Patent US6003243A successfully refreshed from Google Patents.
US6003243A
Expired / Lapsed
US
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Wafer cleaning apparatus and method thereof
Assignee: Foundation for Advancement of International Science
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Filing: 1994-08-09
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Granted: 1999-12-21
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Expires: 2014-08-09
Abstract
Abstract An apparatus and method for cleaning and drying a wafer in a single cleaning tank using a cleaning solution including means for producing a hydrogen activation seed from hydrogen-containing gas and means for introducing active gas containing the hydrogen activation seed into the cleaning tank wherein dangling bonds on the wafer are terminated with hydrogen by spraying the active gas containing the hydrogen activation seed on the wafer.
Inventors
- 👤 Tadahiro Ohmi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:04
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; H10P70/15
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
78 words
An apparatus for cleaning and drying a wafer, the apparatus comprising: a cleaning tank: means for supplying a cleaning solution to said wafer within said cleaning tank; means for producing hydrogen activation seed from hydrogen-containing gas; means for introducing active gas containing said hydrogen activation seed into said cleaning tank; and, means for spraying said active gas containing said hydrogen activation seed on the wafer in said cleaning tank to terminate dangling bonds on the wafer with hydrogen.
Claim 2
Independent Claim
78 words
An apparatus for cleaning and drying a wafer, the apparatus comprising: a cleaning tank: means for supplying a cleaning solution to said wafer within said cleaning tank; means for producing hydrogen activation seed from hydrogen-containing gas; means for introducing active gas containing said hydrogen activation seed into said cleaning tank; and, means for spraying said active gas containing said hydrogen activation seed on the wafer in said cleaning tank to terminate dangling bonds on the wafer with hydrogen.
Claim 3
Dependent Claim
20 words
A wafer cleaning apparatus according to claim 1 wherein said hydrogen-containing gas is a mixture of hydrogen and inert gas.
Claim 4
Dependent Claim
15 words
A wafer cleaning apparatus according to claim 2 wherein said inert gas is argon gas.
Claim 5
Dependent Claim
38 words
A wafer cleaning apparatus according to claim 1 wherein at least part of said means for producing hydrogen activation seed that contacts said hydrogen-containing gas is constructed from a material serving as a catalyst for forming hydrogen radicals.
Claim 6
Dependent Claim
17 words
A wafer cleaning apparatus according to claim 4 wherein said material serving as a catalyst contains Ni.
Claim 7
Dependent Claim
22 words
A wafer cleaning apparatus according to claim 4 wherein said material serving as a catalyst is heated to 300 to 450° C.
Claim 8
Dependent Claim
37 words
A wafer cleaning apparatus according to claim 1 wherein at least part of said means for introducing active gas that contacts said active gas is constructed from a material serving as a catalyst for forming hydrogen radicals.
References Cited (Backward Citations)
JPH04287922A
Cited
JPH05144804A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-20 | 2003-06-21 | 2003-12-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-20 | 2007-06-21 | 2007-12-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-20 | 2011-06-21 | 2011-12-21 | $7700.00 | Window Closed / Lapsed |