser, and then by analyzing the interference fringe, wherein a wavelength of the second harmonic of the Argon laser corresponds to a design wavelength of the projection optical systems, and wherein a wavelength of the light from the KrF excimer laser is registered with that of the harmonic of the Argon laser.
Claim 7
Dependent Claim
156 words
A semiconductor device manufacturing method, comprising the steps of: providing a projection exposure apparatus, the projection exposure apparatus including a KrF excimer laser and a projection optical system; exposing a wafer by using the projection exposure apparatus, said exposing step comprising projecting a circuit pattern onto the wafer through the projection optical system using light from the KrF excimer laser; and developing the exposed wafer, wherein, before said providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a second harmonic of an Argon laser, and then by analyzing the interference fringe, wherein a wavelength of the second harmonic of the Argon laser corresponds to a design wavelength of the projection optical systems, and wherein a wavelength of the light from the KrF excimer laser is registered with that of the harmonic of the Argon laser.
Claim 8
Dependent Claim
28 words
A method according to claim 5 , wherein the excimer laser includes means for narrowing a bandwidth of the light and for changing the wavelength of the light.
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2005-02-18 | 2005-08-20 | 2006-02-19 | $2000.00 | Window Closed / Lapsed |
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