US6091889A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Rapid thermal processor for heating a substrate
Assignee: National Science and Technology Council
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Filing: 1999-01-08
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Granted: 2000-07-18
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Expires: 2019-01-08
Abstract
Abstract A planar inverted-cone susceptor, preferably made of silicon carbide, inversely disposed between a substrate and a holder of the Rapid Thermal Processor (RTP) so as to perform heat compensation on the substrate. Because the substrate is directly supported by the inverted-cone susceptor, heat stored in the wafer can be rapidly received by the inverted-cone susceptor. Thermal stress and thermal gradient can be effectively decreased in the wafer.
Inventors
- 👤 Jenn-Gwo Hwu
- 👤 Kuo-Chung Lee
- 👤 Hong Chang
- 👤 Chien-Lung Chen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 11:59
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0436
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
89 words
A Rapid Thermal Processor for heating a substrate, comprising: a reaction chamber; a holder disposed in said reaction chamber; an invert-cone planar susceptor disposed on said holder for supporting said substrate, including an upper planar surface for supporting said substrate and a lower planar surface for being disposed on said holder, and made of a refractory material capable of resisting a temperature higher than 1000° C.; a heater disposed in said chamber for heating said substrate; and a gas distributor for distributing reaction gas coming into said reaction chamber.
Claim 2
Dependent Claim
89 words
A Rapid Thermal Processor for heating a substrate, comprising: a reaction chamber; a holder disposed in said reaction chamber; an invert-cone planar susceptor disposed on said holder for supporting said substrate, including an upper planar surface for supporting said substrate and a lower planar surface for being disposed on said holder, and made of a refractory material capable of resisting a temperature higher than 1000° C.; a heater disposed in said chamber for heating said substrate; and a gas distributor for distributing reaction gas coming into said reaction chamber.
Claim 3
Dependent Claim
33 words
The Rapid Thermal Processor as claimed in claim 1, wherein said inverted-cone planar susceptor is integrally made of a refractory material selected from the group consisting of silicon, quartz, graphite or silicon carbide.
Claim 4
Dependent Claim
16 words
The Rapid Thermal Processor as claimed in claim 2, wherein said substrate is a semiconductor wafer.
Claim 5
Dependent Claim
40 words
The Rapid Thermal Processor as claimed in claim 1, wherein said inverted-cone planar susceptor is composed of a plurality of plates which are laminated together with the upper plate larger than the lower plate, thereby forming an inverted-cone planar susceptor.
Claim 6
Dependent Claim
30 words
The Rapid Thermal Processor as claimed in claim 4, wherein said plates are made of a refractory material selected from the group consisting of silicon, quartz, graphite or silicon carbide.
Claim 7
Dependent Claim
16 words
The Rapid Thermal Processor as claimed in claim 5, wherein said substrate is a semiconductor wafer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-07-18 | 2004-01-17 | 2004-07-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-07-18 | 2008-01-17 | 2008-07-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-07-18 | 2012-01-17 | 2012-07-18 | $7700.00 | Window Closed / Lapsed |