Patent US6008064A successfully refreshed from Google Patents.
US6008064A
Expired / Lapsed
US
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Fabrication of volcano-shaped field emitters by chemical-mechanical polishing (CMP)
Assignee: American Energy Services Inc
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Filing: 1999-03-15
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Granted: 1999-12-28
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Expires: 2019-03-15
Abstract
Abstract A method for fabrication of volcano-shaped field emitters forming low-cost, large area manufacturing of ungated and gated vertical field emitter arrays. Gate and emitter thin films are deposited onto a substrate on which arrays of posts have been previously fabricated. These conformal films cover the substrate, the sidewalls of the posts, and the post top surfaces or plateaus. By using chemical-mechanical polishing (CMP), some or all of the thin films are selectively removed, leaving an intermediate structure that, after removing a small portion of the gate-to-emitter insulating film, is suitable for cold electron emission. One embodiment discloses a method of forming these devices without resort to a planarization layer. A second embodiment discloses a methodology employing a planarization layer.
Inventors
- 👤 Heinz H. Busta
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:06
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/022; H01J9/025
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
257 words
A process for the formation of an array of field emitters, comprising the steps of: (a) providing an electrically insulative substrate having a base surface supporting an array of post protuberances each having a sidewall extending outwardly from said base surface to a post top surface; (b) depositing a conformal gate metal material layer over said electrically insulative substrate; (c) depositing a first electrically insulative material conformal layer over said gate metal material layer; (d) depositing a sacrificial material conformal layer over said first electrically insulative layer; (e) removing that portion of said sacrificial layer which is located over said first electrically insulative layer at said post top surface of said post protuberances by chemical mechanical polishing (CMP); (f) removing that portion of said first electrically insulative material layer which is located adjacent said post top surface of said post protuberances and within a region adjacent to and extending toward said base surface region along each said post sidewall; (g) removing remaining said sacrificial layer, (h) depositing a second electrically insulative layer over exposed said first electrically conductive material layer and removing said first electrically insulative material layer, (i) depositing an emitter material conformal layer over said second electrically insulative layer, (j) removing that portion of said emitter material layer adjacent said post top surface of said post protuberances to define an emitter rim by chemical-mechanical polishing; and (k) removing a select portion of said second electrically insulative material layer intermediate said emitter material layer and said gate material layer adjacent said sidewall of said post protuberances.
Claim 2
Dependent Claim
257 words
A process for the formation of an array of field emitters, comprising the steps of: (a) providing an electrically insulative substrate having a base surface supporting an array of post protuberances each having a sidewall extending outwardly from said base surface to a post top surface; (b) depositing a conformal gate metal material layer over said electrically insulative substrate; (c) depositing a first electrically insulative material conformal layer over said gate metal material layer; (d) depositing a sacrificial material conformal layer over said first electrically insulative layer; (e) removing that portion of said sacrificial layer which is located over said first electrically insulative layer at said post top surface of said post protuberances by chemical mechanical polishing (CMP); (f) removing that portion of said first electrically insulative material layer which is located adjacent said post top surface of said post protuberances and within a region adjacent to and extending toward said base surface region along each said post sidewall; (g) removing remaining said sacrificial layer, (h) depositing a second electrically insulative layer over exposed said first electrically conductive material layer and removing said first electrically insulative material layer, (i) depositing an emitter material conformal layer over said second electrically insulative layer, (j) removing that portion of said emitter material layer adjacent said post top surface of said post protuberances to define an emitter rim by chemical-mechanical polishing; and (k) removing a select portion of said second electrically insulative material layer intermediate said emitter material layer and said gate material layer adjacent said sidewall of said post protuberances.
Claim 3
Dependent Claim
53 words
The process of claim 1 in which: said gate material is recalcitrant to etching by first and second etchants; said first electrically insulative material exhibits etchability by said first etchant and is recalcitrant to etching by said second etchant; and said step (f) is carried out by etching with a said first etchant.
Claim 4
Dependent Claim
39 words
The process of claim 2 in which: said sacrificial material exhibits etchability by said second etchant and is calcitrant to etching by said first etchant; and said step (g) is carried out by etching with a said second etchant.
Claim 5
Dependent Claim
46 words
The process of claim 2 in which: said second electrically insulative material is etchable by a said first etchant; said emitter material is recalcitrant to etching by said first and second etchants; and said step (k) is carried out by etching with a said first etchant.
Claim 6
Dependent Claim
49 words
The process of claim 1 in which: said step (d) is carried out by depositing said first electrically insulative material layer at a first thickness; and said step (h) is carried out by depositing said second electrically insulative material layer at a second thickness less than said first thickness.
Claim 7
Dependent Claim
56 words
The process of claim 1 in which said step (a) includes the steps of: (a1) depositing a photoresist upon a surface of said electrically insulative substrate; (a2) defining a photoresist region for each said post protuberance; (a3) stripping said photoresist; and (a4) etching said substrate to produce said base surface and said array of post protuberances.
References Cited (Backward Citations)
US5038070A
Cited
US5874808A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-27 | 2003-06-28 | 2003-12-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-27 | 2007-06-28 | 2007-12-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-27 | 2011-06-28 | 2011-12-28 | $7700.00 | Window Closed / Lapsed |