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US6056785A
Expired / Lapsed
US
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Electron-beam data generating apparatus
Assignee: Renesas Design Corp
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Filing: 1997-11-20
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Granted: 2000-05-02
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Expires: 2017-11-20
Abstract
Abstract An electron-beam data generating device generates electron-beam data for creating a mask for a layout pattern of a semiconductor integrated circuit. The device includes processing circuits operating in parallel. The electron-beam data generating device also includes a data processing unit for processing, in parallel, the layout pattern based on at least one of several design layers of the semiconductor integrated circuit, the processes used in fabricating the mask, and segments of the mask, each segment serving as an electron-beam radiation region. The parallel processing is achieved by dividing the data processing and assigning each divided portion of the data processing to respective processing circuits. A format converting unit converts data processed by the processing unit into electron-beam data and outputs the electron-beam data.
Inventors
- 👤 Kenichiro Chisaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 23:47
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; B; B82; B82Y; B82Y10/00; B82Y40/00; G; G03; G03F; G03F1/00; G03F1/68; H01J37/302; H01J37/3023; H01J37/3026; H01J2237/00; H01J2237/30; H01J2237/304; H01J2237/30405; H01J2237/30416; H01J2237/30422; H01J2237/317; H01J2237/3175; H01J2237/31761; H01J2237/31762; H01J2237/31764
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
159 words
An electron-beam data generating apparatus for generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit, the apparatus comprising: a plurality of processing circuits connected in parallel; a data processing unit for parallel data processing of a layout pattern of a semiconductor integrated circuit based on at least one of design layers of the semiconductor integrated circuit, processes used in fabricating a mask for the layout pattern, and segments, each segment serving as an electron-beam radiation region of the mask, by dividing the data processing and assigning divided portions of the data processing to respective processing circuits, the data processing unit including a hierarchy developing unit for developing, in parallel processing, a hierarchy of the layout pattern for the respective design layers by assigning the developing to respective processing circuits; and a format converting unit for converting data processed by the data processing unit into electron-beam data and outputting the electron-beam data.
Claim 2
Dependent Claim
159 words
An electron-beam data generating apparatus for generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit, the apparatus comprising: a plurality of processing circuits connected in parallel; a data processing unit for parallel data processing of a layout pattern of a semiconductor integrated circuit based on at least one of design layers of the semiconductor integrated circuit, processes used in fabricating a mask for the layout pattern, and segments, each segment serving as an electron-beam radiation region of the mask, by dividing the data processing and assigning divided portions of the data processing to respective processing circuits, the data processing unit including a hierarchy developing unit for developing, in parallel processing, a hierarchy of the layout pattern for the respective design layers by assigning the developing to respective processing circuits; and a format converting unit for converting data processed by the data processing unit into electron-beam data and outputting the electron-beam data.
Claim 3
Dependent Claim
36 words
The electron-beam data generating apparatus according to claim 1 wherein the format converting unit format-converts, by parallel processing, data of the layout pattern for the respective fabrication processes by assigning the format-converting to respective processing circuits.
Claim 4
Dependent Claim
51 words
The electron-beam data generating apparatus according to claim 1 wherein the data processing unit includes a trapezoid division unit for dividing, by parallel processing, figures of the layout pattern for the respective fabrication processes, trapezoidally, by assigning the dividing to respective processing circuits and for outputting a plurality of trapezoid files.
Claim 5
Dependent Claim
45 words
The electron-bean data generating apparatus according to claim 3 wherein the data processing unit includes a data compressing unit for data-compressing, by parallel processing, the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
Claim 6
Dependent Claim
54 words
The electron-beam data generating apparatus according to claim 3 wherein the data processing unit includes a trapezoid-file sorting unit for sorting by parallel processing, the trapezoid files output by the trapezoid division unit using a key for respective combinations of the fabrication processes and the segments by assigning the sorting to respective processing circuits.
Claim 7
Dependent Claim
45 words
The electron-beam data generating apparatus according to claim 5 wherein the data processing unit includes a data compressing unit for data-compressing, by parallel processing, the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
Claim 8
Dependent Claim
36 words
The electron-beam data generating apparatus according to claim 5 wherein the format converting unit format-converts, by parallel processing, data of the layout pattern for the respective fabrication processes by assigning the format-converting to respective processing circuits.
Claim 9
Dependent Claim
36 words
The electron-beam data generating apparatus according to claim 3 wherein the format converting unit format-converts, by parallel processing, data of the layout pattern for the respective fabrication processes by assigning the format-converting to respective processing circuits.
Claim 10
Dependent Claim
45 words
The electron-beam data generating apparatus according to claim 1 wherein the data processing unit includes a data compressing unit for data-compressing, by parallel processing, the layout pattern for respective combinations of the fabrication processes and the segments by assigning the data-compressing to respective processing circuits.
Claim 11
Dependent Claim
36 words
The electron-beam data generating apparatus according to claim 9 wherein the format converting unit format-converts, by parallel processing, data of the layout pattern for the respective fabrication processes by assigning the format-converting to respective processing circuits.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-05-02 | 2003-11-01 | 2004-05-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-05-02 | 2007-11-01 | 2008-05-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-05-02 | 2011-11-01 | 2012-05-02 | $7700.00 | Window Closed / Lapsed |