← Back to Patent Explorer
US6015979A Expired / Lapsed US ⏱️ 0.0 years remaining

Nitride-based semiconductor element and method for manufacturing the same

Assignee: Toshiba Corp
•
Filing: 1998-08-28
•
Granted: 2000-01-18
•
Expires: 2018-08-28
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Nitride-based semiconductor element comprises a first layer, a mask formed on the first layer and has a plurality of opening portions, a nitride-based compound semiconductor layer formed on the mask, the nitride-based compound semiconductor layer including a first region having threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent ones of the plurality of opening portions in the mask, a plurality of dislocations extend in a vertical direction to a surface of the mask, and a second region which comprises portions other than the middle portions and free from the dislocations, and a desired element structure formed on the semiconductor layer.

Inventors

  • 👤 Lisa Sugiura
  • 👤 Masayuki Ishikawa
  • 👤 Shinya Nunoue
  • 👤 Masaaki Onomura
  • 👤 Masahiro Yamamoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 19:04
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/8215; H10H20/01; H10H20/011; H10H20/013; H10H20/0133; H10H20/01335

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 113 words
A nitride-based semiconductor element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based compound semiconductor layer formed on said mask, said nitride-based semiconductor layer including: a first region which has threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent opening portions of said plurality of opening portions in said mask, a plurality of dislocations extend vertically to a surface of said mask; and a second region which comprises portions other than said middle portions and free from said dislocations; and a desired element structure formed above said mask having said plurality of opening portions.
Claim 2
Dependent Claim 113 words
A nitride-based semiconductor element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based compound semiconductor layer formed on said mask, said nitride-based semiconductor layer including: a first region which has threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent opening portions of said plurality of opening portions in said mask, a plurality of dislocations extend vertically to a surface of said mask; and a second region which comprises portions other than said middle portions and free from said dislocations; and a desired element structure formed above said mask having said plurality of opening portions.
Claim 3
Dependent Claim 20 words
The nitride-based semiconductor element according to claim 1, wherein said desired element structure is formed substantially on said second region.
Claim 4
Dependent Claim 36 words
The nitride-based semiconductor element according to claim 1, wherein material of said mask is inactive at a high temperature of 1000° C. or higher in an atmosphere comprising at least one of hydrogen, nitrogen and ammonia.
Claim 5
Dependent Claim 44 words
The nitride-based semiconductor element according to claim 1, wherein said first layer comprises one selected from a group consisting of AlGaN, InGaN, AlN, GaN, and materials obtained by adding B to the foregoing, Si, SiC, sapphire and a laminated film made of the foregoing.
Claim 6
Dependent Claim 39 words
The nitride-based semiconductor element according to claim 1, wherein said plurality of opening portions in said mask are each formed into a stripe-like shape extending in a direction perpendicular to an a-axis <11-20> of said nitride-based compound semiconductor layer.
Claim 7
Dependent Claim 33 words
The nitride-based semiconductor element according to claim 1, wherein a density of said threading dislocations in said nitride-based compound semiconductor layer ranges from 10 3 cm -2 to 10 7 cm -2 inclusive.
Claim 8
Dependent Claim 49 words
The nitride-based semiconductor element according to claim 1, wherein said nitride-based compound semiconductor layer includes a third region in which a plurality of dislocations extending along the surface of said mask from said plurality of opening portions in said mask, and said second region exists on said third region.
Claim 9
Dependent Claim 23 words
The nitride-based semiconductor element according to claim 1, wherein a surface of said nitride-based compound semiconductor layer on said mask is substantially flat.
Claim 10
Dependent Claim 30 words
The nitride-based semiconductor element according to claim 1, wherein said nitride-based compound semiconductor layer is composed of Ga x In y Al z B 1-x-y-z N (wherein 0≦x, y, z≦1).
Claim 11
Dependent Claim 132 words
The nitride-based semiconductor element according to claim 1, wherein said mask is constituted in such a manner that, on said first layer, either of a plurality of opening portions which are each triangular or hexagonal in shape and a plurality of un-opened portions are periodically formed, said nitride-based compound semiconductor layer comprises: said first region which is formed on said un-opened portions of said mask and in which said threading dislocations are contained in a state extending in a vertical direction to the surface of said mask; a third region which is formed on said opening portions and said un-opened portions of said mask and, in which said dislocations extend along the surface of said mask; and said second region which is formed on said third region and free from said dislocations.
Claim 12
Dependent Claim 56 words
The nitride-based semiconductor element according to claim 1, wherein said first layer has a plurality of projections periodically formed on a surface thereof, on surfaces of said projections, said un-opened portions of said mask are formed, and in said opening portions of said mask, said underlying layer forms a junction with said nitride-based compound semiconductor layer.
Claim 13
Dependent Claim 122 words
A nitride-based light emitting element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based compound semiconductor layer formed on said mask, said nitride-based semiconductor layer including: a first region which has threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent opening portions of said plurality of opening portions in said mask, a plurality of dislocations extend vertically to a surface of said mask; and a second region which comprises portions other than said middle portions and free from said dislocations; and a light-emitting layer formed above said mask having said plurality of opening portions, said light-emitting layer being sandwiched between current injection layers.
Claim 14
Dependent Claim 122 words
A nitride-based light emitting element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based compound semiconductor layer formed on said mask, said nitride-based semiconductor layer including: a first region which has threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent opening portions of said plurality of opening portions in said mask, a plurality of dislocations extend vertically to a surface of said mask; and a second region which comprises portions other than said middle portions and free from said dislocations; and a light-emitting layer formed above said mask having said plurality of opening portions, said light-emitting layer being sandwiched between current injection layers.
Claim 15
Dependent Claim 36 words
The nitride-based light-emitting element according to claim 12, wherein material of said mask is inactive at a high temperature of 1000° C. or higher in an atmosphere comprising at least one of hydrogen, nitrogen and ammonia.
Claim 16
Dependent Claim 45 words
The nitride-based light-emitting element according to claim 12, wherein said first layer is composed of one selected from a group consisting of AlGaN, InGaN, AlN, GaN, materials resulting from adding B into the foregoing, Si, SiC, sapphire and a laminate film made of the foregoing.
Claim 17
Dependent Claim 39 words
The nitride-based light-emitting element according to claim 12, wherein said plurality of opening portions in said mask are each formed into a stripe-like shape extending in a direction perpendicular to an a-axis <11-20> of said nitride-based compound semiconductor layer.
Claim 18
Dependent Claim 33 words
The nitride-based light-emitting element according to claim 12, wherein a density of said threading dislocations in said nitride-based compound semiconductor layer ranges from 10 3 cm -2 to 10 7 cm -2 inclusive.
Claim 19
Dependent Claim 49 words
A nitride-based semiconductor element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based flattening semiconductor layer formed on said mask; and a desired element structure formed on said mask with said nitride-based flattening semiconductor layer interposed therebetween.
Claim 20
Dependent Claim 49 words
A nitride-based semiconductor element comprising: a first layer; a mask formed on said first layer, said mask having a plurality of opening portions; a nitride-based flattening semiconductor layer formed on said mask; and a desired element structure formed on said mask with said nitride-based flattening semiconductor layer interposed therebetween.
Claim 21
Dependent Claim 26 words
The nitride-based semiconductor element according to claim 7, wherein said desired element structure is a light-emitting element including an active layer sandwiched between two clad layers.

References Cited (Backward Citations)

JPH0864791A Cited
JPH08186080A Cited
US5880485A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-01-17 2003-07-19 2004-01-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-01-17 2007-07-19 2008-01-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-01-17 2011-07-19 2012-01-18 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag