Patent US6088113A successfully refreshed from Google Patents.
US6088113A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Focus test mask for projection exposure system, focus monitoring system using the same, and focus monitoring method
Assignee: Samsung Electronics Co Ltd
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Filing: 1998-12-16
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Granted: 2000-07-11
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Expires: 2018-12-16
Abstract
Abstract A focus test mask for a projection exposure system, a focus monitoring system using the same, and a focus monitoring method include a transparent substrate and a focus test pattern formed on the substrate. The focus test pattern includes a first light shielding pattern and a second light shielding pattern placed inside the first light shielding pattern. Both light shielding patterns have fine protruding patterns arranged along edges of respective first and second closed geometric shapes defining the light shielding patterns. The focus test pattern projected onto the surface of the object allows quantitative measurement of the optimal focuses of the projection exposure system. By using the focus test mask for a projection exposure system, the optimal focuses of the projection exposure system can be periodically measured easily and precisely.
Inventors
- 👤 Young-Chang Kim
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 14:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70633
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
147 words
A focus test mask for a projection exposure system, comprising; a substrate which is transparent with respect to an illumination source; a first light shielding pattern for focus test formed on the substrate in a first quadrilateral shape, in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral pattern, such that fine patterns on facing edges of the first quadrilateral shape protrude in the same direction; and a second light shielding pattern for focus test placed inside the first quadrilateral shape and formed on the substrate in a second quadrilateral shape, in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape, such that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape.
Claim 2
Dependent Claim
147 words
A focus test mask for a projection exposure system, comprising; a substrate which is transparent with respect to an illumination source; a first light shielding pattern for focus test formed on the substrate in a first quadrilateral shape, in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral pattern, such that fine patterns on facing edges of the first quadrilateral shape protrude in the same direction; and a second light shielding pattern for focus test placed inside the first quadrilateral shape and formed on the substrate in a second quadrilateral shape, in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape, such that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape.
Claim 3
Dependent Claim
25 words
The focus test mask of claim 1, wherein the fine protruding pattern is one of a triangular pattern, a rectangular pattern and a trapezoid pattern.
Claim 4
Dependent Claim
18 words
The focus test mask of claim 1, wherein the fine protruding pattern is a line and space pattern.
Claim 5
Dependent Claim
20 words
The focus test mask of claim 1, wherein centers of first and second closed geometric shapes coincide with each other.
Claim 6
Dependent Claim
18 words
The focus test mask of claim 1, wherein the first and second quadrilateral shapes are square or rectangular.
Claim 7
Dependent Claim
22 words
The focus test mask of claim 1, wherein the focus test mask further comprises a line and space pattern as a reference.
Claim 8
Dependent Claim
192 words
A focus monitoring system for monitoring focus of a projection exposure system having an illumination source and a focus lens, the focus monitoring system comprising: a focus test mask positioned between the illumination source and the focus lens, the focus test mask having a substrate which is transparent with respect to an illumination source, and a first light shielding pattern formed on the substrate in a first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral shape such that fine patterns on facing edges of the first quadrilateral shape protrude it the same direction, and a second light shielding pattern placed inside the first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape, such that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape; and a displacement monitoring system for measuring displacement of the first and second light shielding patterns projected onto the surface of the object via the focus lens.
Claim 9
Dependent Claim
192 words
A focus monitoring system for monitoring focus of a projection exposure system having an illumination source and a focus lens, the focus monitoring system comprising: a focus test mask positioned between the illumination source and the focus lens, the focus test mask having a substrate which is transparent with respect to an illumination source, and a first light shielding pattern formed on the substrate in a first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral shape such that fine patterns on facing edges of the first quadrilateral shape protrude it the same direction, and a second light shielding pattern placed inside the first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape, such that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape; and a displacement monitoring system for measuring displacement of the first and second light shielding patterns projected onto the surface of the object via the focus lens.
Claim 10
Dependent Claim
34 words
The focus monitoring system of claim 7, wherein the displacement monitoring system is an automatic overlay metrology system which measures the displacement of the focus test pattern projected onto the surface of the object.
Claim 11
Independent Claim
216 words
A method for measuring focus in a projection exposure system, comprising: loading a focus test mask having a substrate which is transparent with respect to an illumination source, and a first light shielding pattern formed on the substrate in a first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral shape such that fine patterns on facing edges of the first quadrilateral shape protrude it the same direction, and a second light shielding pattern placed inside the first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape, wherein the first and second light shielding patters are projected onto the surface of an object, to allow quantitative measurement of the optimal focus of the projection exposure system, above a focus lens of the projection exposure system; exposing the focus test mask to project the focus test pattern onto the surface of the object through the focus lens; and measuring a displacement of the first and second light shielding patterns projected onto the surface of the object.
Claim 12
Independent Claim
216 words
A method for measuring focus in a projection exposure system, comprising: loading a focus test mask having a substrate which is transparent with respect to an illumination source, and a first light shielding pattern formed on the substrate in a first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the first quadrilateral shape such that fine patterns on facing edges of the first quadrilateral shape protrude it the same direction, and a second light shielding pattern placed inside the first quadrilateral shape in which plurality of fine protruding patterns are repeatedly arranged along edges of the second quadrilateral shape that fine patterns on edges of the second quadrilateral shape protrude in an opposite direction to a protruding direction of fine patterns on a directly neighboring edge of the first quadrilateral shape, wherein the first and second light shielding patters are projected onto the surface of an object, to allow quantitative measurement of the optimal focus of the projection exposure system, above a focus lens of the projection exposure system; exposing the focus test mask to project the focus test pattern onto the surface of the object through the focus lens; and measuring a displacement of the first and second light shielding patterns projected onto the surface of the object.
Claim 13
Dependent Claim
37 words
The method of claim 9, further comprising calculating an optimal focus based on the relationship between the measured focus and the displacement after repeating the loading, exposing and measuring while varying the focus of the focus lens.
Claim 14
Dependent Claim
38 words
The focus test mask of claim 1, wherein a supplementary pattern having width not to induce the change of pattern even in a defocused state, is formed on the respective edges of the first or second quadrilateral shape.
Claim 15
Dependent Claim
46 words
The focus test mask of claim 1, wherein the first or second light shielding pattern can be respectively placed on the edges of the first or second quadrilateral shape such that at least one of the corners of the first or second quadrilateral shape is open.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-07-11 | 2004-01-10 | 2004-07-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-07-11 | 2008-01-10 | 2008-07-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-07-11 | 2012-01-10 | 2012-07-11 | $7700.00 | Window Closed / Lapsed |