US6103433A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure method using reticle remount for temperature influence correction
Assignee: Canon Inc
•
Filing: 1998-03-16
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Granted: 2000-08-15
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Expires: 2018-03-16
Abstract
Abstract An exposure method includes holding a reticle fixed, holding a wafer fixed, irradiating the reticle with an exposure beam, projecting an image of the irradicated reticle onto the wafer through a projection optical system, and re-mounting the reticle as the temperature of the reticle reaches or exceeds a predetermined temperature.
Inventors
- 👤 Yukio Tokuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 12:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
73 words
An exposure method, comprising the steps of: holding a reticle fixed; holding a wafer fixed; irradiating the reticle with an exposure beam; projecting an image of the irradiated reticle onto the wafer through a projection optical system; determining the temperature of the reticle; and re-mounting the reticle when the temperature of the reticle reaches or exceeds a predetermined level as a result of the irradiation with the exposure beam in said irradiating step.
Claim 2
Dependent Claim
73 words
An exposure method, comprising the steps of: holding a reticle fixed; holding a wafer fixed; irradiating the reticle with an exposure beam; projecting an image of the irradiated reticle onto the wafer through a projection optical system; determining the temperature of the reticle; and re-mounting the reticle when the temperature of the reticle reaches or exceeds a predetermined level as a result of the irradiation with the exposure beam in said irradiating step.
Claim 3
Dependent Claim
25 words
A method according to claim 1, wherein in combination with the re-mounting of the reticle, a projection magnification of the projection optical system is adjusted.
Claim 4
Dependent Claim
21 words
A method according to claim 1, wherein the re-mounting of the reticle is performed when the wafer is replaced by another.
Claim 5
Dependent Claim
23 words
A method according to claim 1, wherein the temperature of the reticle is determined on the basis of integration of an exposure amount.
Claim 6
Dependent Claim
27 words
A method according to claim 1, wherein the temperature of the reticle is determined on the basis of the number of exposures and the interval of exposures.
Claim 7
Dependent Claim
30 words
A method according to claim 1, wherein the temperature of the reticle is determined on the basis of one of transmissivity and light absorptivity of the reticle as measured beforehand.
Claim 8
Dependent Claim
18 words
A method according to claim 1, wherein the re-mounting of the reticle is performed after positioning the reticle.
Claim 9
Dependent Claim
27 words
A method according to claim 1, wherein, for re-mounting the reticle, reticle measurement is performed and the reticle re-mounting is made so as to minimize non-linear distortion.
Claim 10
Dependent Claim
52 words
A method according to claim 1, wherein the temperature of the reticle is determined on the basis of a difference between (i) relative position of a mark provided on the reticle and a reference mark provided for the positioning of the reticle, and (ii) an initial relative position of the respective marks.
Claim 11
Dependent Claim
17 words
A method according to claim 1, wherein holding the reticle is performed by use of vacuum attraction.
Claim 12
Dependent Claim
34 words
A device manufacturing method for manufacturing devices with a procedure including a step of transferring a pattern of a reticle onto a wafer in accordance with an exposure method as recited in claim 1.
Claim 13
Dependent Claim
36 words
A method according to claim 11, wherein the procedure further includes a step of applying a resist to the wafer prior to the exposure process, and a step of developing the wafer after the exposure process.
Claim 14
Dependent Claim
68 words
An exposure method comprising the steps of: holding a reticle; holding a wafer; irradiating the reticle with an exposure beam such that an image of the irradiated reticle is projected onto the wafer; determining the temperature of the reticle; and re-mounting the reticle when the temperature of the reticle reaches or exceeds a predetermined level as a result of irradiation with the exposure beam in said irradiating step.
Claim 15
Dependent Claim
68 words
An exposure method comprising the steps of: holding a reticle; holding a wafer; irradiating the reticle with an exposure beam such that an image of the irradiated reticle is projected onto the wafer; determining the temperature of the reticle; and re-mounting the reticle when the temperature of the reticle reaches or exceeds a predetermined level as a result of irradiation with the exposure beam in said irradiating step.
Claim 16
Dependent Claim
25 words
A method according to claim 13, wherein in combination with the re-mounting of the reticle, a projection magnification of the projection optical system is adjusted.
Claim 17
Dependent Claim
21 words
A method according to claim 13, wherein the re-mounting of the reticle is performed when the wafer is replaced by another.
Claim 18
Dependent Claim
23 words
A method according to claim 13, wherein the temperature of the reticle is determined on the basis of integration of an exposure amount.
Claim 19
Dependent Claim
27 words
A method according to claim 13, wherein the temperature of the reticle is determined on the basis of the number of exposures and the interval of exposures.
Claim 20
Dependent Claim
30 words
A method according to claim 13, wherein the temperature of the reticle is determined on the basis of one of transmissivity and light absorptivity of the reticle as measured beforehand.
Claim 21
Dependent Claim
18 words
A method according to claim 13, wherein the re-mounting of the reticle is performed after positioning the reticle.
Claim 22
Dependent Claim
29 words
A method according to claim 13, wherein, for the re-mounting of the reticle, reticle measurement is performed and the reticle re-mounting is made so as to minimize non-linear distortion.
Claim 23
Dependent Claim
52 words
A method according to claim 13, wherein the temperature of the reticle is determined on the basis of a difference between (i) relative position of a mark provided on the reticle and a reference mark provided for the positioning of the reticle, and (ii) an initial relative position of the respective marks.
Claim 24
Dependent Claim
17 words
A method according to claim 13, wherein holding the reticle is performed by use of vacuum attraction.
Claim 25
Dependent Claim
34 words
A device manufacturing method for manufacturing devices with a procedure including a step of transferring a pattern of a reticle onto a wafer in accordance with an exposure method as recited in claim 13.
Claim 26
Dependent Claim
36 words
A method according to claim 23, wherein the procedure further includes a step of applying a resist to the wafer prior to the exposure process, and a step of developing the wafer after the exposure process.
References Cited (Backward Citations)
US5329126A
Cited
US5680428A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-08-15 | 2004-02-14 | 2004-08-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-08-15 | 2008-02-14 | 2008-08-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-08-15 | 2012-02-14 | 2012-08-15 | $7700.00 | Window Closed / Lapsed |