Patent US6004699A successfully refreshed from Google Patents.
US6004699A
Expired / Lapsed
US
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Photomask used for projection exposure with phase shifted auxiliary pattern
Assignee: NEC Electronics Corp
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Filing: 1998-02-26
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Granted: 1999-12-21
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Expires: 2018-02-26
Abstract
Abstract A photomask used for a projection exposure equipment comprises a transparent substrate and a light intercepting film provided on the transparent substrate. The transparent substrate comprises a main pattern region and an auxiliary pattern region provided in a periphery of the main pattern region. The auxiliary pattern region is etched to a depth at which a phase difference arises between light transmitted through the main pattern and light transmitted through the auxiliary pattern. The phase difference is of substantially an integral number of times as large as 360 degrees, wherein the integral number is one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less. The light intercepting film comprises openings on the main pattern region and the auxiliary pattern region.
Inventors
- 👤 Tadao Yasuzato
- 👤 Shinji Ishida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 17:24
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/30; G03F1/32; G03F1/36; G03F1/68; G03F1/72; G03F1/80
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
130 words
A photomask used for a projection exposure equipment comprising; a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary pattern, said phase difference being of substantially an integral number of times as 360 degrees, and said integral number being one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less; and a light intercepting film provided on said transparent substrate, said light intercepting film having openings on said main pattern region and on said auxiliary pattern region.
Claim 2
Dependent Claim
130 words
A photomask used for a projection exposure equipment comprising; a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary pattern, said phase difference being of substantially an integral number of times as 360 degrees, and said integral number being one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less; and a light intercepting film provided on said transparent substrate, said light intercepting film having openings on said main pattern region and on said auxiliary pattern region.
Claim 3
Dependent Claim
34 words
A photomask used for a projection exposure equipment according to claim 1, wherein a width of said auxiliary pattern region is 0.7 times or more as large as that of said main pattern region.
Claim 4
Dependent Claim
44 words
A photomask used for a projection exposure equipment according to claim 1, wherein said transparent substrate comprises plural said main pattern regions arranged in a grid like shape and plural said auxiliary pattern regions provided in a periphery of plural said main pattern regions.
Claim 5
Dependent Claim
42 words
A photomask used for a projection exposure equipment according to claim 1, wherein said transparent substrate comprises plural said main pattern regions arranged in a row and plural said auxiliary pattern regions provided in a periphery of plural said main pattern regions.
Claim 6
Dependent Claim
20 words
A photomask used for a projection exposure equipment according to claim 1, wherein said transparent substrate is made of quartz.
Claim 7
Dependent Claim
19 words
A photomask used for a projection exposure equipment according to claim 1, wherein said light intercepting film contains chromium.
Claim 8
Dependent Claim
30 words
A photomask used for a projection exposure equipment according to claim 2, wherein a size of said auxiliary pattern region is substantially same as that of said main pattern region.
Claim 9
Dependent Claim
150 words
A photomask used for a projection exposure equipment comprising: a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary pattern, said phase difference being of substantially an integral number of times 360 degrees, and said integral number being one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less; and a semitransparent film provided on said transparent substrate, said semitransparent film having openings on said main pattern region and on said auxiliary pattern region, and a phase difference of substantially 180 degrees being produced between light transmitted through the air and light transmitted through said semitransparent film.
Claim 10
Dependent Claim
150 words
A photomask used for a projection exposure equipment comprising: a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary pattern, said phase difference being of substantially an integral number of times 360 degrees, and said integral number being one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less; and a semitransparent film provided on said transparent substrate, said semitransparent film having openings on said main pattern region and on said auxiliary pattern region, and a phase difference of substantially 180 degrees being produced between light transmitted through the air and light transmitted through said semitransparent film.
Claim 11
Dependent Claim
32 words
A photomask used for a projection exposure equipment according to claim 8, wherein a width of said auxiliary pattern is 0.7 times or more as large as that of said main pattern.
Claim 12
Dependent Claim
20 words
A photomask used for a projection exposure equipment according to claim 8, wherein said transparent substrate is made of quartz.
Claim 13
Dependent Claim
19 words
A photomask used for a projection exposure equipment according to claim 8, wherein said semitransparent film contains chromium oxynitride.
Claim 14
Dependent Claim
30 words
A photomask used for a projection exposure equipment according to claim 9, wherein a size of said auxiliary pattern region is substantially same as that of said main pattern region.
Claim 15
Dependent Claim
114 words
A photomask used for a projection exposure equipment comprising: a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being provided at all sides of said main pattern region and being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary region, and said phase difference being of substantially odd numbers of times 180 degrees; and a light intercepting film provided on said transparent substrate, said light intercepting film having openings on said main pattern region and on said auxiliary pattern region.
Claim 16
Dependent Claim
114 words
A photomask used for a projection exposure equipment comprising: a transparent substrate, said transparent substrate having: a main pattern region; and an auxiliary pattern region provided in a periphery of said main pattern region, said auxiliary pattern region being provided at all sides of said main pattern region and being etched to a depth at which a phase difference arises between light transmitted through said main pattern and light transmitted through said auxiliary region, and said phase difference being of substantially odd numbers of times 180 degrees; and a light intercepting film provided on said transparent substrate, said light intercepting film having openings on said main pattern region and on said auxiliary pattern region.
Claim 17
Dependent Claim
32 words
A photomask used for a projection exposure equipment according to claim 13, wherein a width of said auxiliary pattern is 0.7 times or more as large as that of said main pattern.
Claim 18
Dependent Claim
20 words
A photomask used for a projection exposure equipment according to claim 13, wherein said transparent substrate is made of quartz.
Claim 19
Dependent Claim
19 words
A photomask used for a projection exposure equipment according to claim 13, wherein said light intercepting film contains chromium.
Claim 20
Dependent Claim
30 words
A photomask used for a projection exposure equipment according to claim 13, wherein a size of said auxiliary pattern region is substantially same as that of said main pattern region.
References Cited (Backward Citations)
JPS5762052A
Cited
JPH0315845A
Cited
JPH04136854A
Cited
JPH04268714A
Cited
JPH05333524A
Cited
JPH0777796A
Cited
JPH08194303A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-20 | 2003-06-21 | 2003-12-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-20 | 2007-06-21 | 2007-12-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-20 | 2011-06-21 | 2011-12-21 | $7700.00 | Window Closed / Lapsed |