Patent US6347602B2 successfully refreshed from Google Patents.
US6347602B2
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US
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Plasma processing apparatus
Assignee: Tokyo Electron Ltd
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Filing: 2000-12-04
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Granted: 2002-02-19
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Expires: 2020-12-04
Abstract
Abstract In the plasma processor, the microwaves generated from a microwave generator ( 86 ) are led to a plane antenna ( 62 ), which in turn introduces exponentially attenuating microwaves into a container ( 22 ) that processes an object (W) in plasma. Microwave absorption device ( 96 ) provided in the circumference of the plane antenna ( 62 ) absorbs microwaves propagating from the center of the plane antenna ( 62 ) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna ( 62 ) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.
Inventors
- 👤 Naohisa Goto
- 👤 Makoto Ando
- 👤 Nobuo Ishii
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 08:59
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/3222
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
131 words
A plasma processing system comprising: a processing vessel in which an object to be processed is subjected to a plasma process; a plane antenna that makes microwaves propagate from its central portion toward its peripheral portion; a microwave generator for generating microwaves to be propagated to the plane antenna; a waveguide means for guiding the microwaves generated by the microwave generator to a central portion of the plane antenna; a microwave reflecting member surrounding a peripheral portion of the plane antenna to reflect microwaves, which is propagated from the central portion toward the peripheral portion of the plane antenna, toward the central portion of the plane antenna; and a microwave absorbing means disposed in the peripheral portion of the plane antenna to controllably absorb part of the microwaves that propagate therethrough.
Claim 2
Dependent Claim
131 words
A plasma processing system comprising: a processing vessel in which an object to be processed is subjected to a plasma process; a plane antenna that makes microwaves propagate from its central portion toward its peripheral portion; a microwave generator for generating microwaves to be propagated to the plane antenna; a waveguide means for guiding the microwaves generated by the microwave generator to a central portion of the plane antenna; a microwave reflecting member surrounding a peripheral portion of the plane antenna to reflect microwaves, which is propagated from the central portion toward the peripheral portion of the plane antenna, toward the central portion of the plane antenna; and a microwave absorbing means disposed in the peripheral portion of the plane antenna to controllably absorb part of the microwaves that propagate therethrough.
Claim 3
Dependent Claim
51 words
The plasma processing system according to claim 1 , wherein the microwave absorbing means includes: a plurality of concentric, annular liquid containers disposed in a peripheral portion of the plane antenna; and a microwave absorbing liquid selectively contained in one or more of the liquid containers to cause a dielectric loss.
Claim 4
Dependent Claim
18 words
The plasma processing system according to claim 2 , wherein the liquid containers have different radial thicknesses, respectively.
Claim 5
Dependent Claim
41 words
The plasma processing system according to claim 2 or 3 , further comprising: a circulating means for circulating the microwave absorbing liquid outside the liquid container(s); and a cooling means for cooling the microwave absorbing liquid circulated by the circulating means.
References Cited (Backward Citations)
JPH01184923A
Cited
JPH06136541A
Cited
JPH07296989A
Cited
US5698036A
Cited
JPH0963793A
Cited
JPH09148308A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-02-18 | 2005-08-20 | 2006-02-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-02-18 | 2009-08-20 | 2010-02-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-02-18 | 2013-08-20 | 2014-02-19 | $7700.00 | Window Closed / Lapsed |